Al2O3/TiO2 Nanolaminates by Atomic Layer Deposition: A Study on the Laminate Structure and Mechanical Property

Xuwen Liu (Corresponding author), Sakari Sintonen, Eero Haimi, Mikko Laitinen, Saima Ali, Jaakko Julin, Oili Ylivaara, Harri Lipsanen, Timo Sajavaara, Riikka L. Puurunen, Simo-Pekka Hannula

Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific

Abstract

hree sets of 100 nm thick ALD Al2O3-TiO2 nanolaminates were deposited on 150 mm p-type (001) silicon wafers. Bilayer thickness (0.1 to 50 nm), volume per cent of TiO2 (0 to 100%) and ALD temperature (110-300oC) were the variables in each corresponding set. The laminate hardness and elastic modulus were measured by nanoindentation under displacement control. X-ray reflectivity (XRR) was used for the thickness of each alternating layer, the density of each phase as well as the surface roughness at the interfaces. Time-of-flight elastic recoil detection analysis (TOF-ERDA) was used for the through-laminate impurity. Incorporating TiO2 into Al2O3 reduced the film hardness. The TiO2 content had a complex effect to the elastic modulus of the film. Better understanding of the subtle influence of the laminate structure and composition to the film property is reached by combining the information on the physical and chemical state of each individual layer.
Original languageEnglish
Title of host publicationInternational Workshop on the Mechanical Behavior of Nanoscale Multilayers
Publication statusPublished - 2013
EventInternational Workshop on the Mechanical Behavior of Nanoscale Multilayers, Nanoscale Multilayers’13 - Madrid, Spain
Duration: 1 Oct 20134 Oct 2013
http://www.tms.org/meetings/2013/NanoscaleMultilayers13/

Workshop

WorkshopInternational Workshop on the Mechanical Behavior of Nanoscale Multilayers, Nanoscale Multilayers’13
Abbreviated titleNanoscale Multilayers’13
CountrySpain
CityMadrid
Period1/10/134/10/13
Internet address

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atomic layer epitaxy
laminates
mechanical properties
modulus of elasticity
hardness
nanoindentation
surface roughness
wafers
reflectance
impurities
silicon
x rays
temperature

Cite this

Liu, X., Sintonen, S., Haimi, E., Laitinen, M., Ali, S., Julin, J., ... Hannula, S-P. (2013). Al2O3/TiO2 Nanolaminates by Atomic Layer Deposition: A Study on the Laminate Structure and Mechanical Property. In International Workshop on the Mechanical Behavior of Nanoscale Multilayers
Liu, Xuwen ; Sintonen, Sakari ; Haimi, Eero ; Laitinen, Mikko ; Ali, Saima ; Julin, Jaakko ; Ylivaara, Oili ; Lipsanen, Harri ; Sajavaara, Timo ; Puurunen, Riikka L. ; Hannula, Simo-Pekka. / Al2O3/TiO2 Nanolaminates by Atomic Layer Deposition : A Study on the Laminate Structure and Mechanical Property. International Workshop on the Mechanical Behavior of Nanoscale Multilayers. 2013.
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title = "Al2O3/TiO2 Nanolaminates by Atomic Layer Deposition: A Study on the Laminate Structure and Mechanical Property",
abstract = "hree sets of 100 nm thick ALD Al2O3-TiO2 nanolaminates were deposited on 150 mm p-type (001) silicon wafers. Bilayer thickness (0.1 to 50 nm), volume per cent of TiO2 (0 to 100{\%}) and ALD temperature (110-300oC) were the variables in each corresponding set. The laminate hardness and elastic modulus were measured by nanoindentation under displacement control. X-ray reflectivity (XRR) was used for the thickness of each alternating layer, the density of each phase as well as the surface roughness at the interfaces. Time-of-flight elastic recoil detection analysis (TOF-ERDA) was used for the through-laminate impurity. Incorporating TiO2 into Al2O3 reduced the film hardness. The TiO2 content had a complex effect to the elastic modulus of the film. Better understanding of the subtle influence of the laminate structure and composition to the film property is reached by combining the information on the physical and chemical state of each individual layer.",
author = "Xuwen Liu and Sakari Sintonen and Eero Haimi and Mikko Laitinen and Saima Ali and Jaakko Julin and Oili Ylivaara and Harri Lipsanen and Timo Sajavaara and Puurunen, {Riikka L.} and Simo-Pekka Hannula",
note = "Project code: 74717",
year = "2013",
language = "English",
booktitle = "International Workshop on the Mechanical Behavior of Nanoscale Multilayers",

}

Liu, X, Sintonen, S, Haimi, E, Laitinen, M, Ali, S, Julin, J, Ylivaara, O, Lipsanen, H, Sajavaara, T, Puurunen, RL & Hannula, S-P 2013, Al2O3/TiO2 Nanolaminates by Atomic Layer Deposition: A Study on the Laminate Structure and Mechanical Property. in International Workshop on the Mechanical Behavior of Nanoscale Multilayers. International Workshop on the Mechanical Behavior of Nanoscale Multilayers, Nanoscale Multilayers’13, Madrid, Spain, 1/10/13.

Al2O3/TiO2 Nanolaminates by Atomic Layer Deposition : A Study on the Laminate Structure and Mechanical Property. / Liu, Xuwen (Corresponding author); Sintonen, Sakari; Haimi, Eero; Laitinen, Mikko; Ali, Saima; Julin, Jaakko; Ylivaara, Oili; Lipsanen, Harri; Sajavaara, Timo; Puurunen, Riikka L.; Hannula, Simo-Pekka.

International Workshop on the Mechanical Behavior of Nanoscale Multilayers. 2013.

Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific

TY - CHAP

T1 - Al2O3/TiO2 Nanolaminates by Atomic Layer Deposition

T2 - A Study on the Laminate Structure and Mechanical Property

AU - Liu, Xuwen

AU - Sintonen, Sakari

AU - Haimi, Eero

AU - Laitinen, Mikko

AU - Ali, Saima

AU - Julin, Jaakko

AU - Ylivaara, Oili

AU - Lipsanen, Harri

AU - Sajavaara, Timo

AU - Puurunen, Riikka L.

AU - Hannula, Simo-Pekka

N1 - Project code: 74717

PY - 2013

Y1 - 2013

N2 - hree sets of 100 nm thick ALD Al2O3-TiO2 nanolaminates were deposited on 150 mm p-type (001) silicon wafers. Bilayer thickness (0.1 to 50 nm), volume per cent of TiO2 (0 to 100%) and ALD temperature (110-300oC) were the variables in each corresponding set. The laminate hardness and elastic modulus were measured by nanoindentation under displacement control. X-ray reflectivity (XRR) was used for the thickness of each alternating layer, the density of each phase as well as the surface roughness at the interfaces. Time-of-flight elastic recoil detection analysis (TOF-ERDA) was used for the through-laminate impurity. Incorporating TiO2 into Al2O3 reduced the film hardness. The TiO2 content had a complex effect to the elastic modulus of the film. Better understanding of the subtle influence of the laminate structure and composition to the film property is reached by combining the information on the physical and chemical state of each individual layer.

AB - hree sets of 100 nm thick ALD Al2O3-TiO2 nanolaminates were deposited on 150 mm p-type (001) silicon wafers. Bilayer thickness (0.1 to 50 nm), volume per cent of TiO2 (0 to 100%) and ALD temperature (110-300oC) were the variables in each corresponding set. The laminate hardness and elastic modulus were measured by nanoindentation under displacement control. X-ray reflectivity (XRR) was used for the thickness of each alternating layer, the density of each phase as well as the surface roughness at the interfaces. Time-of-flight elastic recoil detection analysis (TOF-ERDA) was used for the through-laminate impurity. Incorporating TiO2 into Al2O3 reduced the film hardness. The TiO2 content had a complex effect to the elastic modulus of the film. Better understanding of the subtle influence of the laminate structure and composition to the film property is reached by combining the information on the physical and chemical state of each individual layer.

M3 - Conference abstract in proceedings

BT - International Workshop on the Mechanical Behavior of Nanoscale Multilayers

ER -

Liu X, Sintonen S, Haimi E, Laitinen M, Ali S, Julin J et al. Al2O3/TiO2 Nanolaminates by Atomic Layer Deposition: A Study on the Laminate Structure and Mechanical Property. In International Workshop on the Mechanical Behavior of Nanoscale Multilayers. 2013