Oili M.E. Ylivaara

Research Scientist

20102021
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Research Output 2010 2019

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Conference Abstract
2019

Stresses in ALD films: aiming for zero stress thin films

Ritasalo, R., Ylivaara, O. M. E., Pilvi, T., Suni, T. & Veselov, A., 14 May 2019.

Research output: Contribution to conferenceConference AbstractScientificpeer-review

2018

PillarHall LHAR structure for thin film conformality measurements

Korpelainen, V., Ylivaara, O., Ylilammi, M., Utriainen, M., Gao, F. & Puurunen, R. L., 14 May 2018.

Research output: Contribution to conferenceConference AbstractScientificpeer-review

PillarHall LHAR structure for Thin Film Conformality Measurements

Utriainen, M., Korpelainen, V., Ylivaara, O., Gao, F., Ylilammi, M. & Puurunen, R. L., 13 May 2018, p. 16.

Research output: Contribution to conferenceConference AbstractScientificpeer-review

Open Access
Aspect ratio
Thin films
Silicon
Atomic layer deposition
MEMS

Stresses in ALD films: Aiming for zero stress thin films

Ritasalo, R., Ylivaara, O., Pilvi, T. & Suni, T., 16 Oct 2018.

Research output: Contribution to conferenceConference AbstractScientificpeer-review

Stresses in ALD films: Aiming for zero stress thin films

Ritasalo, R., Ylivaara, O., Pilvi, T. & Suni, T., 29 Jul 2018, p. 49.

Research output: Contribution to conferenceConference AbstractScientificpeer-review

Open Access
atomic layer epitaxy
thin films
residual stress
microelectromechanical systems
metal oxides

Thin-Film Conformality Analysis, Reliability and Modeling using All-Silicon Lateral High Aspect Ratio Structures

Ylivaara, O., Korpelainen, V., Ylilammi, M. & Puurunen, R. L., 29 Jul 2018, p. 51.

Research output: Contribution to conferenceConference AbstractScientificpeer-review

Open Access
Reliability analysis
Aspect ratio
Thin films
Silicon
Atomic layer deposition
2017

Bulge testing of freestanding ALD thin film membranes

Ylivaara, O., Törmä, P., Stuns, I., Saarilahti, J. & Puurunen, R., 2017.

Research output: Contribution to conferenceConference AbstractScientificpeer-review

Thin film conformality analysis with microscopic all-silicon lateral high aspect ratio structures

Puurunen, R., Ylivaara, O. & Ylilammi, M., 2017.

Research output: Contribution to conferenceConference AbstractScientific

Thin film conformality analysis with microscopic all-silicon lateral high aspect ratio structures

Puurunen, R., Ylivaara, O., Grigoras, K. & Ylilammi, M., 2017.

Research output: Contribution to conferenceConference AbstractScientificpeer-review

Traceability of internal length scale in PillarHall thin film conformality test chips

Korpelainen, V., Gao, F., Laamanen, M., Ylivaara, O. M. E., Sundqvist, J., Utriainen, M. & Puurunen, R. L., 2017.

Research output: Contribution to conferenceConference AbstractScientific

Open Access

XeF2 etching of silicon using ALD films as etch stop layers

Ylivaara, O., Saarilahti, J. & Puurunen, R., 2017.

Research output: Contribution to conferenceConference AbstractScientificpeer-review

2016

Study of processing parameters on the mechanical and compositional properties of plasma-enhanced atomic layer deposition aluminum nitride films

Pyymaki-Perros, A., Ylivaara, O., Liu, X., Julin, J., Sajavaara, T., Ali, S., Sintonen, S., Lipsanen, H. & Puurunen, R. L., 2016.

Research output: Contribution to conferenceConference AbstractScientificpeer-review

aluminum nitrides
atomic layer epitaxy
mechanical properties
electric potential
plasma chemistry