Keyphrases
High Aspect Ratio
100%
Ratio Test
100%
Conformality
100%
Optical Microscopy
100%
Microscopic Analysis
60%
Ellipsometry
40%
Grayscale
40%
Saturation Profile
40%
Reflectometry
40%
Atomic Layer Deposition
20%
Metrology
20%
Depth Profile
20%
Image Analysis
20%
Characterization Techniques
20%
Reaction Kinetics Model
20%
MEMS-based
20%
Penetration Depth
20%
Langmuir
20%
Conformal Coating
20%
Research Laboratories
20%
Atomic Layer Deposition Al2O3
20%
Sample Preparation
20%
4th Generation
20%
Optical Thickness
20%
Thick Layer
20%
SEM-EDX
20%
Characterization Tools
20%
All-silicon
20%
Line Scan
20%
Easy Method
20%
Spot Size
20%
Optical Metrology
20%
Accuracy Limits
20%
Metrology Tool
20%
Distance Indicators
20%
Thickness Determination
20%
Multiple Approaches
20%
Applied Physics
20%
High Aspect Ratio Cavities
20%
Opening Area
20%
3D Microelectronics
20%
Optical Micrograph
20%
Micro Spot
20%
Generation Design
20%
Internal Distance
20%
Line Scanner
20%
Pillar Design
20%
INIS
aspect ratio
100%
optical microscopy
100%
image processing
80%
layers
60%
tools
40%
thickness
40%
design
40%
deposition
40%
films
40%
saturation
40%
metrology
40%
ellipsometry
40%
indicators
20%
surfaces
20%
data
20%
reviews
20%
silicon
20%
coatings
20%
substrates
20%
physics
20%
size
20%
scanning electron microscopy
20%
modeling
20%
employment
20%
thin films
20%
walls
20%
cavities
20%
accuracy
20%
distance
20%
positioning
20%
reaction kinetics
20%
penetration depth
20%
microelectronics
20%
presses
20%
sample preparation
20%
Engineering
Conformality
100%
Test Structure
100%
High Aspect Ratio
100%
Image Analysis
80%
Grayscale
40%
Atomic Layer Deposition
40%
Characterization Method
20%
Depth Profile
20%
Open Area
20%
Penetration Depth
20%
Micrograph
20%
Thick Layer
20%
Spot Size
20%
Microelectronics
20%
Internals
20%
Microelectromechanical System
20%
Conformal Coating
20%
Thin Films
20%
Leading Edge
20%
Material Science
Film
100%
Al2O3
50%
Scanning Electron Microscopy
50%
Microelectromechanical System
50%
Energy-Dispersive X-Ray Spectroscopy
50%
Silicon
50%
Thin Films
50%