Actual and future trends in dissolving pulp manufacture

Herbert Sixta, Mikhail Iakovlev, Lidia Testova, Annariikka Roselli, Michael Hummel, Marc Borrega, Adriaan van Heiningen

Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

4 Citations (Scopus)


Herein, we report about existing and novel dissolving pulp processes providing the basis for an advanced biorefinery. The SO2-ethanol-water (SEW) process has the potential to replace the acid sulphite process for the production of rayon-grade pulps, owing to a higher flexibility in the selection of the raw material source, substantially lower cooking times, and the near absence of sugar degradation products. Special attention is paid to developments that target toward the selective and quantitative fractionation of paper-grade pulps into hemicelluloses and cellulose of highest purity. This target has been accomplished by the IONCELL process where the entire hemicellulose fraction is selectively dissolved in an ionic liquid in which the H-bond basicity and acidity are adequately adjusted by the addition of a co-solvent. At the same time, pure hemicellulose can be recovered by further addition of the co-solvent, which then acts as a non-solvent. The residual pure cellulose fraction may then enter a Lyocell process for the production of regenerated cellulose products.

Original languageEnglish
Title of host publicationNWBC 2012
Subtitle of host publication4th Nordic Wood Biorefinery Conference
EditorsKlaus Niemelä
Place of PublicationEspoo
PublisherVTT Technical Research Centre of Finland
ISBN (Electronic)978-951-38-7881-8
ISBN (Print)978-951-38-7880-1
Publication statusPublished - 2012
MoE publication typeA4 Article in a conference publication
Event4th Nordic Wood Biorefinery Conference, NWBC 2012 - Helsinki, Finland
Duration: 23 Oct 201225 Oct 2012 (Full proceedings)

Publication series

SeriesVTT Technology


Conference4th Nordic Wood Biorefinery Conference, NWBC 2012
Abbreviated titleNWBC 2012
Internet address


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