Thin-Film Conformality Analysis, Reliability and Modeling using All-Silicon Lateral High Aspect Ratio Structures

Ylivaara, O. M. E. (Speaker), Korpelainen, V. (Speaker), Ylilammi, M. (Speaker), Riikka L. Puurunen (Speaker)

    Activity: Talk or presentation typesOral presentation

    Period31 Jul 2018
    Held atAVS 18<sup>th</sup> International Conference on Atomic Layer Deposition featuring the 5<sup>th</sup> International Atomic Layer Etching Workshop <br/>
    Event typeConference
    LocationIncheon, Korea, Republic of

    Keywords

    • ALD
    • Atomic Layer Deposition
    • Lateral High-Aspect Ratio Structures
    • LHAR
    • PillarHall