Oili M.E. Ylivaara

Research Scientist

20102021
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Fingerprint Dive into the research topics where Oili M.E. Ylivaara is active. These topic labels come from the works of this person. Together they form a unique fingerprint.

  • 40 Similar Profiles
atomic layer epitaxy Physics & Astronomy
Atomic layer deposition Engineering & Materials Science
residual stress Physics & Astronomy
thin films Physics & Astronomy
Silicon Chemical Compounds
wafers Physics & Astronomy
Thin films Engineering & Materials Science
aluminum oxides Physics & Astronomy

Projects 2012 2021

Research Output 2010 2019

82 Citations (Scopus)

Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion

Ylivaara, O. M. E., Liu, X., Kilpi, L., Lyytinen, J., Schneider, D., Laitinen, M., Julin, J., Ali, S., Sintonen, S., Berdova, M., Haimi, E., Sajavaara, T., Ronkainen, H., Lipsanen, H., Koskinen, J., Hannula, S. P. & Puurunen, R. L., 2014, In : Thin Solid Films. 552, p. 124-135 12 p.

Research output: Contribution to journalArticleScientificpeer-review

Open Access
Atomic layer deposition
Aluminum Oxide
atomic layer epitaxy
residual stress
Residual stresses
10 Citations (Scopus)

Aluminum oxide/titanium dioxide nanolaminates grown by atomic layer deposition: Growth and mechanical properties

Ylivaara, O. M. E., Kilpi, L., Liu, X., Sintonen, S., Ali, S., Laitinen, M., Julin, J., Haimi, E., Sajavaara, T., Lipsanen, H., Hannula, S-P., Ronkainen, H. & Puurunen, R. L., 2017, In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 35, 1, 14 p., 01B105.

Research output: Contribution to journalArticleScientificpeer-review

Open Access
Atomic layer deposition
Aluminum Oxide
atomic layer epitaxy
titanium oxides
Titanium dioxide

Advanced Lateral High Aspect Ratio Test Structures for Conformality Characterization by Optical Microscopy

Ylivaara, O. M. E., Hyttinen, P., Arts, K., Gao, F., Erwin Kessels, W. M. M., Puurunen, R. L. & Utriainen, M., 22 Jul 2019, ALD 2019 Technical Program & Abstracts. American Vacuum Society AVS

Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific

Open Access
high aspect ratio
microscopy
image analysis
atomic layer epitaxy
metrology

Al2O3 Thin Films Prepared by a Combined Thermal-Plasma Atomic Layer Deposition Process at Low Temperature for Encapsulation Applications

Zhu, Z., Merdes, S., Ylivaara, O. M. E., Mizohata, K., Heikkilä, M. J. & Savin, H., 12 Sep 2019, (Accepted/In press) In : Physica Status Solidi (A) Applications and Materials Science. 1900237.

Research output: Contribution to journalArticleScientificpeer-review

Plasma Gases
Plasma deposition
Atomic layer deposition
thermal plasmas
atomic layer epitaxy

Al2O3 thin films prepared by a modified H2O-based PEALD for encapsulation applications

Zhu, Z., Merdes, S., Mizohata, K., Ylivaara, O. M. E., Heikkilä, M. J. & Salmi, E., 25 Jun 2019.

Research output: Contribution to conferenceConference PosterScientificpeer-review

Activities 2018 2018

  • 2 Oral presentation

Stresses in ALD films: Aiming for zero stress thin films

Riina Ritasalo (Speaker), Oili M.E. Ylivaara (Speaker), Tero Pilvi (Speaker), Tommi Suni (Speaker)
31 Jul 2018

Activity: Talk or presentation typesOral presentation

Thin-Film Conformality Analysis, Reliability and Modeling using All-Silicon Lateral High Aspect Ratio Structures

Oili M.E. Ylivaara (Speaker), Virpi Korpelainen (Speaker), Markku Ylilammi (Speaker), Riikka L. Puurunen (Speaker)
31 Jul 2018

Activity: Talk or presentation typesOral presentation