Acoustic phonon propagation in ultra-thin Si membranes under biaxial stress field

B. Graczykowski (Corresponding Author), J. Gomis-Bresco, F. Alzina, J. Reparaz, Andrey Shchepetov, Mika Prunnila, Jouni Ahopelto, C.M. Sotomayor Torres

    Research output: Contribution to journalArticleScientificpeer-review

    12 Citations (Scopus)

    Abstract

    We report on stress induced changes in the dispersion relations of acoustic phonons propagating in 27 nm thick single crystalline Si membranes. The static tensile stress (up to 0.3 GPa) acting on the Si membranes was achieved using an additional strain compensating silicon nitride frame. Dispersion relations of thermally activated hypersonic phonons were measured by means of Brillouin light scattering spectroscopy. The theory of Lamb wave propagation is developed for anisotropic materials subjected to an external static stress field. The dispersion relations were calculated using the elastic continuum approximation and taking into account the acousto-elastic effect. We find an excellent agreement between the theoretical and the experimental dispersion relations.
    Original languageEnglish
    Article number073024
    JournalNew Journal of Physics
    Volume16
    DOIs
    Publication statusPublished - 2014
    MoE publication typeA1 Journal article-refereed

    Fingerprint

    stress distribution
    membranes
    propagation
    acoustics
    phonons
    Lamb waves
    hypersonics
    tensile stress
    silicon nitrides
    wave propagation
    light scattering
    continuums
    approximation
    spectroscopy

    Keywords

    • acoustic phonons
    • Brillouin light scattering
    • ultra-thin Si membranes

    Cite this

    Graczykowski, B., Gomis-Bresco, J., Alzina, F., Reparaz, J., Shchepetov, A., Prunnila, M., ... Sotomayor Torres, C. M. (2014). Acoustic phonon propagation in ultra-thin Si membranes under biaxial stress field. New Journal of Physics, 16, [073024]. https://doi.org/10.1088/1367-2630/16/7/073024
    Graczykowski, B. ; Gomis-Bresco, J. ; Alzina, F. ; Reparaz, J. ; Shchepetov, Andrey ; Prunnila, Mika ; Ahopelto, Jouni ; Sotomayor Torres, C.M. / Acoustic phonon propagation in ultra-thin Si membranes under biaxial stress field. In: New Journal of Physics. 2014 ; Vol. 16.
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    title = "Acoustic phonon propagation in ultra-thin Si membranes under biaxial stress field",
    abstract = "We report on stress induced changes in the dispersion relations of acoustic phonons propagating in 27 nm thick single crystalline Si membranes. The static tensile stress (up to 0.3 GPa) acting on the Si membranes was achieved using an additional strain compensating silicon nitride frame. Dispersion relations of thermally activated hypersonic phonons were measured by means of Brillouin light scattering spectroscopy. The theory of Lamb wave propagation is developed for anisotropic materials subjected to an external static stress field. The dispersion relations were calculated using the elastic continuum approximation and taking into account the acousto-elastic effect. We find an excellent agreement between the theoretical and the experimental dispersion relations.",
    keywords = "acoustic phonons, Brillouin light scattering, ultra-thin Si membranes",
    author = "B. Graczykowski and J. Gomis-Bresco and F. Alzina and J. Reparaz and Andrey Shchepetov and Mika Prunnila and Jouni Ahopelto and {Sotomayor Torres}, C.M.",
    year = "2014",
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    Graczykowski, B, Gomis-Bresco, J, Alzina, F, Reparaz, J, Shchepetov, A, Prunnila, M, Ahopelto, J & Sotomayor Torres, CM 2014, 'Acoustic phonon propagation in ultra-thin Si membranes under biaxial stress field', New Journal of Physics, vol. 16, 073024. https://doi.org/10.1088/1367-2630/16/7/073024

    Acoustic phonon propagation in ultra-thin Si membranes under biaxial stress field. / Graczykowski, B. (Corresponding Author); Gomis-Bresco, J.; Alzina, F.; Reparaz, J.; Shchepetov, Andrey; Prunnila, Mika; Ahopelto, Jouni; Sotomayor Torres, C.M.

    In: New Journal of Physics, Vol. 16, 073024, 2014.

    Research output: Contribution to journalArticleScientificpeer-review

    TY - JOUR

    T1 - Acoustic phonon propagation in ultra-thin Si membranes under biaxial stress field

    AU - Graczykowski, B.

    AU - Gomis-Bresco, J.

    AU - Alzina, F.

    AU - Reparaz, J.

    AU - Shchepetov, Andrey

    AU - Prunnila, Mika

    AU - Ahopelto, Jouni

    AU - Sotomayor Torres, C.M.

    PY - 2014

    Y1 - 2014

    N2 - We report on stress induced changes in the dispersion relations of acoustic phonons propagating in 27 nm thick single crystalline Si membranes. The static tensile stress (up to 0.3 GPa) acting on the Si membranes was achieved using an additional strain compensating silicon nitride frame. Dispersion relations of thermally activated hypersonic phonons were measured by means of Brillouin light scattering spectroscopy. The theory of Lamb wave propagation is developed for anisotropic materials subjected to an external static stress field. The dispersion relations were calculated using the elastic continuum approximation and taking into account the acousto-elastic effect. We find an excellent agreement between the theoretical and the experimental dispersion relations.

    AB - We report on stress induced changes in the dispersion relations of acoustic phonons propagating in 27 nm thick single crystalline Si membranes. The static tensile stress (up to 0.3 GPa) acting on the Si membranes was achieved using an additional strain compensating silicon nitride frame. Dispersion relations of thermally activated hypersonic phonons were measured by means of Brillouin light scattering spectroscopy. The theory of Lamb wave propagation is developed for anisotropic materials subjected to an external static stress field. The dispersion relations were calculated using the elastic continuum approximation and taking into account the acousto-elastic effect. We find an excellent agreement between the theoretical and the experimental dispersion relations.

    KW - acoustic phonons

    KW - Brillouin light scattering

    KW - ultra-thin Si membranes

    U2 - 10.1088/1367-2630/16/7/073024

    DO - 10.1088/1367-2630/16/7/073024

    M3 - Article

    VL - 16

    JO - New Journal of Physics

    JF - New Journal of Physics

    SN - 1367-2630

    M1 - 073024

    ER -