Advanced silicon etch evaluation

A. Rickard; M. McNie; C. Pickering; I. Young; J. Hopkins; H. Ashraf; S. McAuley; F. Roozeboom; C. Gormley; P. Schina; Jyrki Kiihamäki

Advanced silicon etch evaluation

A. Rickard, M. McNie, C. Pickering, I. Young, J. Hopkins, H. Ashraf, S. McAuley, F. Roozeboom, C. Gormley, P. Schina, Jyrki Kiihamäki

Research output: Contribution to conference › Conference article › Scientific › peer-review

Original language	English
Publication status	Published - 2003
MoE publication type	Not Eligible
Event	IoP Conference on Dry Etching - Advances and Trends - London, United Kingdom Duration: 22 Jan 2003 → 22 Jan 2003

Conference

Conference	IoP Conference on Dry Etching - Advances and Trends
Country/Territory	United Kingdom
City	London
Period	22/01/03 → 22/01/03

Cite this

@conference{123064428f22406fa5275421e31afe95,

title = "Advanced silicon etch evaluation",

author = "A. Rickard and M. McNie and C. Pickering and I. Young and J. Hopkins and H. Ashraf and S. McAuley and F. Roozeboom and C. Gormley and P. Schina and Jyrki Kiiham{\"a}ki",

note = "Project code: z1su00023 No bibliographic info about proceedings publication found; IoP Conference on Dry Etching - Advances and Trends ; Conference date: 22-01-2003 Through 22-01-2003",

year = "2003",

language = "English",

}

TY - CONF

T1 - Advanced silicon etch evaluation

AU - Rickard, A.

AU - McNie, M.

AU - Pickering, C.

AU - Young, I.

AU - Hopkins, J.

AU - Ashraf, H.

AU - McAuley, S.

AU - Roozeboom, F.

AU - Gormley, C.

AU - Schina, P.

AU - Kiihamäki, Jyrki

N1 - Project code: z1su00023 No bibliographic info about proceedings publication found

PY - 2003

Y1 - 2003

M3 - Conference article

T2 - IoP Conference on Dry Etching - Advances and Trends

Y2 - 22 January 2003 through 22 January 2003

ER -