Oili M.E. Ylivaara

Research Scientist

Senior Scientist, BA6201 MEMS

Phone+358405797032

Research activity per year

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12 Similar Profiles

2 Finished

PRYSTINE: Programmable Systems for Intelligence in Automobiles
Pensala, T., Ylivaara, O. M. E., Morits, D. & Kyynäräinen, J.
1/05/18 → 30/04/21
Project: EU project
ALDCoE: Finnish Centre of Excellence in Atomic Layer Deposition
Ylivaara, O. M. E., Ahopelto, J., Puurunen, R. L. & Grigoras, K.
1/01/12 → 31/12/17
Project: Academy of Finland project

27 Conference abstract in proceedings
18 Article
12 Conference Abstract
10 Conference Poster
More

Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion
Ylivaara, O. M. E., Liu, X., Kilpi, L., Lyytinen, J., Schneider, D., Laitinen, M., Julin, J., Ali, S., Sintonen, S., Berdova, M., Haimi, E., Sajavaara, T., Ronkainen, H., Lipsanen, H., Koskinen, J., Hannula, S. P. & Puurunen, R. L., 2014, In: Thin Solid Films. 552, p. 124-135 12 p.
Research output: Contribution to journal › Article › Scientific › peer-review

Open Access
106 Citations (Scopus)
Aluminum oxide/titanium dioxide nanolaminates grown by atomic layer deposition: Growth and mechanical properties
Ylivaara, O. M. E., Kilpi, L., Liu, X., Sintonen, S., Ali, S., Laitinen, M., Julin, J., Haimi, E., Sajavaara, T., Lipsanen, H., Hannula, S-P., Ronkainen, H. & Puurunen, R. L., 2017, In: Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 35, 1, 14 p., 01B105.
Research output: Contribution to journal › Article › Scientific › peer-review

Open Access
18 Citations (Scopus)
Saturation profile based conformality analysis for atomic layer deposition: Aluminum oxide in lateral high-aspect-ratio channels
Yim, J., Ylivaara, O. M. E., Ylilammi, M., Korpelainen, V., Haimi, E., Verkama, E., Utriainen, M. & Puurunen, R. L., 2020, In: Physical Chemistry Chemical Physics. 22, 40, p. 23107-23120 14 p.
Research output: Contribution to journal › Article › Scientific › peer-review

Open Access
1 Citation (Scopus)
Al₂O₃ Thin Films Prepared by a Combined Thermal-Plasma Atomic Layer Deposition Process at Low Temperature for Encapsulation Applications
Zhu, Z., Merdes, S., Ylivaara, O. M. E., Mizohata, K., Heikkilä, M. J. & Savin, H., 1 Apr 2020, In: Physica Status Solidi A: Applications and Materials Science. 217, 8, 1900237.
Research output: Contribution to journal › Article › Scientific › peer-review
Conformality in Aluminum Oxide ALD Process Analyzed using 3rd Generation Silicon Based Lateral High Aspect Ratio Test Structures
Yim, J., Ylivaara, O. M. E., Ylilammi, M., Korpelainen, V., Haimi, E., Verkama, E., Utriainen, M. & Puurunen, R. L., Jun 2020.
Research output: Contribution to conference › Conference Poster › Scientific › peer-review

3 Conference presentation

In-vitro Screening of Materials and Laminates by Atomic Layer Deposition for Medical Device Coatings
Riina Ritasalo (Speaker), Oili M.E. Ylivaara (Speaker), Teuvo Sillanpää (Speaker), Paula Holmlund (Speaker), Anu Kärkkäinen (Speaker) & Tom Blomberg (Speaker)
Jun 2020
Activity: Talk or presentation types › Conference presentation
Thin-Film Conformality Analysis, Reliability and Modeling using All-Silicon Lateral High Aspect Ratio Structures
Oili M.E. Ylivaara (Speaker), Virpi Korpelainen (Speaker), Markku Ylilammi (Speaker) & Riikka L. Puurunen (Speaker)
31 Jul 2018
Activity: Talk or presentation types › Conference presentation
Stresses in ALD films: Aiming for zero stress thin films
Riina Ritasalo (Speaker), Oili M.E. Ylivaara (Speaker), Tero Pilvi (Speaker) & Tommi Suni (Speaker)
31 Jul 2018
Activity: Talk or presentation types › Conference presentation