Adjusting hydrophobic and hydrophilic properties by ALD and MLD

Matti Putkonen; Erkki Salo; Mika Vähä-Nissi; Jenni Sievänen; Eija Kenttä; Asko Sneck; J. Nikkola; Lasse Makkonen; L.-S. Johansson; J. Niinistö; Ali Harlin; T. Sajavaara

Adjusting hydrophobic and hydrophilic properties by ALD and MLD

Matti Putkonen, Erkki Salo, Mika Vähä-Nissi, Jenni Sievänen, Eija Kenttä, Asko Sneck, J. Nikkola, Lasse Makkonen, L.-S. Johansson, J. Niinistö, Ali Harlin, T. Sajavaara

Research output: Chapter in Book/Report/Conference proceeding › Conference abstract in proceedings › Scientific

Abstract

Possibility to control the adhesion properties is important in various industrial applications. Since the topmost surface layers have the greatest role in adhesion thus making surface-controlled atomic layer deposition (ALD) reactions appealing method for tailoring surface adhesion properties. In this presentation we show that ALD and molecular-layer-deposition (MLD) can be used to adjust wetting characteristics of polymers and metals. Recently we have been modifying surface properties for various applica-tions including ink-jet printed films, adhesion promoting layers for extrusion coatings and anti-ice coatings. In addition to conventional inorganic metal oxides, such as Al2O3, we have tested also inorganic-organic hybrid MLD materials. Various tools, such as XPS, FT-IR and TOF-ERDA, were used to characterize these films, and wetting behavior was determined using contact angles measurements with the sessile drop method

Original language	English
Title of host publication	BALD2014 Abstract book
Publication status	Published - 2014
Event	12th International Baltic Conference on Atomic Layer Deposition, Baltic ALD 2014 - Helsinki, Finland Duration: 12 May 2014 → 13 May 2014 Conference number: 12 http://www.aldcoe.fi/bald2014/program.pdf (Program) http://www.aldcoe.fi/bald2014/posters.pdf (Posters)

Conference

Conference	12th International Baltic Conference on Atomic Layer Deposition, Baltic ALD 2014
Abbreviated title	Baltic ALD 2014
Country/Territory	Finland
City	Helsinki
Period	12/05/14 → 13/05/14
Other	Abstracts reviewed and published.
Internet address	http://www.aldcoe.fi/bald2014/program.pdf (Program) http://www.aldcoe.fi/bald2014/posters.pdf (Posters)

Keywords

thin films
ALD
surface chemistry

Cite this

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title = "Adjusting hydrophobic and hydrophilic properties by ALD and MLD",

abstract = "Possibility to control the adhesion properties is important in various industrial applications. Since the topmost surface layers have the greatest role in adhesion thus making surface-controlled atomic layer deposition (ALD) reactions appealing method for tailoring surface adhesion properties. In this presentation we show that ALD and molecular-layer-deposition (MLD) can be used to adjust wetting characteristics of polymers and metals. Recently we have been modifying surface properties for various applica-tions including ink-jet printed films, adhesion promoting layers for extrusion coatings and anti-ice coatings. In addition to conventional inorganic metal oxides, such as Al2O3, we have tested also inorganic-organic hybrid MLD materials. Various tools, such as XPS, FT-IR and TOF-ERDA, were used to characterize these films, and wetting behavior was determined using contact angles measurements with the sessile drop method",

keywords = "thin films, ALD, surface chemistry",

author = "Matti Putkonen and Erkki Salo and Mika V{\"a}h{\"a}-Nissi and Jenni Siev{\"a}nen and Eija Kentt{\"a} and Asko Sneck and J. Nikkola and Lasse Makkonen and L.-S. Johansson and J. Niinist{\"o} and Ali Harlin and T. Sajavaara",

year = "2014",

language = "English",

booktitle = "BALD2014 Abstract book",

note = "12th International Baltic Conference on Atomic Layer Deposition, Baltic ALD 2014, Baltic ALD 2014 ; Conference date: 12-05-2014 Through 13-05-2014",

url = "http://www.aldcoe.fi/bald2014/program.pdf, http://www.aldcoe.fi/bald2014/posters.pdf",

}

TY - CHAP

T1 - Adjusting hydrophobic and hydrophilic properties by ALD and MLD

AU - Putkonen, Matti

AU - Salo, Erkki

AU - Vähä-Nissi, Mika

AU - Sievänen, Jenni

AU - Kenttä, Eija

AU - Sneck, Asko

AU - Nikkola, J.

AU - Makkonen, Lasse

AU - Johansson, L.-S.

AU - Niinistö, J.

AU - Harlin, Ali

AU - Sajavaara, T.

N1 - Conference code: 12

PY - 2014

Y1 - 2014

N2 - Possibility to control the adhesion properties is important in various industrial applications. Since the topmost surface layers have the greatest role in adhesion thus making surface-controlled atomic layer deposition (ALD) reactions appealing method for tailoring surface adhesion properties. In this presentation we show that ALD and molecular-layer-deposition (MLD) can be used to adjust wetting characteristics of polymers and metals. Recently we have been modifying surface properties for various applica-tions including ink-jet printed films, adhesion promoting layers for extrusion coatings and anti-ice coatings. In addition to conventional inorganic metal oxides, such as Al2O3, we have tested also inorganic-organic hybrid MLD materials. Various tools, such as XPS, FT-IR and TOF-ERDA, were used to characterize these films, and wetting behavior was determined using contact angles measurements with the sessile drop method

AB - Possibility to control the adhesion properties is important in various industrial applications. Since the topmost surface layers have the greatest role in adhesion thus making surface-controlled atomic layer deposition (ALD) reactions appealing method for tailoring surface adhesion properties. In this presentation we show that ALD and molecular-layer-deposition (MLD) can be used to adjust wetting characteristics of polymers and metals. Recently we have been modifying surface properties for various applica-tions including ink-jet printed films, adhesion promoting layers for extrusion coatings and anti-ice coatings. In addition to conventional inorganic metal oxides, such as Al2O3, we have tested also inorganic-organic hybrid MLD materials. Various tools, such as XPS, FT-IR and TOF-ERDA, were used to characterize these films, and wetting behavior was determined using contact angles measurements with the sessile drop method

KW - thin films

KW - ALD

KW - surface chemistry

M3 - Conference abstract in proceedings

BT - BALD2014 Abstract book

T2 - 12th International Baltic Conference on Atomic Layer Deposition, Baltic ALD 2014

Y2 - 12 May 2014 through 13 May 2014

ER -

Adjusting hydrophobic and hydrophilic properties by ALD and MLD

Abstract

Conference

Keywords

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