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Oili M.E. Ylivaara

Research Scientist

 https://orcid.org/0000-0001-7197-9066
20102019
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  • 33 Similar Profiles
atomic layer epitaxy Physics & Astronomy
Atomic layer deposition Engineering & Materials Science
residual stress Physics & Astronomy
Silicon Chemical Compounds
wafers Physics & Astronomy
thin films Physics & Astronomy
aluminum oxides Physics & Astronomy
silicon Physics & Astronomy

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Projects 2012 2017

ALDCoE: Finnish Centre of Excellence in Atomic Layer Deposition

Ylivaara, O., Ahopelto, J., Puurunen, R. L. & Grigoras, K.

1/01/12 → 31/12/17

Project: Research › Finnish Academy of Sciences Project

Research Output 2010 2019

65 Citations

Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion

Ylivaara, O. M. E., Liu, X., Kilpi, L., Lyytinen, J., Schneider, D., Laitinen, M., Julin, J., Ali, S., Sintonen, S., Berdova, M., Haimi, E., Sajavaara, T., Ronkainen, H., Lipsanen, H., Koskinen, J., Hannula, S. P. & Puurunen, R. L., 2014, In : Thin Solid Films. 552, p. 124-135 12 p.

Research output: Contribution to journal › Article › Research › peer-review

Open Access
Atomic layer deposition
Aluminum Oxide
atomic layer epitaxy
residual stress
Residual stresses
7 Citations

Aluminum oxide/titanium dioxide nanolaminates grown by atomic layer deposition: Growth and mechanical properties

Ylivaara, O. M. E., Kilpi, L., Liu, X., Sintonen, S., Ali, S., Laitinen, M., Julin, J., Haimi, E., Sajavaara, T., Lipsanen, H., Hannula, S-P., Ronkainen, H. & Puurunen, R. L., 2017, In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 35, 1, 14 p., 01B105.

Research output: Contribution to journal › Article › Research › peer-review

Open Access
Atomic layer deposition
Aluminum Oxide
atomic layer epitaxy
titanium oxides
Titanium dioxide
14 Citations

Silicon full wafer bonding with atomic layer deposited titanium dioxide and aluminum oxide intermediate films

Puurunen, R. L., Suni, T., Ylivaara, O. M. E., Kondo, H., Ammar, M., Ishida, T., Fujita, H., Bosseboeuf, A., Zaima, S. & Kattelus, H., 11 May 2012, In : Sensors and Actuators A: Physical. 188, p. 268-276 9 p.

Research output: Contribution to journal › Article › Research › peer-review

Wafer bonding
Aluminum Oxide
Silicon
titanium oxides
Titanium dioxide
18 Citations

Review Article: Recommended reading list of early publications on atomic layer deposition: Outcome of the "Virtual Project on the History of ALD"

Ahvenniemi, E., Akbashev, A., Ali, S., Bechelany, M., Berdova, M., Boyadjiev, S., Cameron, D., Chen, R., Chubarov, M., Cremers, V., Devi, A., Drozd, V., Elnikova, L., Gottardi, G., Grigoras, K., Hausmann, D., Hwang, C. S., Jen, S-H., Kallio, T., Kanervo, J. & 42 othersKhmelnitskiy, I., Kim, D. H., Klibanov, L., Koshtyal, Y., Krause, O., Kuhs, J., Kärkkänen, I., Kääriäinen, M-L., Kääriäinen, T., Lamagna, L., Lapicki, A., Leskelä, M., Lipsanen, H., Lyytinen, J., Malkov, A., Malygin, A., Mennad, A., Militzer, C., Molarius, J., Norek, M., Özgit-Akgün, Ç., Panov, M., Pedersen, H., Piallat, F., Popov, G., Puurunen, R., Rampelberg, G., Ras, R. H. A., Rauwel, E., Roozeboom, F., Sajavaara, T., Salami, H., Savin, H., Schneider, N., Seidel, T. E., Sundqvist, J., Suyatin, D., Törndahl, T., van Ommen, J. R., Wiemer, C., Ylivaara, O. & Yurkevich, O., 1 Jan 2017, In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 35, 1, 010801.

Research output: Contribution to journal › Article › Research › peer-review

Open Access
Atomic layer deposition
atomic layer epitaxy
lists
histories
Atomic layer epitaxy
1 Citations

Tribological properties of thin films made by atomic layer deposition sliding against silicon

Kilpi, L., Ylivaara, O. M. E., Vaajoki, A., Liu, X., Rontu, V., Sintonen, S., Haimi, E., Malm, J., Bosund, M., Tuominen, M., Sajavaara, T., Lipsanen, H., Hannula, S. P., Puurunen, R. L. & Ronkainen, H., 1 Jan 2018, In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 36, 1, 01A122.

Research output: Contribution to journal › Article › Research › peer-review

Atomic layer deposition
Silicon
atomic layer epitaxy
sliding
coatings

Activities 2018 2018

  • 2 Oral presentation

Stresses in ALD films: Aiming for zero stress thin films

Riina Ritasalo (Speaker), Oili M.E. Ylivaara (Speaker), Tero Pilvi (Speaker), Tommi Suni (Speaker)
31 Jul 2018

Activity: Talk or presentation types › Oral presentation

Thin-Film Conformality Analysis, Reliability and Modeling using All-Silicon Lateral High Aspect Ratio Structures

Oili M.E. Ylivaara (Speaker), Virpi Korpelainen (Speaker), Markku Ylilammi (Speaker), Riikka L. Puurunen (Speaker)
31 Jul 2018

Activity: Talk or presentation types › Oral presentation