Abstract
In this work, we report a method to fabricate 3D polymer stamps by
combining thermal SSIL and UV Step and Stamp Imprint Lithography (UV-SSIL). In
the first step 100 x 100 mm2 PET substrate was patterned by thermal SSIL
using a small silicon stamp with micron scale test structures. In the second
step submicron features of a quartz stamp were added into the PET substrate by
UV-SSIL. Finally, the patterned PET substrate consists of micron scale
recessed and submicron scale elevated features.
Original language | English |
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Publication status | Published - 2009 |
MoE publication type | Not Eligible |
Event | 35th International Conference on Micro & Nano Engineering, MNE 2009 - Ghent, Belgium Duration: 28 Sept 2009 → 1 Oct 2009 |
Conference
Conference | 35th International Conference on Micro & Nano Engineering, MNE 2009 |
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Country/Territory | Belgium |
City | Ghent |
Period | 28/09/09 → 1/10/09 |
Keywords
- Nanoimprint lithography
- UV imprinting