Finnish Centre of Excellence in Atomic Layer Deposition

    Project: Research

    Project Details


    Research of the CoE focuses on Atomic Layer Deposition (ALD) which is one of the key methods among thin film technologies. The CoE groups are worldwide known and recognized actors in ALD. Research of the CoE in ALD is focused on four areas:

    1. ALD precursors and processes
    2. Micro- and nanostructures
    3. Materials for electronics
    4. Materials for energy technologies

    The precursor and process development is focused on materials which are needed in electronics and energy technologies. As examples chalcogenide materials for phase change memories, III-V semiconductors, lithium compounds for thin film Li-ion batteries and new materials for all solid state 3D solar cells, can be mentioned. Fabrication of 3D micro- and nanostructures, needed in applications, will also be studied. 3D devices (MEMS, NEMS) have important applications for example in sensors.
    Effective start/end date1/01/1231/12/17

    Research Output

    • 2 Conference Abstract
    • 2 Conference article
    • 1 Conference Poster
    • 1 Article in a proceedings journal

    (Semi-)transparent ALD TiN microelectrodes

    Ryynänen, T., Pelkonen, A., Grigoras, K., Ylivaara, O., Ahopelto, J., Prunnila, M., Narkilahti, S. & Lekkala, J., 27 Jul 2018.

    Research output: Contribution to conferenceConference PosterScientificpeer-review

    Open Access

    Sensors for Thermal Characterization of Solid and Liquid Samples by 3-Omega Method

    Grigoras, K., Varpula, A., Grosse, C., May, D., Ras, M. A. & Prunnila, M., 28 Nov 2018, In : Proceedings. 2, 13, 5 p., 883.

    Research output: Contribution to journalArticle in a proceedings journalScientificpeer-review

    Open Access
  • Bulge testing of freestanding ALD thin film membranes

    Ylivaara, O., Törmä, P., Stuns, I., Saarilahti, J. & Puurunen, R., 2017.

    Research output: Contribution to conferenceConference AbstractScientificpeer-review