Adjusting wetting and adhesion characteristics with ALD and MLD

Keyphrases

• Adhesion 50%
• Adhesion Characteristic 100%
• ALD Process 50%
• Atomic Layer Deposition 50%
• Chemisorbed 50%
• Deposited Material 50%
• Depositional Cycle 50%
• Enabling Control 50%
• Extrusion Coating 50%
• Gas-solid 50%
• Inorganic Oxides 50%
• Inorganic-organic Hybrid Materials 50%
• Low-temperature ALD 50%
• Material Cycle 50%
• Molecular Layer Deposition 50%
• Non-ideal Surface 50%
• Oxide Surfaces 50%
• Precursor Molecules 50%
• Print Quality 50%
• Repeated Cycles 50%
• Roll-to-roll 50%
• Solid Surface 50%
• Submonolayer 50%
• Surface Coating 50%
• Surface Modification 50%
• Surface Reaction 50%
• Thin Film Growth 50%
• Wetting Characteristics 100%

INIS

• adhesion 100%
• applications 40%
• chemisorption 20%
• coatings 20%
• control 40%
• deposition 40%
• extrusion 20%
• gases 20%
• growth 20%
• hybrids 20%
• layers 20%
• levels 20%
• low temperature 20%
• modifications 20%
• molecules 20%
• oxides 20%
• polymers 20%
• precursor 20%
• resolution 20%
• solids 20%
• speed 20%
• surfaces 100%
• thin films 20%

Material Science

• Monolayers 100%
• Organic-Inorganic Hybrid Material 50%
• Oxide Surface 50%
• Surface (Surface Science) 100%
• Surface Reaction 50%
• Surface Treatment 50%
• Thin Film Growth 50%