Oili M.E. Ylivaara

Research Scientist

20102021
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Research Output 2010 2019

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2019

Al2O3 Thin Films Prepared by a Combined Thermal-Plasma Atomic Layer Deposition Process at Low Temperature for Encapsulation Applications

Zhu, Z., Merdes, S., Ylivaara, O. M. E., Mizohata, K., Heikkilä, M. J. & Savin, H., 12 Sep 2019, (Accepted/In press) In : Physica Status Solidi (A) Applications and Materials Science. 1900237.

Research output: Contribution to journalArticleScientificpeer-review

Plasma Gases
Plasma deposition
Atomic layer deposition
thermal plasmas
atomic layer epitaxy

Intercalation of Lithium Ions from Gaseous Precursors into β-MnO 2 Thin Films Deposited by Atomic Layer Deposition

Nieminen, H-E., Miikkulainen, V., Settipani, D., Simonelli, L., Hönicke, P., Zech, C., Kayser, Y., Beckhoff, B., Honkanen, A-P., Heikkilä, M. J., Mizohata, K., Meinander, K., Ylivaara, O. M. E., Huotari, S. & Ritala, M., 27 Jun 2019, In : Journal of Physical Chemistry C. 123, 25, p. 15802-15814 13 p.

Research output: Contribution to journalArticleScientificpeer-review

Atomic layer deposition
Intercalation
atomic layer epitaxy
Lithium
intercalation

Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO2 Using Carbon Dioxide

Zhu, Z., Sippola, P., Ylivaara, O., Modanese, C., Di Sabatino, M., Mizohata, K., Merdes, S., Lipsanen, H. & Savin, H., 2019, In : Nanoscale Research Letters. 14, 8 p., 55.

Research output: Contribution to journalArticleScientificpeer-review

Open Access
Atomic layer deposition
cold plasmas
atomic layer epitaxy
Carbon Dioxide
carbon dioxide

Microelectrode Array With Transparent ALD TiN Electrodes

Ryynänen, T., Pelkonen, A., Grigoras, K., Ylivaara, O. M. E., Hyvärinen, T., Ahopelto, J., Prunnila, M., Narkilahti, S. & Lekkala, J., 22 Mar 2019, In : Frontiers in Neuroscience. 13, 226.

Research output: Contribution to journalArticleScientificpeer-review

Open Access
Microelectrodes
Electrodes
Electric Impedance
Noise
Neurons
2018
1 Citation (Scopus)

Comparison of mechanical properties and composition of magnetron sputter and plasma enhanced atomic layer deposition aluminum nitride films

Sippola, P., Pyymäki Perros, A., Ylivaara, O., Ronkainen, H., Julin, J., Liu, X., Sajavaara, T., Etula, J., Lipsanen, H. & Puurunen, R. L., 30 Jul 2018, In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 36, 5, 12 p., 051508.

Research output: Contribution to journalArticleScientificpeer-review

Open Access
Aluminum nitride
Atomic layer deposition
aluminum nitrides
atomic layer epitaxy
mechanical properties
10 Citations (Scopus)

Modeling growth kinetics of thin films made by atomic layer deposition in lateral high-aspect-ratio structures

Ylilammi, M., Ylivaara, O. M. E. & Puurunen, R. L., 28 May 2018, In : Journal of Applied Physics. 123, 20, 205301.

Research output: Contribution to journalArticleScientificpeer-review

atomic layer epitaxy
high aspect ratio
kinetics
thin films
adsorption
1 Citation (Scopus)

Tribological properties of thin films made by atomic layer deposition sliding against silicon

Kilpi, L., Ylivaara, O. M. E., Vaajoki, A., Liu, X., Rontu, V., Sintonen, S., Haimi, E., Malm, J., Bosund, M., Tuominen, M., Sajavaara, T., Lipsanen, H., Hannula, S. P., Puurunen, R. L. & Ronkainen, H., 1 Jan 2018, In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 36, 1, 01A122.

Research output: Contribution to journalArticleScientificpeer-review

Atomic layer deposition
Silicon
atomic layer epitaxy
sliding
coatings
2017
10 Citations (Scopus)

Aluminum oxide/titanium dioxide nanolaminates grown by atomic layer deposition: Growth and mechanical properties

Ylivaara, O. M. E., Kilpi, L., Liu, X., Sintonen, S., Ali, S., Laitinen, M., Julin, J., Haimi, E., Sajavaara, T., Lipsanen, H., Hannula, S-P., Ronkainen, H. & Puurunen, R. L., 2017, In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 35, 1, 14 p., 01B105.

Research output: Contribution to journalArticleScientificpeer-review

Open Access
Atomic layer deposition
Aluminum Oxide
atomic layer epitaxy
titanium oxides
Titanium dioxide
2016
13 Citations (Scopus)

Microscratch testing method for systematic evaluation of the adhesion of atomic layer deposited thin films on silicon

Kilpi, L., Ylivaara, O. M. E., Vaajoki, A., Malm, J., Sintonen, S., Tuominen, M., Puurunen, R. L. & Ronkainen, H., 2016, In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 34, 1, 01A124.

Research output: Contribution to journalArticleScientificpeer-review

Open Access
Silicon
adhesion
Adhesion
coatings
Thin films
11 Citations (Scopus)

Thermal conductivity of amorphous Al2O3/ TiO2 nanolaminates deposited by atomic layer deposition

Ali, S., Juntunen, T., Sintonen, S., Ylivaara, O., Puurunen, R., Lipsanen, H., Tittonen, I. & Hannula, S-P., 2016, In : Nanotechnology. 27, 445704.

Research output: Contribution to journalArticleScientificpeer-review

Atomic layer deposition
Thermal conductivity
Amorphous films
Temperature
Thermodynamic properties
2015
6 Citations (Scopus)

Fracture properties of atomic layer deposited aluminum oxide free-standing membranes

Berdova, M., Ylivaara, O. M. E., Rontu, V., Törmä, P. T., Puurunen, R. L. & Franssila, S., 2015, In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 33, 1, 01A106.

Research output: Contribution to journalArticleScientificpeer-review

Aluminum Oxide
fracture strength
Fracture toughness
aluminum oxides
membranes
9 Citations (Scopus)

Nanotribological, nanomechanical and interfacial characterization of Atomic Layer Deposited TiO2 on a silicon substrate

Lyytinen, J., Liu, X., Ylivaara, O. M. E., Sintonen, S., Iyer, A., Ali, S., Julin, J., Lipsanen, H., Sajavaara, T., Puurunen, R. L. & Koskinen, J., 2015, In : Wear. 342-343, p. 270-278 9 p.

Research output: Contribution to journalArticleScientificpeer-review

Silicon
silicon
Substrates
Wear of materials
coatings
2014
82 Citations (Scopus)

Aluminum oxide from trimethylaluminum and water by atomic layer deposition: The temperature dependence of residual stress, elastic modulus, hardness and adhesion

Ylivaara, O. M. E., Liu, X., Kilpi, L., Lyytinen, J., Schneider, D., Laitinen, M., Julin, J., Ali, S., Sintonen, S., Berdova, M., Haimi, E., Sajavaara, T., Ronkainen, H., Lipsanen, H., Koskinen, J., Hannula, S. P. & Puurunen, R. L., 2014, In : Thin Solid Films. 552, p. 124-135 12 p.

Research output: Contribution to journalArticleScientificpeer-review

Open Access
Atomic layer deposition
Aluminum Oxide
atomic layer epitaxy
residual stress
Residual stresses
4 Citations (Scopus)

On the reliability of nanoindentation hardness of Al2O3 films grown on Si-wafer by atomic layer deposition

Liu, X., Haimi, E., Hannula, S. P., Ylivaara, O. M. E. & Puurunen, R. L., 2014, In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 32, 1, 01A116.

Research output: Contribution to journalArticleScientificpeer-review

Atomic layer deposition
Nanoindentation
atomic layer epitaxy
nanoindentation
Film thickness
30 Citations (Scopus)

Thermal and plasma enhanced atomic layer deposition of SiO2 using commercial silicon precursors

Putkonen, M., Bosund, M., Ylivaara, O. M. E., Puurunen, R. L., Kilpi, L., Ronkainen, H., Sintonen, S., Ali, S., Lipsanen, H., Liu, X., Haimi, E., Hannula, S. P., Sajavaara, T., Buchanan, I., Karwacki, E. & Vähä-Nissi, M., 2014, In : Thin Solid Films. 558, p. 93-98 6 p.

Research output: Contribution to journalArticleScientificpeer-review

Plasma Gases
Atomic layer deposition
Silicon
atomic layer epitaxy
Plasmas
15 Citations (Scopus)

X-ray reflectivity characterization of atomic layer deposition Al 2O3/TiO2 nanolaminates with ultrathin bilayers

Sintonen, S., Ali, S., Ylivaara, O. M. E., Puurunen, R. L. & Lipsanen, H., 2014, In : Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films. 32, 1, 01A111.

Research output: Contribution to journalArticleScientificpeer-review

Atomic layer deposition
atomic layer epitaxy
reflectance
X rays
x rays
2012
14 Citations (Scopus)

Silicon full wafer bonding with atomic layer deposited titanium dioxide and aluminum oxide intermediate films

Puurunen, R. L., Suni, T., Ylivaara, O. M. E., Kondo, H., Ammar, M., Ishida, T., Fujita, H., Bosseboeuf, A., Zaima, S. & Kattelus, H., 11 May 2012, In : Sensors and Actuators A: Physical. 188, p. 268-276 9 p.

Research output: Contribution to journalArticleScientificpeer-review

Wafer bonding
Aluminum Oxide
Silicon
titanium oxides
Titanium dioxide