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Jyrki Kiihamäki

1991 …2019
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Research Output 1991 2019

2019

Low-temperature Cu-Cu thermocompression bonding for encapsulation of a MEMS mirror

Ailas, H., Saarilahti, J., Pensala, T. & Kiihamäki, J., 22 May 2019, (Submitted) International Microelectronics and Packaging Society, Nordic: NordPac 2019.

Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

Encapsulation
MEMS
Mirrors
Copper
Temperature
2015

Mechanical property mapping of ALD thin films

Puurunen, R. L., Ali, S., Arstila, K., Berdova, M., Haimi, E., Heikkinen, H., Julin, J., Kilpi, L., Laitinen, M., Liu, X., Lyytinen, J., Malm, J., Pyymaki-Perros, A., Rontu, V., Sintonen, S., Ylivaara, O., Sajavaara, T., Lipsanen, H., Franssila, S., Koskinen, J. & 3 others, Ronkainen, H., Hannula, S-P. & Kiihamäki, J., 2015, Technical Program & Abstracts. American Vacuum Society AVS

Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific

2013

ALD membrane strength measurement with a stylus profilometer

Gao, F., Puurunen, R., Laukkanen, A., Kilpi, L., Ronkainen, H. & Kiihamäki, J., 2013.

Research output: Contribution to conferenceConference PosterScientific

2012
9 Citations (Scopus)

Reducing stiction in microelectromechanical systems by rough nanometer-scale films grown by atomic layer deposition

Puurunen, R., Häärä, A., Saloniemi, H., Dekker, J., Kainlauri, M., Pohjonen, H., Suni, T., Kiihamäki, J., Santala, E., Leskelä, M. & Kattelus, H., 2012, In : Sensors and Actuators A: Physical. 188, p. 240-245 6 p.

Research output: Contribution to journalArticleScientificpeer-review

stiction
Stiction
Atomic layer deposition
atomic layer epitaxy
microelectromechanical systems

Stress in atomic layer deposited aluminium oxide and titanium dioxide thin films

Ylivaara, O., Puurunen, R. L., Laitinen, M., Sintonen, S., Ali, S., Sajavaara, T., Lipsanen, H. & Kiihamäki, J., 2012, Technical Program and Abstracts. American Vacuum Society AVS

Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific

dioxides
titanium oxides
aluminum oxides
thin films
temperature
2011
4 Citations (Scopus)

Correlation between film properties and anhydrous HF vapor etching behavior of silicon oxide deposited by CVD methods

Ritala, H., Kiihamäki, J. & Puukilainen, E., 2011, In : Journal of the Electrochemical Society. 158, 6, p. D399-D402 4 p.

Research output: Contribution to journalArticleScientificpeer-review

Silicon oxides
Chemical vapor deposition
Etching
Vapors
Oxides
4 Citations (Scopus)

Reducing stiction in Microelectromechanical Systems by nanometer-scale films grown by atomic layer deposition

Puurunen, R., Häärä, A., Ritala, H., Dekker, J. R., Kainlauri, M., Pohjonen, H., Suni, T., Kiihamäki, J., Santala, E., Leskelä, M. & Kattelus, H., 2011, Proceedings: 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS 2011. Institute of Electrical and Electronic Engineers IEEE, p. 1887-1890

Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

stiction
atomic layer epitaxy
microelectromechanical systems
cantilever beams
silicon
2010
6 Citations (Scopus)

Low-Temperature Processes for MEMS Device Fabrication

Kiihamäki, J., Kattelus, H., Blomberg, M., Puurunen, R., Laamanen, M., Pekko, P., Saarilahti, J., Ritala, H. & Rissanen, A., 2010, Advanced Materials and Technologies for Micro/Nano-Devices, Sensors and Actuators. Gusev, E., Garfunkel, E. & Dideikin, A. (eds.). Springer, p. 167-178 (NATO Science for Peace and Security Series B: Physics and Biophysics).

Research output: Chapter in Book/Report/Conference proceedingChapter or book articleScientificpeer-review

MEMS
Fabrication
Wafer bonding
Temperature
Hydrofluoric acid
8 Citations (Scopus)

Studies on aluminium corrosion during and after HF vapour treatment

Ritala, H., Kiihamäki, J. & Heikkilä, M., 2010, In : Microelectronic Engineering. 87, 3, p. 501-504 4 p.

Research output: Contribution to journalArticleScientificpeer-review

Aluminum corrosion
Hydrofluoric Acid
Hydrofluoric acid
hydrofluoric acid
Oxides
2009
2 Citations (Scopus)

Etching of Sacrificial CVD Silicon Dioxide with Anhydrous HF Vapor

Ritala, H. & Kiihamäki, J., 2009, In : ECS Transactions. 25, 5, p. 351-358 8 p.

Research output: Contribution to journalArticleScientificpeer-review

Chemical vapor deposition
Etching
Vapors
Silica
Low pressure chemical vapor deposition
2006
6 Citations (Scopus)

Microelectromechanical delay lines with slow signal propagation

Alastalo, A. T., Kiihamäki, J. & Seppä, H., 4 Aug 2006, In : Journal of Micromechanics and Microengineering. 16, 9, p. 1854-1860

Research output: Contribution to journalArticleScientificpeer-review

Electric delay lines
Resonators
32 Citations (Scopus)

Stability of wafer level vacuum encapsulated single-crystal silicon resonators

Kaajakari, V., Kiihamäki, J., Oja, A., Pietikäinen, S., Kokkala, V. & Kuisma, H., 2006, In : Sensors and Actuators A: Physical. 130-131, p. 42-47 6 p.

Research output: Contribution to journalArticleScientificpeer-review

Silicon
Resonators
resonators
Single crystals
wafers
2005

Fabrication of SOI micromechanical devices: Dissertation

Kiihamäki, J., 2005, Espoo: VTT Technical Research Centre of Finland. 121 p.

Research output: ThesisDissertationCollection of Articles

Open Access
Fabrication
Silicon
Etching
Micromechanics
Integrated circuits
17 Citations (Scopus)

Imaging of in- and out-of-plane vibrations in micromechanical resonator

Holmgren, O., Kokkonen, K., Mattila, T., Kaajakari, V., Oja, A., Kiihamäki, J., Knuuttila, J. V. & Salomaa, M. M., 2005, In : Electronics Letters. 41, 3, p. 121 - 122 2 p.

Research output: Contribution to journalArticleScientificpeer-review

Micromechanical resonators
Resonators
Imaging techniques
Michelson interferometers
Interferometers
2004
4 Citations (Scopus)

Electrical and mechanical properties of micromachined vacuum cavities

Kiihamäki, J., Ronkainen, H., Häärä, A. & Mattila, T., 2004, In : Physica Scripta. T114, p. 195 - 198 4 p.

Research output: Contribution to journalArticleScientificpeer-review

Electrical Properties
Silicon-on-insulator
Mechanical Properties
Vacuum
Cavity
1 Citation (Scopus)

HV NMOS transistor for IC/MEMS integration on SOI

Jansson, R., Ronkainen, H., Kiihamäki, J. & Mellin, J., 2004, In : Physica Scripta. T114, p. 110 - 112 3 p.

Research output: Contribution to journalArticleScientificpeer-review

SOI (semiconductors)
Micro-electro-mechanical Systems
microelectromechanical systems
transistors
Wafer
37 Citations (Scopus)

Long-term stability of single-crystal silicon microresonators

Koskenvuori, M., Mattila, T., Häärä, A., Kiihamäki, J., Tittonen, I., Oja, A. & Seppä, H., 2004, In : Sensors and Actuators A: Physical. 115, 1, p. 23 - 27 5 p.

Research output: Contribution to journalArticleScientificpeer-review

Silicon
Single crystals
single crystals
silicon
humidity
10 Citations (Scopus)

"Plug-up": A new concept for fabricating SOI MEMS devices

Kiihamäki, J., Dekker, J., Pekko, P., Kattelus, H., Sillanpää, T. & Mattila, T., 2004, In : Microsystem Technologies. 10, 5, p. 346 - 350 5 p.

Research output: Contribution to journalArticleScientificpeer-review

Silicon
plugs
microelectromechanical systems
MEMS
insulators
6 Citations (Scopus)

Silicon micromechanical resonators for RF-Applications

Mattila, T., Kaajakari, V., Kiihamäki, J., Oja, A., Kattelus, H., Seppä, H., Koskenvuori, M., Rantakari, P. & Tittonen, I., 2004, In : Physica Scripta. T114, p. 181 - 183 3 p.

Research output: Contribution to journalArticleScientificpeer-review

Microresonators
Phase Noise
wireless communication
Resonator
quartz crystals
150 Citations (Scopus)

Square-extensional mode single-crystal silicon micromechanical resonator for low-phase-noise oscillator applications

Kaajakari, V., Mattila, T., Oja, A., Kiihamäki, J. & Seppä, H., 2004, In : IEEE Electron Device Letters. 25, 4, p. 173 - 175 3 p.

Research output: Contribution to journalArticleScientificpeer-review

Open Access
Micromechanical resonators
Silicon
Phase noise
Resonators
Single crystals
2002
41 Citations (Scopus)

14 MHz micromechanical oscillator

Mattila, T., Jaakkola, O., Kiihamäki, J., Karttunen, J., Lamminmäki, T., Rantakari, P., Oja, A., Seppä, H., Kattelus, H. & Tittonen, I., 2002, In : Sensors and Actuators A: Physical. 97-98, p. 497-502

Research output: Contribution to journalArticleScientificpeer-review

Spurious signal noise
Quartz
Silicon
Resonators
oscillators
123 Citations (Scopus)

A 12 MHz micromechanical bulk acoustic mode oscillator

Mattila, T., Kiihamäki, J., Lamminmäki, T., Jaakkola, O., Rantakari, P., Oja, A., Seppä, H., Kattelus, H. & Tittonen, I., 2002, In : Sensors and Actuators A: Physical. 101, 1-2, p. 1-9

Research output: Contribution to journalArticleScientificpeer-review

Silicon
Micromechanical resonators
oscillators
acoustics
Micromechanics
1 Citation (Scopus)

Measurement of oxide etch rate of SOI structure using near IR microscopy

Kiihamäki, J., 2002, In : Physica Scripta. 2002, T101, p. 185-187

Research output: Contribution to journalArticleScientificpeer-review

Silicon-on-insulator
Microscopy
Oxides
insulators
microscopy

Nanosåll nytt hjälpmedel inom mikromekaniken

Kattelus, H., Saarilahti, J., Kiihamäki, J. & Gyllenberg, U., 2002, In : Elektronik i Norden. 19, del 2/40.

Research output: Contribution to journalArticleProfessional

2000
28 Citations (Scopus)

Deceleration of silicon etch rate at high aspect ratios

Kiihamäki, J., 2000, In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 18, 4, p. 1385 - 1389 5 p.

Research output: Contribution to journalArticleScientificpeer-review

Deceleration
Silicon
deceleration
high aspect ratio
Aspect ratio
23 Citations (Scopus)

Depth and profile control in plasma etched MEMS structures

Kiihamäki, J., Kattelus, H., Karttunen, J. & Franssila, S., 2000, In : Sensors and Actuators A: Physical. 82, 1-3, p. 234 - 238 5 p.

Research output: Contribution to journalArticleScientificpeer-review

Wet etching
microelectromechanical systems
MEMS
etching
Plasmas
21 Citations (Scopus)

Etching through silicon wafer in inductively coupled plasma

Franssila, S., Kiihamäki, J. & Karttunen, J., 2000, In : Microsystem Technologies. 6, 4, p. 141 - 144 4 p.

Research output: Contribution to journalArticleScientificpeer-review

Inductively coupled plasma
Silicon wafers
Aspect ratio
Etching
etching
1999
8 Citations (Scopus)

Deep silicon etching in inductively coupled plasma reactor for mems

Kiihamäki, J. & Franssila, S., 1999, In : Physica Scripta. T79, p. 250-254 5 p.

Research output: Contribution to journalArticleScientificpeer-review

Etching
Ratio-dependent
Reactor
Silicon
Plasma
79 Citations (Scopus)

Pattern shape effects and artefacts in deep silicon etching

Kiihamäki, J. & Franssila, S., 1999, In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 17, 4, p. 2280-2285 6 p.

Research output: Contribution to journalArticleScientificpeer-review

Silicon
artifacts
Aspect ratio
Etching
etching
1991
4 Citations (Scopus)

The Kirk effect in the LIGBT devices

Eränen, S., Grönlund, M., Blomberg, M. & Kiihamäki, J., 1991, In : IEEE Transactions on Electron Devices. 38, 8, p. 1919 - 1924 6 p.

Research output: Contribution to journalArticleScientificpeer-review

Insulated gate bipolar transistors (IGBT)
Circuit simulation
Current voltage characteristics
Anodes
Cathodes