Keyphrases
Micro-electro-mechanical Systems
100%
TiO2-Al2O3
100%
Atomic Layer Deposition
100%
Titanium Tetrachloride
100%
Nanolaminates
100%
System Application
100%
Trimethylaluminum
100%
Optical Applications
100%
Rutile
63%
Aluminum Oxide
54%
Layer Thickness
54%
Nanolaminate Films
36%
TiO2 Film
27%
Structural Properties
18%
Atomic Force Microscopy
18%
Refractive Index
18%
Dielectric Constant
18%
Leakage Current
18%
Al2O3 Film
18%
Water-based Processing
18%
Optoelectronic Properties
18%
High Temperature
9%
Scanning Electron Microscopy
9%
Deposition Temperature
9%
Film Thickness
9%
Tensile Stress
9%
Growth Temperature
9%
Reactor
9%
Crystal Growth
9%
Inorganic Materials
9%
Electrical Measurements
9%
Temperature Range
9%
Capacitors
9%
Optical Measurement
9%
Optical Devices
9%
Al2O3 Layer
9%
Lithography
9%
Material Temperature
9%
Current-voltage
9%
Wafer
9%
Aluminum Contact
9%
Capacitance-voltage Measurements
9%
Amorphous Al2O3
9%
Reflectance Spectroscopy
9%
Titanium Aluminum Alloy
9%
TiO2 Layer
9%
Volume Fraction
9%
Promising Applications
9%
High Aspect Ratio Trenches
9%
Si(111)
9%
Technological Area
9%
INIS
layers
100%
applications
100%
water
100%
deposition
100%
titanium oxides
100%
microelectromechanical systems
100%
titanium chlorides
100%
thickness
64%
films
64%
range
21%
values
14%
atomic force microscopy
14%
refractive index
14%
dielectric constant
14%
leakage current
14%
levels
7%
devices
7%
aluminium
7%
roughness
7%
aspect ratio
7%
scanning electron microscopy
7%
growth
7%
pressure range mega pa
7%
volume
7%
aluminium oxides
7%
reactors
7%
manufacturing
7%
crystal growth
7%
deposits
7%
smoothness
7%
temperature range
7%
capacitors
7%
aluminum
7%
measured values
7%
Engineering
Layer Thickness
100%
Microelectromechanical System
100%
Atomic Layer Deposition
100%
Deposition Process
100%
Atomic Force Microscopy
33%
Dielectrics
33%
Structural Property
33%
Refractive Index
33%
Process Water
33%
Refractivity
33%
Deposition Temperature
16%
Tensile Stress σ
16%
Reactant
16%
Measured Value
16%
Temperature Range
16%
Process Parameter
16%
Constant Value
16%
Exact Value
16%
Lithography
16%
Aluminum Oxide
16%
High Aspect Ratio
16%
Growth Temperature
16%
Electrical Measurement
16%
Material Science
Al2O3
100%
Microelectromechanical System
100%
Titanium Dioxide
100%
Titanium
100%
Film
57%
Structural Property
14%
Permittivity
14%
Refractive Index
14%
Aluminum
14%
Film Thickness
7%
Optical Measurement
7%
Volume Fraction
7%
Lithography
7%
Capacitor
7%
Scanning Electron Microscopy
7%
Optical Device
7%
Ultimate Tensile Strength
7%
Aluminum Oxide
7%
Crystal Growth
7%