Abstract
hree sets of 100 nm thick ALD Al2O3-TiO2 nanolaminates were deposited on
150 mm p-type (001) silicon wafers. Bilayer thickness (0.1 to 50 nm), volume
per cent of TiO2 (0 to 100%) and ALD temperature (110-300oC) were the
variables in each corresponding set. The laminate hardness and elastic modulus
were measured by nanoindentation under displacement control. X-ray
reflectivity (XRR) was used for the thickness of each alternating layer, the
density of each phase as well as the surface roughness at the interfaces.
Time-of-flight elastic recoil detection analysis (TOF-ERDA) was used for the
through-laminate impurity. Incorporating TiO2 into Al2O3 reduced the film
hardness. The TiO2 content had a complex effect to the elastic modulus of the
film. Better understanding of the subtle influence of the laminate structure
and composition to the film property is reached by combining the information
on the physical and chemical state of each individual layer.
Original language | English |
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Title of host publication | International Workshop on the Mechanical Behavior of Nanoscale Multilayers |
Publication status | Published - 2013 |
Event | International Workshop on the Mechanical Behavior of Nanoscale Multilayers, Nanoscale Multilayers’13 - Madrid, Spain Duration: 1 Oct 2013 → 4 Oct 2013 http://www.tms.org/meetings/2013/NanoscaleMultilayers13/ |
Workshop
Workshop | International Workshop on the Mechanical Behavior of Nanoscale Multilayers, Nanoscale Multilayers’13 |
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Abbreviated title | Nanoscale Multilayers’13 |
Country/Territory | Spain |
City | Madrid |
Period | 1/10/13 → 4/10/13 |
Internet address |