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Oili M.E. Ylivaara

Research Scientist

 https://orcid.org/0000-0001-7197-9066
  • Phone+358405797032
20102021

Research output per year

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Projects

PRYSTINE: Programmable Systems for Intelligence in Automobiles

Pensala, T., Ylivaara, O. M. E., Morits, D. & Kyynäräinen, J.

1/05/18 → 30/04/21

Project: Research

ALDCoE: Finnish Centre of Excellence in Atomic Layer Deposition

Ylivaara, O. M. E., Ahopelto, J., Puurunen, R. L. & Grigoras, K.

1/01/12 → 31/12/17

Project: Research

Research Output

Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion

Ylivaara, O. M. E., Liu, X., Kilpi, L., Lyytinen, J., Schneider, D., Laitinen, M., Julin, J., Ali, S., Sintonen, S., Berdova, M., Haimi, E., Sajavaara, T., Ronkainen, H., Lipsanen, H., Koskinen, J., Hannula, S. P. & Puurunen, R. L., 2014, In : Thin Solid Films. 552, p. 124-135 12 p.

Research output: Contribution to journal › Article › Scientific › peer-review

Open Access
    • 89 Citations (Scopus)

    Aluminum oxide/titanium dioxide nanolaminates grown by atomic layer deposition: Growth and mechanical properties

    Ylivaara, O. M. E., Kilpi, L., Liu, X., Sintonen, S., Ali, S., Laitinen, M., Julin, J., Haimi, E., Sajavaara, T., Lipsanen, H., Hannula, S-P., Ronkainen, H. & Puurunen, R. L., 2017, In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 35, 1, 14 p., 01B105.

    Research output: Contribution to journal › Article › Scientific › peer-review

    Open Access
    • 12 Citations (Scopus)

    Al2O3 Thin Films Prepared by a Combined Thermal-Plasma Atomic Layer Deposition Process at Low Temperature for Encapsulation Applications

    Zhu, Z., Merdes, S., Ylivaara, O. M. E., Mizohata, K., Heikkilä, M. J. & Savin, H., 1 Apr 2020, In : Physica Status Solidi A: Applications and Materials Science. 217, 8, 1900237.

    Research output: Contribution to journal › Article › Scientific › peer-review

    • Advanced Lateral High Aspect Ratio Test Structures for Conformality Characterization by Optical Microscopy

    Ylivaara, O. M. E., Hyttinen, P., Arts, K., Gao, F., Erwin Kessels, W. M. M., Puurunen, R. L. & Utriainen, M., 22 Jul 2019, ALD 2019 Technical Program & Abstracts. American Vacuum Society AVS

    Research output: Chapter in Book/Report/Conference proceeding › Conference abstract in proceedings › Scientific

    Open Access

    • Al2O3 thin films prepared by a modified H2O-based PEALD for encapsulation applications

    Zhu, Z., Merdes, S., Mizohata, K., Ylivaara, O. M. E., Heikkilä, M. J. & Salmi, E., 25 Jun 2019.

    Research output: Contribution to conference › Conference Poster › Scientific › peer-review

    Activities

    • 2 Oral presentation

    Thin-Film Conformality Analysis, Reliability and Modeling using All-Silicon Lateral High Aspect Ratio Structures

    Oili M.E. Ylivaara (Speaker), , Virpi Korpelainen (Speaker), , Markku Ylilammi (Speaker), & Riikka L. Puurunen (Speaker)

    31 Jul 2018

    Activity: Talk or presentation types › Oral presentation

    Stresses in ALD films: Aiming for zero stress thin films

    Riina Ritasalo (Speaker), , Oili M.E. Ylivaara (Speaker), , Tero Pilvi (Speaker), & Tommi Suni (Speaker)

    31 Jul 2018

    Activity: Talk or presentation types › Oral presentation