Stresses in ALD films: Aiming for zero stress thin films

Riina Ritasalo (Speaker), Ylivaara, O. M. E. (Speaker), Tero Pilvi (Speaker), Tommi Suni (Speaker)

    Activity: Talk or presentation typesOral presentation

    Period31 Jul 2018
    Event title18th International Conference on Atomic Layer Deposition, ALD/ALE 2018: Featuring the 5th International Atomic Layer Etching Workshop
    Event typeConference
    LocationIncheon, Korea, Republic of

    Keywords

    • ALD
    • Atomic Layer Deposition
    • Residual Stress