Al2O3/TiO2 Nanolaminates by Atomic Layer Deposition: A Study on the Laminate Structure and Mechanical Property

Xuwen Liu; Sakari Sintonen; Eero Haimi; Mikko Laitinen; Saima Ali; Jaakko Julin; Oili Ylivaara; Harri Lipsanen; Timo Sajavaara; Riikka L. Puurunen; Simo-Pekka Hannula

Al2O3/TiO2 Nanolaminates by Atomic Layer Deposition: A Study on the Laminate Structure and Mechanical Property

Xuwen Liu (Corresponding author), Sakari Sintonen, Eero Haimi, Mikko Laitinen, Saima Ali, Jaakko Julin, Oili Ylivaara, Harri Lipsanen, Timo Sajavaara, Riikka L. Puurunen, Simo-Pekka Hannula

Research output: Chapter in Book/Report/Conference proceeding › Conference abstract in proceedings › Scientific

Abstract

hree sets of 100 nm thick ALD Al2O3-TiO2 nanolaminates were deposited on 150 mm p-type (001) silicon wafers. Bilayer thickness (0.1 to 50 nm), volume per cent of TiO2 (0 to 100%) and ALD temperature (110-300oC) were the variables in each corresponding set. The laminate hardness and elastic modulus were measured by nanoindentation under displacement control. X-ray reflectivity (XRR) was used for the thickness of each alternating layer, the density of each phase as well as the surface roughness at the interfaces. Time-of-flight elastic recoil detection analysis (TOF-ERDA) was used for the through-laminate impurity. Incorporating TiO2 into Al2O3 reduced the film hardness. The TiO2 content had a complex effect to the elastic modulus of the film. Better understanding of the subtle influence of the laminate structure and composition to the film property is reached by combining the information on the physical and chemical state of each individual layer.

Original language	English
Title of host publication	International Workshop on the Mechanical Behavior of Nanoscale Multilayers
Publication status	Published - 2013
Event	International Workshop on the Mechanical Behavior of Nanoscale Multilayers, Nanoscale Multilayers’13 - Madrid, Spain Duration: 1 Oct 2013 → 4 Oct 2013 http://www.tms.org/meetings/2013/NanoscaleMultilayers13/

Workshop

Workshop	International Workshop on the Mechanical Behavior of Nanoscale Multilayers, Nanoscale Multilayers’13
Abbreviated title	Nanoscale Multilayers’13
Country/Territory	Spain
City	Madrid
Period	1/10/13 → 4/10/13
Internet address	http://www.tms.org/meetings/2013/NanoscaleMultilayers13/

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Liu, Xuwen ; Sintonen, Sakari ; Haimi, Eero ; Laitinen, Mikko ; Ali, Saima ; Julin, Jaakko ; Ylivaara, Oili ; Lipsanen, Harri ; Sajavaara, Timo ; Puurunen, Riikka L. ; Hannula, Simo-Pekka. / Al2O3/TiO2 Nanolaminates by Atomic Layer Deposition : A Study on the Laminate Structure and Mechanical Property. International Workshop on the Mechanical Behavior of Nanoscale Multilayers. 2013.

@inbook{8666a51d538e4d4a8614151dfcf4bf3c,

title = "Al2O3/TiO2 Nanolaminates by Atomic Layer Deposition: A Study on the Laminate Structure and Mechanical Property",

abstract = "hree sets of 100 nm thick ALD Al2O3-TiO2 nanolaminates were deposited on 150 mm p-type (001) silicon wafers. Bilayer thickness (0.1 to 50 nm), volume per cent of TiO2 (0 to 100%) and ALD temperature (110-300oC) were the variables in each corresponding set. The laminate hardness and elastic modulus were measured by nanoindentation under displacement control. X-ray reflectivity (XRR) was used for the thickness of each alternating layer, the density of each phase as well as the surface roughness at the interfaces. Time-of-flight elastic recoil detection analysis (TOF-ERDA) was used for the through-laminate impurity. Incorporating TiO2 into Al2O3 reduced the film hardness. The TiO2 content had a complex effect to the elastic modulus of the film. Better understanding of the subtle influence of the laminate structure and composition to the film property is reached by combining the information on the physical and chemical state of each individual layer.",

author = "Xuwen Liu and Sakari Sintonen and Eero Haimi and Mikko Laitinen and Saima Ali and Jaakko Julin and Oili Ylivaara and Harri Lipsanen and Timo Sajavaara and Puurunen, {Riikka L.} and Simo-Pekka Hannula",

note = "Project code: 74717; International Workshop on the Mechanical Behavior of Nanoscale Multilayers, Nanoscale Multilayers{\textquoteright}13, Nanoscale Multilayers{\textquoteright}13 ; Conference date: 01-10-2013 Through 04-10-2013",

year = "2013",

language = "English",

booktitle = "International Workshop on the Mechanical Behavior of Nanoscale Multilayers",

url = "http://www.tms.org/meetings/2013/NanoscaleMultilayers13/",

}

Liu, X, Sintonen, S, Haimi, E, Laitinen, M, Ali, S, Julin, J, Ylivaara, O, Lipsanen, H, Sajavaara, T, Puurunen, RL & Hannula, S-P 2013, Al2O3/TiO2 Nanolaminates by Atomic Layer Deposition: A Study on the Laminate Structure and Mechanical Property. in International Workshop on the Mechanical Behavior of Nanoscale Multilayers. International Workshop on the Mechanical Behavior of Nanoscale Multilayers, Nanoscale Multilayers’13, Madrid, Spain, 1/10/13.

Al2O3/TiO2 Nanolaminates by Atomic Layer Deposition : A Study on the Laminate Structure and Mechanical Property. / Liu, Xuwen (Corresponding author); Sintonen, Sakari; Haimi, Eero; Laitinen, Mikko; Ali, Saima; Julin, Jaakko; Ylivaara, Oili; Lipsanen, Harri; Sajavaara, Timo; Puurunen, Riikka L.; Hannula, Simo-Pekka.

International Workshop on the Mechanical Behavior of Nanoscale Multilayers. 2013.

Research output: Chapter in Book/Report/Conference proceeding › Conference abstract in proceedings › Scientific

TY - CHAP

T1 - Al2O3/TiO2 Nanolaminates by Atomic Layer Deposition

T2 - International Workshop on the Mechanical Behavior of Nanoscale Multilayers, Nanoscale Multilayers’13

AU - Liu, Xuwen

AU - Sintonen, Sakari

AU - Haimi, Eero

AU - Laitinen, Mikko

AU - Ali, Saima

AU - Julin, Jaakko

AU - Ylivaara, Oili

AU - Lipsanen, Harri

AU - Sajavaara, Timo

AU - Puurunen, Riikka L.

AU - Hannula, Simo-Pekka

N1 - Project code: 74717

PY - 2013

Y1 - 2013

N2 - hree sets of 100 nm thick ALD Al2O3-TiO2 nanolaminates were deposited on 150 mm p-type (001) silicon wafers. Bilayer thickness (0.1 to 50 nm), volume per cent of TiO2 (0 to 100%) and ALD temperature (110-300oC) were the variables in each corresponding set. The laminate hardness and elastic modulus were measured by nanoindentation under displacement control. X-ray reflectivity (XRR) was used for the thickness of each alternating layer, the density of each phase as well as the surface roughness at the interfaces. Time-of-flight elastic recoil detection analysis (TOF-ERDA) was used for the through-laminate impurity. Incorporating TiO2 into Al2O3 reduced the film hardness. The TiO2 content had a complex effect to the elastic modulus of the film. Better understanding of the subtle influence of the laminate structure and composition to the film property is reached by combining the information on the physical and chemical state of each individual layer.

AB - hree sets of 100 nm thick ALD Al2O3-TiO2 nanolaminates were deposited on 150 mm p-type (001) silicon wafers. Bilayer thickness (0.1 to 50 nm), volume per cent of TiO2 (0 to 100%) and ALD temperature (110-300oC) were the variables in each corresponding set. The laminate hardness and elastic modulus were measured by nanoindentation under displacement control. X-ray reflectivity (XRR) was used for the thickness of each alternating layer, the density of each phase as well as the surface roughness at the interfaces. Time-of-flight elastic recoil detection analysis (TOF-ERDA) was used for the through-laminate impurity. Incorporating TiO2 into Al2O3 reduced the film hardness. The TiO2 content had a complex effect to the elastic modulus of the film. Better understanding of the subtle influence of the laminate structure and composition to the film property is reached by combining the information on the physical and chemical state of each individual layer.

M3 - Conference abstract in proceedings

BT - International Workshop on the Mechanical Behavior of Nanoscale Multilayers

Y2 - 1 October 2013 through 4 October 2013

ER -

Al2O3/TiO2 Nanolaminates by Atomic Layer Deposition: A Study on the Laminate Structure and Mechanical Property

Abstract

Workshop

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