Projects per year
Fingerprint Dive into the research topics where Oili M.E. Ylivaara is active. These topic labels come from the works of this person. Together they form a unique fingerprint.
- 37 Similar Profiles
atomic layer epitaxy
Physics & Astronomy
Atomic layer deposition
Engineering & Materials Science
residual stress
Physics & Astronomy
thin films
Physics & Astronomy
Silicon
Chemical Compounds
wafers
Physics & Astronomy
Thin films
Engineering & Materials Science
aluminum oxides
Physics & Astronomy
Projects 2012 2021
PRYSTINE: Programmable Systems for Intelligence in Automobiles
Pensala, T., Ylivaara, O. M. E., Morits, D. & Kyynäräinen, J.
1/05/18 → 30/04/21
Project: Research
ALDCoE: Finnish Centre of Excellence in Atomic Layer Deposition
Ylivaara, O. M. E., Ahopelto, J., Puurunen, R. L. & Grigoras, K.
1/01/12 → 31/12/17
Project: Research
Research Output 2010 2019
81
Citations
(Scopus)
Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion
Ylivaara, O. M. E., Liu, X., Kilpi, L., Lyytinen, J., Schneider, D., Laitinen, M., Julin, J., Ali, S., Sintonen, S., Berdova, M., Haimi, E., Sajavaara, T., Ronkainen, H., Lipsanen, H., Koskinen, J., Hannula, S. P. & Puurunen, R. L., 2014, In : Thin Solid Films. 552, p. 124-135 12 p.Research output: Contribution to journal › Article › Scientific › peer-review
Open Access
Atomic layer deposition
Aluminum Oxide
atomic layer epitaxy
residual stress
Residual stresses
9
Citations
(Scopus)
Aluminum oxide/titanium dioxide nanolaminates grown by atomic layer deposition: Growth and mechanical properties
Ylivaara, O. M. E., Kilpi, L., Liu, X., Sintonen, S., Ali, S., Laitinen, M., Julin, J., Haimi, E., Sajavaara, T., Lipsanen, H., Hannula, S-P., Ronkainen, H. & Puurunen, R. L., 2017, In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 35, 1, 14 p., 01B105.Research output: Contribution to journal › Article › Scientific › peer-review
Open Access
Atomic layer deposition
Aluminum Oxide
atomic layer epitaxy
titanium oxides
Titanium dioxide
Advanced Lateral High Aspect Ratio Test Structures for Conformality Characterization by Optical Microscopy
Ylivaara, O. M. E., Hyttinen, P., Arts, K., Gao, F., Erwin Kessels, W. M. M., Puurunen, R. L. & Utriainen, M., 22 Jul 2019, ALD 2019 Technical Program & Abstracts. American Vacuum Society AVSResearch output: Chapter in Book/Report/Conference proceeding › Conference abstract in proceedings › Scientific
high aspect ratio
microscopy
image analysis
atomic layer epitaxy
metrology
Al2O3 Thin Films Prepared by a Combined Thermal‐Plasma Atomic Layer Deposition Process at Low Temperature for Encapsulation Applications
Zhu, Z., Merdes, S., Ylivaara, O. M. E., Mizohata, K., Heikkilä, M. J. & Savin, H., 2019, In : Physica Status Solidi A: Applications and Materials Science. 1900237.Research output: Contribution to journal › Article › Scientific › peer-review
Atomic layer deposition
atomic layer epitaxy
Encapsulation
residual stress
Residual stresses
Al2O3 thin films prepared by a modified H2O-based PEALD for encapsulation applications
Zhu, Z., Merdes, S., Mizohata, K., Ylivaara, O. M. E., Heikkilä, M. J. & Salmi, E., 25 Jun 2019.Research output: Contribution to conference › Conference Poster › Scientific › peer-review
Activities 2018 2018
- 2 Oral presentation
Thin-Film Conformality Analysis, Reliability and Modeling using All-Silicon Lateral High Aspect Ratio Structures
Oili M.E. Ylivaara (Speaker), Virpi Korpelainen (Speaker), Markku Ylilammi (Speaker), Riikka L. Puurunen (Speaker)31 Jul 2018
Activity: Talk or presentation types › Oral presentation
Stresses in ALD films: Aiming for zero stress thin films
Riina Ritasalo (Speaker), Oili M.E. Ylivaara (Speaker), Tero Pilvi (Speaker), Tommi Suni (Speaker)31 Jul 2018
Activity: Talk or presentation types › Oral presentation