Thin-Film Conformality Analysis, Reliability and Modeling using All-Silicon Lateral High Aspect Ratio Structures

Ylivaara, O. M. E. (Speaker), Korpelainen, V. (Speaker), Markku Ylilammi (Speaker), Riikka L. Puurunen (Speaker)

Activity: Talk or presentation typesOral presentation

Period31 Jul 2018
Event title18th International Conference on Atomic Layer Deposition, ALD/ALE 2018: Featuring the 5th International Atomic Layer Etching Workshop
Event typeConference
LocationIncheon, Korea, Republic of

Keywords

  • ALD
  • Atomic Layer Deposition
  • Lateral High-Aspect Ratio Structures
  • LHAR
  • PillarHall