20102019
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Fingerprint Fingerprint is based on mining the text of the person's scientific documents to create an index of weighted terms, which defines the key subjects of each individual researcher.

  • 38 Similar Profiles
atomic layer epitaxy Physics & Astronomy
Atomic layer deposition Engineering & Materials Science
residual stress Physics & Astronomy
Silicon Chemical Compounds
wafers Physics & Astronomy
thin films Physics & Astronomy
aluminum oxides Physics & Astronomy
silicon Physics & Astronomy

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Projects 2012 2017

Research Output 2010 2019

Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide

Zhu, Z., Sippola, P., Ylivaara, O., Modanese, C., Di Sabatino, M., Mizohata, K., Merdes, S., Lipsanen, H. & Savin, H., 2019, In : Nanoscale Research Letters. 14, 8 p., 55.

Research output: Contribution to journalArticleResearchpeer-review

Open Access
Atomic layer deposition
cold plasmas
atomic layer epitaxy
Carbon Dioxide
carbon dioxide

Microelectrode Array With Transparent ALD TiN Electrodes

Ryynänen, T., Pelkonen, A., Grigoras, K., Ylivaara, O. M. E., Hyvärinen, T., Ahopelto, J., Prunnila, M., Narkilahti, S. & Lekkala, J., 22 Mar 2019, In : Frontiers in Neuroscience. 13, 226.

Research output: Contribution to journalArticleResearchpeer-review

Open Access
Microelectrodes
Electrodes
Electric Impedance
Noise
Neurons

(Semi-)transparent ALD TiN microelectrodes

Ryynänen, T., Pelkonen, A., Grigoras, K., Ylivaara, O., Ahopelto, J., Prunnila, M., Narkilahti, S. & Lekkala, J., 27 Jul 2018, Front. Cell. Neurosci. Conference Abstract: MEA Meeting 2018, 11th International Meeting on Substrate Integrated Microelectrode Arrays. Frontiers Media, (Frontiers in Cellular Neuroscience ).

Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsResearchpeer-review

Open Access

Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films

Sippola, P., Pyymäki Perros, A., Ylivaara, O., Ronkainen, H., Julin, J., Liu, X., Sajavaara, T., Etula, J., Lipsanen, H. & Puurunen, R. L., 30 Jul 2018, In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 36, 5, 12 p., 051508.

Research output: Contribution to journalArticleResearchpeer-review

Open Access
Aluminum nitride
Atomic layer deposition
aluminum nitrides
atomic layer epitaxy
mechanical properties
2 Citations (Scopus)

Modeling growth kinetics of thin films made by atomic layer deposition in lateral high-aspect-ratio structures

Ylilammi, M., Ylivaara, O. M. E. & Puurunen, R. L., 28 May 2018, In : Journal of Applied Physics. 123, 20, 205301.

Research output: Contribution to journalArticleResearchpeer-review

atomic layer epitaxy
high aspect ratio
kinetics
thin films
adsorption

Activities 2018 2018

  • 2 Oral presentation

Stresses in ALD films: Aiming for zero stress thin films

Riina Ritasalo (Speaker), Oili M.E. Ylivaara (Speaker), Tero Pilvi (Speaker), Tommi Suni (Speaker)
31 Jul 2018

Activity: Talk or presentation typesOral presentation

Thin-Film Conformality Analysis, Reliability and Modeling using All-Silicon Lateral High Aspect Ratio Structures

Oili M.E. Ylivaara (Speaker), Virpi Korpelainen (Speaker), Markku Ylilammi (Speaker), Riikka L. Puurunen (Speaker)
31 Jul 2018

Activity: Talk or presentation typesOral presentation