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Jyrki Kiihamäki

19912015
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Research Output 1991 2015

  • 22 Article
  • 2 Conference abstract in proceedings
  • 1 Chapter or book article
  • 1 Dissertation

Mechanical property mapping of ALD thin films

Puurunen, R. L., Ali, S., Arstila, K., Berdova, M., Haimi, E., Heikkinen, H., Julin, J., Kilpi, L., Laitinen, M., Liu, X., Lyytinen, J., Malm, J., Pyymaki-Perros, A., Rontu, V., Sintonen, S., Ylivaara, O., Sajavaara, T., Lipsanen, H., Franssila, S., Koskinen, J. & 3 othersRonkainen, H., Hannula, S-P. & Kiihamäki, J., 2015, Technical Program & Abstracts. American Vacuum Society AVS

Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsResearchpeer-review

9 Citations (Scopus)

Reducing stiction in microelectromechanical systems by rough nanometer-scale films grown by atomic layer deposition

Puurunen, R., Häärä, A., Saloniemi, H., Dekker, J., Kainlauri, M., Pohjonen, H., Suni, T., Kiihamäki, J., Santala, E., Leskelä, M. & Kattelus, H., 2012, In : Sensors and Actuators A: Physical. 188, p. 240-245 6 p.

Research output: Contribution to journalArticleScientificpeer-review

stiction
Stiction
Atomic layer deposition
atomic layer epitaxy
microelectromechanical systems

Stress in atomic layer deposited aluminium oxide and titanium dioxide thin films

Ylivaara, O., Puurunen, R. L., Laitinen, M., Sintonen, S., Ali, S., Sajavaara, T., Lipsanen, H. & Kiihamäki, J., 2012, Technical Program and Abstracts. American Vacuum Society AVS

Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsResearchpeer-review

dioxides
titanium oxides
aluminum oxides
thin films
temperature
3 Citations (Scopus)

Correlation between film properties and anhydrous HF vapor etching behavior of silicon oxide deposited by CVD methods

Ritala, H., Kiihamäki, J. & Puukilainen, E., 2011, In : Journal of the Electrochemical Society. 158, 6, p. D399-D402 4 p.

Research output: Contribution to journalArticleScientificpeer-review

Silicon oxides
Chemical vapor deposition
Etching
Vapors
Oxides
6 Citations (Scopus)

Low-Temperature Processes for MEMS Device Fabrication

Kiihamäki, J., Kattelus, H., Blomberg, M., Puurunen, R., Laamanen, M., Pekko, P., Saarilahti, J., Ritala, H. & Rissanen, A., 2010, NATO Science for Peace and Security Series B: Physics and Biophysics. Gusev, E., Garfunkel, E. & Dideikin, A. (eds.). Springer, p. 167-178 12 p. (NATO Science for Peace and Security Series B: Physics and Biophysics).

Research output: Chapter in Book/Report/Conference proceedingChapter or book articleProfessional

MEMS
Fabrication
Wafer bonding
Temperature
Hydrofluoric acid