INIS
hydrogen
100%
kev range
100%
resist
100%
electron beams
100%
levels
40%
solutions
20%
performance
20%
applications
20%
environment
20%
x radiation
20%
thickness
20%
devices
20%
aspect ratio
20%
carbon dioxide
20%
dimensions
20%
fabrication
20%
crystals
20%
lenses
20%
nanoelectromechanical systems
20%
Keyphrases
Electron Beam Lithography
100%
3D Nanostructure
100%
Hydrogen Silsesquioxane
100%
Three-dimensional (3D)
40%
High Aspect Ratio
20%
Two-level
20%
Nanostructures
20%
Carbon Dioxide
20%
Three-level
20%
Photonic Crystal
20%
Lateral Dimension
20%
Nanoelectromechanical Systems
20%
High Contrast
20%
Diffractive
20%
Multiple Steps
20%
X-ray Lens
20%
Resist Thickness
20%
Engineering
Electron Optical Lithography
100%
Potential Application
50%
Photonics
50%
Nanoelectromechanical System
50%
High Aspect Ratio
50%
Material Science
Silsesquioxane
100%
Electron Optical Lithography
100%
Photonic Crystal
20%
Nanoelectromechanical System
20%
Carbon Dioxide
20%