Thin-Film Conformality Analysis, Reliability and Modeling using All-Silicon Lateral High Aspect Ratio Structures

    Activity: Talk or presentation typesConference presentation

    Period31 Jul 2018
    Event title18th International Conference on Atomic Layer Deposition, ALD/ALE 2018: Featuring the 5th International Atomic Layer Etching Workshop
    Event typeConference
    LocationIncheon, Korea, Republic of

    Keywords

    • ALD
    • Atomic Layer Deposition
    • Lateral High-Aspect Ratio Structures
    • LHAR
    • PillarHall