0.6V threshold voltage thin film transistors with solution processable indium oxide (In2O3) Channel and Anodized High-κ Al2O3 Dielectric

Sagar R. Bhalerao, Donald Lupo, Amirali Zangiabadi, Ioannis Kymissis, Jaakko Leppaniemi, Ari Alastalo, Paul R. Berger

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