Acoustic phonon propagation in ultra-thin Si membranes under biaxial stress field

B. Graczykowski (Corresponding Author), J. Gomis-Bresco, F. Alzina, J. Reparaz, Andrey Shchepetov, Mika Prunnila, Jouni Ahopelto, C.M. Sotomayor Torres

Research output: Contribution to journalArticleScientificpeer-review

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Abstract

We report on stress induced changes in the dispersion relations of acoustic phonons propagating in 27 nm thick single crystalline Si membranes. The static tensile stress (up to 0.3 GPa) acting on the Si membranes was achieved using an additional strain compensating silicon nitride frame. Dispersion relations of thermally activated hypersonic phonons were measured by means of Brillouin light scattering spectroscopy. The theory of Lamb wave propagation is developed for anisotropic materials subjected to an external static stress field. The dispersion relations were calculated using the elastic continuum approximation and taking into account the acousto-elastic effect. We find an excellent agreement between the theoretical and the experimental dispersion relations.
Original languageEnglish
Article number073024
JournalNew Journal of Physics
Volume16
DOIs
Publication statusPublished - 2014
MoE publication typeA1 Journal article-refereed

Fingerprint

stress distribution
membranes
propagation
acoustics
phonons
Lamb waves
hypersonics
tensile stress
silicon nitrides
wave propagation
light scattering
continuums
approximation
spectroscopy

Keywords

  • acoustic phonons
  • Brillouin light scattering
  • ultra-thin Si membranes

Cite this

Graczykowski, B., Gomis-Bresco, J., Alzina, F., Reparaz, J., Shchepetov, A., Prunnila, M., ... Sotomayor Torres, C. M. (2014). Acoustic phonon propagation in ultra-thin Si membranes under biaxial stress field. New Journal of Physics, 16, [073024]. https://doi.org/10.1088/1367-2630/16/7/073024
Graczykowski, B. ; Gomis-Bresco, J. ; Alzina, F. ; Reparaz, J. ; Shchepetov, Andrey ; Prunnila, Mika ; Ahopelto, Jouni ; Sotomayor Torres, C.M. / Acoustic phonon propagation in ultra-thin Si membranes under biaxial stress field. In: New Journal of Physics. 2014 ; Vol. 16.
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abstract = "We report on stress induced changes in the dispersion relations of acoustic phonons propagating in 27 nm thick single crystalline Si membranes. The static tensile stress (up to 0.3 GPa) acting on the Si membranes was achieved using an additional strain compensating silicon nitride frame. Dispersion relations of thermally activated hypersonic phonons were measured by means of Brillouin light scattering spectroscopy. The theory of Lamb wave propagation is developed for anisotropic materials subjected to an external static stress field. The dispersion relations were calculated using the elastic continuum approximation and taking into account the acousto-elastic effect. We find an excellent agreement between the theoretical and the experimental dispersion relations.",
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Graczykowski, B, Gomis-Bresco, J, Alzina, F, Reparaz, J, Shchepetov, A, Prunnila, M, Ahopelto, J & Sotomayor Torres, CM 2014, 'Acoustic phonon propagation in ultra-thin Si membranes under biaxial stress field', New Journal of Physics, vol. 16, 073024. https://doi.org/10.1088/1367-2630/16/7/073024

Acoustic phonon propagation in ultra-thin Si membranes under biaxial stress field. / Graczykowski, B. (Corresponding Author); Gomis-Bresco, J.; Alzina, F.; Reparaz, J.; Shchepetov, Andrey; Prunnila, Mika; Ahopelto, Jouni; Sotomayor Torres, C.M.

In: New Journal of Physics, Vol. 16, 073024, 2014.

Research output: Contribution to journalArticleScientificpeer-review

TY - JOUR

T1 - Acoustic phonon propagation in ultra-thin Si membranes under biaxial stress field

AU - Graczykowski, B.

AU - Gomis-Bresco, J.

AU - Alzina, F.

AU - Reparaz, J.

AU - Shchepetov, Andrey

AU - Prunnila, Mika

AU - Ahopelto, Jouni

AU - Sotomayor Torres, C.M.

PY - 2014

Y1 - 2014

N2 - We report on stress induced changes in the dispersion relations of acoustic phonons propagating in 27 nm thick single crystalline Si membranes. The static tensile stress (up to 0.3 GPa) acting on the Si membranes was achieved using an additional strain compensating silicon nitride frame. Dispersion relations of thermally activated hypersonic phonons were measured by means of Brillouin light scattering spectroscopy. The theory of Lamb wave propagation is developed for anisotropic materials subjected to an external static stress field. The dispersion relations were calculated using the elastic continuum approximation and taking into account the acousto-elastic effect. We find an excellent agreement between the theoretical and the experimental dispersion relations.

AB - We report on stress induced changes in the dispersion relations of acoustic phonons propagating in 27 nm thick single crystalline Si membranes. The static tensile stress (up to 0.3 GPa) acting on the Si membranes was achieved using an additional strain compensating silicon nitride frame. Dispersion relations of thermally activated hypersonic phonons were measured by means of Brillouin light scattering spectroscopy. The theory of Lamb wave propagation is developed for anisotropic materials subjected to an external static stress field. The dispersion relations were calculated using the elastic continuum approximation and taking into account the acousto-elastic effect. We find an excellent agreement between the theoretical and the experimental dispersion relations.

KW - acoustic phonons

KW - Brillouin light scattering

KW - ultra-thin Si membranes

U2 - 10.1088/1367-2630/16/7/073024

DO - 10.1088/1367-2630/16/7/073024

M3 - Article

VL - 16

JO - New Journal of Physics

JF - New Journal of Physics

SN - 1367-2630

M1 - 073024

ER -