Abstract
| Original language | English |
|---|---|
| Title of host publication | International Workshop on the Mechanical Behavior of Nanoscale Multilayers |
| Publication status | Published - 2013 |
| Event | International Workshop on the Mechanical Behavior of Nanoscale Multilayers, Nanoscale Multilayers’13 - Madrid, Spain Duration: 1 Oct 2013 → 4 Oct 2013 http://www.tms.org/meetings/2013/NanoscaleMultilayers13/ |
Workshop
| Workshop | International Workshop on the Mechanical Behavior of Nanoscale Multilayers, Nanoscale Multilayers’13 |
|---|---|
| Abbreviated title | Nanoscale Multilayers’13 |
| Country | Spain |
| City | Madrid |
| Period | 1/10/13 → 4/10/13 |
| Internet address |
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Al2O3/TiO2 Nanolaminates by Atomic Layer Deposition : A Study on the Laminate Structure and Mechanical Property. / Liu, Xuwen (Corresponding author); Sintonen, Sakari; Haimi, Eero; Laitinen, Mikko; Ali, Saima; Julin, Jaakko; Ylivaara, Oili; Lipsanen, Harri; Sajavaara, Timo; Puurunen, Riikka L.; Hannula, Simo-Pekka.
International Workshop on the Mechanical Behavior of Nanoscale Multilayers. 2013.Research output: Chapter in Book/Report/Conference proceeding › Conference abstract in proceedings › Scientific
TY - CHAP
T1 - Al2O3/TiO2 Nanolaminates by Atomic Layer Deposition
T2 - A Study on the Laminate Structure and Mechanical Property
AU - Liu, Xuwen
AU - Sintonen, Sakari
AU - Haimi, Eero
AU - Laitinen, Mikko
AU - Ali, Saima
AU - Julin, Jaakko
AU - Ylivaara, Oili
AU - Lipsanen, Harri
AU - Sajavaara, Timo
AU - Puurunen, Riikka L.
AU - Hannula, Simo-Pekka
N1 - Project code: 74717
PY - 2013
Y1 - 2013
N2 - hree sets of 100 nm thick ALD Al2O3-TiO2 nanolaminates were deposited on 150 mm p-type (001) silicon wafers. Bilayer thickness (0.1 to 50 nm), volume per cent of TiO2 (0 to 100%) and ALD temperature (110-300oC) were the variables in each corresponding set. The laminate hardness and elastic modulus were measured by nanoindentation under displacement control. X-ray reflectivity (XRR) was used for the thickness of each alternating layer, the density of each phase as well as the surface roughness at the interfaces. Time-of-flight elastic recoil detection analysis (TOF-ERDA) was used for the through-laminate impurity. Incorporating TiO2 into Al2O3 reduced the film hardness. The TiO2 content had a complex effect to the elastic modulus of the film. Better understanding of the subtle influence of the laminate structure and composition to the film property is reached by combining the information on the physical and chemical state of each individual layer.
AB - hree sets of 100 nm thick ALD Al2O3-TiO2 nanolaminates were deposited on 150 mm p-type (001) silicon wafers. Bilayer thickness (0.1 to 50 nm), volume per cent of TiO2 (0 to 100%) and ALD temperature (110-300oC) were the variables in each corresponding set. The laminate hardness and elastic modulus were measured by nanoindentation under displacement control. X-ray reflectivity (XRR) was used for the thickness of each alternating layer, the density of each phase as well as the surface roughness at the interfaces. Time-of-flight elastic recoil detection analysis (TOF-ERDA) was used for the through-laminate impurity. Incorporating TiO2 into Al2O3 reduced the film hardness. The TiO2 content had a complex effect to the elastic modulus of the film. Better understanding of the subtle influence of the laminate structure and composition to the film property is reached by combining the information on the physical and chemical state of each individual layer.
M3 - Conference abstract in proceedings
BT - International Workshop on the Mechanical Behavior of Nanoscale Multilayers
ER -