Projects per year
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- 38 Similar Profiles
atomic layer epitaxy
Physics & Astronomy
Atomic layer deposition
Engineering & Materials Science
residual stress
Physics & Astronomy
Silicon
Chemical Compounds
wafers
Physics & Astronomy
thin films
Physics & Astronomy
aluminum oxides
Physics & Astronomy
silicon
Physics & Astronomy
Network
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Projects 2012 2017
- 1 Finished
ALDCoE: Finnish Centre of Excellence in Atomic Layer Deposition
Ylivaara, O. M. E., Ahopelto, J., Puurunen, R. L. & Grigoras, K.
1/01/12 → 31/12/17
Project: Research
Research Output 2010 2019
Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide
Zhu, Z., Sippola, P., Ylivaara, O., Modanese, C., Di Sabatino, M., Mizohata, K., Merdes, S., Lipsanen, H. & Savin, H., 2019, In : Nanoscale Research Letters. 14, 8 p., 55.Research output: Contribution to journal › Article › Research › peer-review
Open Access
Atomic layer deposition
cold plasmas
atomic layer epitaxy
Carbon Dioxide
carbon dioxide
Microelectrode Array With Transparent ALD TiN Electrodes
Ryynänen, T., Pelkonen, A., Grigoras, K., Ylivaara, O. M. E., Hyvärinen, T., Ahopelto, J., Prunnila, M., Narkilahti, S. & Lekkala, J., 22 Mar 2019, In : Frontiers in Neuroscience. 13, 226.Research output: Contribution to journal › Article › Research › peer-review
Open Access
Microelectrodes
Electrodes
Electric Impedance
Noise
Neurons
(Semi-)transparent ALD TiN microelectrodes
Ryynänen, T., Pelkonen, A., Grigoras, K., Ylivaara, O., Ahopelto, J., Prunnila, M., Narkilahti, S. & Lekkala, J., 27 Jul 2018, Front. Cell. Neurosci. Conference Abstract: MEA Meeting 2018, 11th International Meeting on Substrate Integrated Microelectrode Arrays. Frontiers Media, (Frontiers in Cellular Neuroscience ).Research output: Chapter in Book/Report/Conference proceeding › Conference abstract in proceedings › Research › peer-review
Open Access
Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films
Sippola, P., Pyymäki Perros, A., Ylivaara, O., Ronkainen, H., Julin, J., Liu, X., Sajavaara, T., Etula, J., Lipsanen, H. & Puurunen, R. L., 30 Jul 2018, In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 36, 5, 12 p., 051508.Research output: Contribution to journal › Article › Research › peer-review
Open Access
Aluminum nitride
Atomic layer deposition
aluminum nitrides
atomic layer epitaxy
mechanical properties
2
Citations
(Scopus)
Modeling growth kinetics of thin films made by atomic layer deposition in lateral high-aspect-ratio structures
Ylilammi, M., Ylivaara, O. M. E. & Puurunen, R. L., 28 May 2018, In : Journal of Applied Physics. 123, 20, 205301.Research output: Contribution to journal › Article › Research › peer-review
atomic layer epitaxy
high aspect ratio
kinetics
thin films
adsorption
Activities 2018 2018
- 2 Oral presentation
Stresses in ALD films: Aiming for zero stress thin films
Riina Ritasalo (Speaker), Oili M.E. Ylivaara (Speaker), Tero Pilvi (Speaker), Tommi Suni (Speaker)31 Jul 2018
Activity: Talk or presentation types › Oral presentation
Thin-Film Conformality Analysis, Reliability and Modeling using All-Silicon Lateral High Aspect Ratio Structures
Oili M.E. Ylivaara (Speaker), Virpi Korpelainen (Speaker), Markku Ylilammi (Speaker), Riikka L. Puurunen (Speaker)31 Jul 2018
Activity: Talk or presentation types › Oral presentation