Oili M.E. Ylivaara

Research Scientist

20102021
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Research Output 2010 2019

2014

Residual stresses in atomic layer-deposited tantalum oxide thin films

Härkönen, E., Ylivaara, O., Puurunen, R. L., Heikkilä, M. J. & Ritala, M., 2014, BALD2014 Abstract book.

Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific

Temperature dependence of the mechanical properties of ALD TiO2 from TiCl4 and H2O on silicon

Ylivaara, O., Liu, X., Kilpi, L., Schneider, D., Laitinen, M., Julin, J., Ali, S., Sintonen, S., Haimi, E., Sajavaara, T., Lipsanen, H., Ronkainen, H., Hannula, S-P. & Puurunen, R. L., 2014, BALD2014 Abstract book.

Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific

30 Citations (Scopus)

Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors

Putkonen, M., Bosund, M., Ylivaara, O. M. E., Puurunen, R. L., Kilpi, L., Ronkainen, H., Sintonen, S., Ali, S., Lipsanen, H., Liu, X., Haimi, E., Hannula, S. P., Sajavaara, T., Buchanan, I., Karwacki, E. & Vähä-Nissi, M., 2014, In : Thin Solid Films. 558, p. 93-98 6 p.

Research output: Contribution to journalArticleScientificpeer-review

Plasma Gases
Atomic layer deposition
Silicon
atomic layer epitaxy
Plasmas

Titanium nitride by atomic layer deposition: mechanical properties

Puurunen, R. L., Ylivaara, O., Liu, X., Schneider, D., Julin, J., Sintonen, S., Marchand, B., Jalkanen, P., Haimi, E., Tuominen, M., Räisänen, J., Sajavaara, T., Lipsanen, H. & Hannula, S-P., 2014, Technical Program & Abstracts. American Vacuum Society AVS

Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific

Tribological Performance of ALD Al2O3, TiO2 and ATO nanolaminate coatings

Kilpi, L., Vaajoki, A., Varjus, S., Ylivaara, O., Puurunen, R. L. & Ronkainen, H., 2014, BALD2014 Abstract book.

Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific

15 Citations (Scopus)

X-ray reflectivity characterization of atomic layer deposition Al 2O3/TiO2 nanolaminates with ultrathin bilayers

Sintonen, S., Ali, S., Ylivaara, O. M. E., Puurunen, R. L. & Lipsanen, H., 2014, In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 32, 1, 01A111.

Research output: Contribution to journalArticleScientificpeer-review

Atomic layer deposition
atomic layer epitaxy
reflectance
X rays
x rays
2013

Al2O3/TiO2 Nanolaminates by Atomic Layer Deposition: A Study on the Laminate Structure and Mechanical Property

Liu, X., Sintonen, S., Haimi, E., Laitinen, M., Ali, S., Julin, J., Ylivaara, O., Lipsanen, H., Sajavaara, T., Puurunen, R. L. & Hannula, S-P., 2013, International Workshop on the Mechanical Behavior of Nanoscale Multilayers.

Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific

atomic layer epitaxy
laminates
mechanical properties
modulus of elasticity
hardness

ALD Al2O3/TiO2 nanolaminates on Si: residual stress, elastic modulus, hardness and adhesion

Ylivaara, O., Liu, X., Ali, S., Sintonen, S., Laitinen, M., Julin, J., Kilpi, L., Sajavaara, T., Haimi, E., Ronkainen, H., Lipsanen, H., Hannula, S-P. & Puurunen, R. L., 2 Sep 2013, 19th European Conference on Chemical Vapor Deposition (EuroCVD 19). Elsevier

Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

ALD Al2O3 from TMA and water on Si: residual stress, elastic modulus, hardness and adhesion: residual stress, elastic modulus, hardness and adhesion

Ylivaara, O., Liu, X., Kilpi, L., Lyytinen, J., Schneider, D., Laitinen, M., Julin, J., Ali, S., Sintonen, S., Berdova, M., Haimi, E., Sajavaara, T., Ronkainen, H., Lipsanen, H., Koskinen, J., Hannula, S-P. & Puurunen, R. L., 2013, Technical Program & Abstracts, published abstract of a poster. American Vacuum Society AVS

Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific

atomic layer epitaxy
residual stress
modulus of elasticity
adhesion
hardness

Properties of low temperature PEALD SiO2

Putkonen, M., Puurunen, R. L., Ylivaara, O., Bosund, M., Sajavaara, T. & Vähä-Nissi, M., 2013, Technical Program & Abstracts. American Vacuum Society AVS

Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific

Contact angle
Hydrogen
Temperature
Impurities
Carbon

Screening of ALD thin films for Cu diffusion barrier applications

Puurunen, R. L., Salonen, J., Nurmela, A., Ylivaara, O., Viljanen, H., Molarius, J., Monnoyer, P., Yliniemi, S., Pudas, M., Lehto, T., Lehto, T. & Li, W-M., 2013, Technical Program & Abstracts. American Vacuum Society AVS

Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific

XRR characterization of ALD TiO2/Al2O3 nanolaminates with ultra-thin bilayers

Sintonen, S., Ali, S., Ylivaara, O., Puurunen, R. L. & Lipsanen, H., 2013, Technical Program & Abstracts, published abstract of a poster. American Vacuum Society AVS

Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific

reflectance
x rays
target thickness
sharpness
laminates
2012

Adhesion performance and tribological properties of atomic layer deposited aluminum oxide films

Ronkainen, H., Kilpi, L., Vaajoki, A., Varjus, S., Ylivaara, O. & Puurunen, R. L., 2012, Technical Program & Abstracts. American Vacuum Society AVS

Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific

oxide films
adhesion
aluminum oxides
coatings
friction

On the nanoindentation characterization of Al2O3 thin films grown on Si-wafer by atomic layer deposition

Liu, X., Haimi, E., Hannula, S-P., Puurunen, R. L. & Ylivaara, O., 2012, Technical Program & Abstracts. American Vacuum Society AVS

Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific

unloading
atomic layer epitaxy
nanoindentation
wafers
coatings
14 Citations (Scopus)

Silicon full wafer bonding with atomic layer deposited titanium dioxide and aluminum oxide intermediate films

Puurunen, R. L., Suni, T., Ylivaara, O. M. E., Kondo, H., Ammar, M., Ishida, T., Fujita, H., Bosseboeuf, A., Zaima, S. & Kattelus, H., 11 May 2012, In : Sensors and Actuators A: Physical. 188, p. 268-276 9 p.

Research output: Contribution to journalArticleScientificpeer-review

Wafer bonding
Aluminum Oxide
Silicon
titanium oxides
Titanium dioxide

Stress in atomic layer deposited aluminium oxide and titanium dioxide thin films

Ylivaara, O., Puurunen, R. L., Laitinen, M., Sintonen, S., Ali, S., Sajavaara, T., Lipsanen, H. & Kiihamäki, J., 2012, Technical Program and Abstracts. American Vacuum Society AVS

Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific

dioxides
titanium oxides
aluminum oxides
thin films
temperature
2011
5 Citations (Scopus)

Direct wafer bonding of atomic layer deposited TiO2 and Al 2O3 thin films

Puurunen, R. L., Suni, T., Ylivaara, O., Kondo, H., Ammar, M., Ishida, T., Fujita, H., Bosseboeuf, A., Zaima, S. & Kattelus, H., 1 Aug 2011, 2011 16th International Solid-State Sensors, Actuators and Microsystems Conference, TRANSDUCERS'11. p. 978-981 4 p. 5969474

Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

Wafer bonding
Thin films
Silicon
Silicon wafers
MEMS
2010
7 Citations (Scopus)

Bonding of ALD alumina for advanced SOI substrates

Suni, T., Puurunen, R. L., Ylivaara, O., Kattelus, H., Henttinen, K., Ishida, T. & Fujita, H., 15 Oct 2010, Semiconductor Wafer Bonding 11: Science, Technology, and Applications - In Honor of Ulrich Gosele. 4 ed. Vol. 33. p. 137-144 8 p.

Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

Atomic layer deposition
Alumina
Silicon
Substrates
Thin films

Direct wafer bonding of ALD Al2O3

Suni, T., Puurunen, R. L., Ylivaara, O., Henttinen, K., Ishida, T. & Fujita, H., 19 Jan 2010, IEEE Workshop on Low Temperature Bonding for 3D Integration Book of Abstracts. p. 211-223

Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific

atomic layer epitaxy
wafers
argon plasma
annealing
scanning