Project Details
Description
Tools for the development of optical materials with tailored properties
Optics and semiconductor industries make increasing use of innovative materials and complex nanostructures. However, the optical properties of these are currently difficult to measure and often not accurately known.
Project develops traceable metrology and advanced mathematical methods to characterize these materials for wavelength ranges from soft-X ray to IR.
VTT MIKES will design, fabricate and test reference samples and further develop its ellipsometer and scatterometer for traceable characterization of optical constants.
Call 2020: Metrology for Industry
This project has received funding from the EMPIR programme co-financed by the Participating States and from the European Union’s Horizon 2020 research and innovation programme.
Optics and semiconductor industries make increasing use of innovative materials and complex nanostructures. However, the optical properties of these are currently difficult to measure and often not accurately known.
Project develops traceable metrology and advanced mathematical methods to characterize these materials for wavelength ranges from soft-X ray to IR.
VTT MIKES will design, fabricate and test reference samples and further develop its ellipsometer and scatterometer for traceable characterization of optical constants.
Call 2020: Metrology for Industry
This project has received funding from the EMPIR programme co-financed by the Participating States and from the European Union’s Horizon 2020 research and innovation programme.
| Acronym | ATMOC |
|---|---|
| Status | Finished |
| Effective start/end date | 1/07/21 → 30/06/24 |
Collaborative partners
- German National Metrology Institute (PTB) (lead)
- Aalto University (Project partner)
- Federal Institute for Materials Research and Testing Berlin (BAM) (Project partner)
- Danish National Metrology Institute (DFM) (Project partner)
- TÜBİTAK National Metrology Institute (UME) (Project partner)
- Dutch Metrology Institute (VSL) (Project partner)
- Commissariat a l'Energie Atomique et aux Energies Alternatives (CEA) (Project partner)
- French National Center for Scientific Research (CNRS) (Project partner)
- Friedrich Schiller University Jena (Project partner)
- Forschungsverbund Berlin e.V. (Project partner)
- Interuniversitair Micro-Electronica Centrum (IMEC) (Project partner)
- JCMwave GmbH (Project partner)
- Johannes Kepler University of Linz (Project partner)
- Delft University of Technology (Project partner)
- Technical University of Berlin (Project partner)
- University of Twente (Project partner)
- RWTH Aachen University (Project partner)
- Carl Zeiss SMT GmbH (Project partner)
Funding
- EURAMET e.V.
Keywords
- optical constants
- nanofilms
- ellipsometer
- scatterometer
Research output
- 2 Article
-
Artificial neural network assisted spectral scatterometry for grating quality control
Mattila, A., Nysten, J., Heikkinen, V., Kilpi, J., Korpelainen, V., Hansen, P.-E., Karvinen, P., Kuittinen, M. & Lassila, A., 31 May 2024, In: Measurement Science and Technology. 35, 8, 085025.Research output: Contribution to journal › Article › Scientific › peer-review
Open AccessFile6 Link opens in a new tab Citations (Scopus)106 Downloads (Pure) -
Characterization of PillarHall test chip structures using a reflectometry technique
Danilenko, A., Rastgou, M., Manoocheri, F., Kinnunen, J., Korpelainen, V., Lassila, A. & Ikonen, E., Sept 2023, In: Measurement Science and Technology. 34, 9, 094006.Research output: Contribution to journal › Article › Scientific › peer-review
Open Access3 Link opens in a new tab Citations (Scopus)
Projects
- 1 Finished
-
EMPIR: European Metrology Programme for Innovation and Research (EMPIR)
Heinonen, M. (Owner) & Nyholm, K. (PI)
15/05/14 → 31/12/24
Project: EU project