Adjusting hydrophobic and hydrophilic properties by ALD and MLD

Matti Putkonen, Erkki Salo, Mika Vähä-Nissi, Jenni Sievänen, Eija Kenttä, Asko Sneck, J. Nikkola, Lasse Makkonen, L.-S. Johansson, J. Niinistö, Ali Harlin, T. Sajavaara

    Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific


    Possibility to control the adhesion properties is important in various industrial applications. Since the topmost surface layers have the greatest role in adhesion thus making surface-controlled atomic layer deposition (ALD) reactions appealing method for tailoring surface adhesion properties. In this presentation we show that ALD and molecular-layer-deposition (MLD) can be used to adjust wetting characteristics of polymers and metals. Recently we have been modifying surface properties for various applica-tions including ink-jet printed films, adhesion promoting layers for extrusion coatings and anti-ice coatings. In addition to conventional inorganic metal oxides, such as Al2O3, we have tested also inorganic-organic hybrid MLD materials. Various tools, such as XPS, FT-IR and TOF-ERDA, were used to characterize these films, and wetting behavior was determined using contact angles measurements with the sessile drop method
    Original languageEnglish
    Title of host publicationBALD2014 Abstract book
    Publication statusPublished - 2014
    Event12th International Baltic Conference on Atomic Layer Deposition, Baltic ALD 2014 - Helsinki, Finland
    Duration: 12 May 201413 May 2014
    Conference number: 12 (Program) (Posters)


    Conference12th International Baltic Conference on Atomic Layer Deposition, Baltic ALD 2014
    Abbreviated titleBaltic ALD 2014
    OtherAbstracts reviewed and published.
    Internet address


    • thin films
    • ALD
    • surface chemistry


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