Adjusting hydrophobic and hydrophilic properties by ALD and MLD

Matti Putkonen, Erkki Salo, Mika Vähä-Nissi, Jenni Sievänen, Eija Kenttä, Asko Sneck, J. Nikkola, Lasse Makkonen, L.-S. Johansson, J. Niinistö, Ali Harlin, T. Sajavaara

Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific

Abstract

Possibility to control the adhesion properties is important in various industrial applications. Since the topmost surface layers have the greatest role in adhesion thus making surface-controlled atomic layer deposition (ALD) reactions appealing method for tailoring surface adhesion properties. In this presentation we show that ALD and molecular-layer-deposition (MLD) can be used to adjust wetting characteristics of polymers and metals. Recently we have been modifying surface properties for various applica-tions including ink-jet printed films, adhesion promoting layers for extrusion coatings and anti-ice coatings. In addition to conventional inorganic metal oxides, such as Al2O3, we have tested also inorganic-organic hybrid MLD materials. Various tools, such as XPS, FT-IR and TOF-ERDA, were used to characterize these films, and wetting behavior was determined using contact angles measurements with the sessile drop method
Original languageEnglish
Title of host publicationBALD2014 Abstract book
Publication statusPublished - 2014
Event12th International Baltic Conference on Atomic Layer Deposition, Baltic ALD 2014 - Helsinki, Finland
Duration: 12 May 201413 May 2014
Conference number: 12
http://www.aldcoe.fi/bald2014/program.pdf (Program)
http://www.aldcoe.fi/bald2014/posters.pdf (Posters)

Conference

Conference12th International Baltic Conference on Atomic Layer Deposition, Baltic ALD 2014
Abbreviated titleBaltic ALD 2014
CountryFinland
CityHelsinki
Period12/05/1413/05/14
OtherAbstracts reviewed and published.
Internet address

Fingerprint

Atomic layer deposition
Adhesion
Wetting
Metals
Coatings
Ice
Angle measurement
Ink
Oxides
Industrial applications
Contact angle
Surface properties
Extrusion
Polymers
X ray photoelectron spectroscopy

Keywords

  • thin films
  • ALD
  • surface chemistry

Cite this

Putkonen, M., Salo, E., Vähä-Nissi, M., Sievänen, J., Kenttä, E., Sneck, A., ... Sajavaara, T. (2014). Adjusting hydrophobic and hydrophilic properties by ALD and MLD. In BALD2014 Abstract book
Putkonen, Matti ; Salo, Erkki ; Vähä-Nissi, Mika ; Sievänen, Jenni ; Kenttä, Eija ; Sneck, Asko ; Nikkola, J. ; Makkonen, Lasse ; Johansson, L.-S. ; Niinistö, J. ; Harlin, Ali ; Sajavaara, T. / Adjusting hydrophobic and hydrophilic properties by ALD and MLD. BALD2014 Abstract book. 2014.
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abstract = "Possibility to control the adhesion properties is important in various industrial applications. Since the topmost surface layers have the greatest role in adhesion thus making surface-controlled atomic layer deposition (ALD) reactions appealing method for tailoring surface adhesion properties. In this presentation we show that ALD and molecular-layer-deposition (MLD) can be used to adjust wetting characteristics of polymers and metals. Recently we have been modifying surface properties for various applica-tions including ink-jet printed films, adhesion promoting layers for extrusion coatings and anti-ice coatings. In addition to conventional inorganic metal oxides, such as Al2O3, we have tested also inorganic-organic hybrid MLD materials. Various tools, such as XPS, FT-IR and TOF-ERDA, were used to characterize these films, and wetting behavior was determined using contact angles measurements with the sessile drop method",
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Putkonen, M, Salo, E, Vähä-Nissi, M, Sievänen, J, Kenttä, E, Sneck, A, Nikkola, J, Makkonen, L, Johansson, L-S, Niinistö, J, Harlin, A & Sajavaara, T 2014, Adjusting hydrophobic and hydrophilic properties by ALD and MLD. in BALD2014 Abstract book. 12th International Baltic Conference on Atomic Layer Deposition, Baltic ALD 2014, Helsinki, Finland, 12/05/14.

Adjusting hydrophobic and hydrophilic properties by ALD and MLD. / Putkonen, Matti; Salo, Erkki; Vähä-Nissi, Mika; Sievänen, Jenni; Kenttä, Eija; Sneck, Asko; Nikkola, J.; Makkonen, Lasse; Johansson, L.-S.; Niinistö, J.; Harlin, Ali; Sajavaara, T.

BALD2014 Abstract book. 2014.

Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific

TY - CHAP

T1 - Adjusting hydrophobic and hydrophilic properties by ALD and MLD

AU - Putkonen, Matti

AU - Salo, Erkki

AU - Vähä-Nissi, Mika

AU - Sievänen, Jenni

AU - Kenttä, Eija

AU - Sneck, Asko

AU - Nikkola, J.

AU - Makkonen, Lasse

AU - Johansson, L.-S.

AU - Niinistö, J.

AU - Harlin, Ali

AU - Sajavaara, T.

PY - 2014

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N2 - Possibility to control the adhesion properties is important in various industrial applications. Since the topmost surface layers have the greatest role in adhesion thus making surface-controlled atomic layer deposition (ALD) reactions appealing method for tailoring surface adhesion properties. In this presentation we show that ALD and molecular-layer-deposition (MLD) can be used to adjust wetting characteristics of polymers and metals. Recently we have been modifying surface properties for various applica-tions including ink-jet printed films, adhesion promoting layers for extrusion coatings and anti-ice coatings. In addition to conventional inorganic metal oxides, such as Al2O3, we have tested also inorganic-organic hybrid MLD materials. Various tools, such as XPS, FT-IR and TOF-ERDA, were used to characterize these films, and wetting behavior was determined using contact angles measurements with the sessile drop method

AB - Possibility to control the adhesion properties is important in various industrial applications. Since the topmost surface layers have the greatest role in adhesion thus making surface-controlled atomic layer deposition (ALD) reactions appealing method for tailoring surface adhesion properties. In this presentation we show that ALD and molecular-layer-deposition (MLD) can be used to adjust wetting characteristics of polymers and metals. Recently we have been modifying surface properties for various applica-tions including ink-jet printed films, adhesion promoting layers for extrusion coatings and anti-ice coatings. In addition to conventional inorganic metal oxides, such as Al2O3, we have tested also inorganic-organic hybrid MLD materials. Various tools, such as XPS, FT-IR and TOF-ERDA, were used to characterize these films, and wetting behavior was determined using contact angles measurements with the sessile drop method

KW - thin films

KW - ALD

KW - surface chemistry

M3 - Conference abstract in proceedings

BT - BALD2014 Abstract book

ER -

Putkonen M, Salo E, Vähä-Nissi M, Sievänen J, Kenttä E, Sneck A et al. Adjusting hydrophobic and hydrophilic properties by ALD and MLD. In BALD2014 Abstract book. 2014