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Keyphrases
Residual Stress
100%
Adhesion
100%
Atomic Layer Deposition
100%
Elastic Modulus
100%
Atomic Layer Deposition Al2O3
100%
Deposition Temperature
66%
Al2O3 Film
33%
Low Temperature
22%
Micro-electro-mechanical Systems
22%
Nanoindentation
22%
Mechanical Properties
11%
3D Structure
11%
Impurities
11%
Wafer Curvature
11%
Tensile Stress
11%
Aluminum Oxide
11%
Stress Property
11%
Curvature Measurement
11%
Reactor
11%
Device Performance
11%
Ellipsometry
11%
Elastic Recoil Detection
11%
Refractive Index
11%
Large Set
11%
Trimethylaluminum
11%
Hydrogen Content
11%
Device Design
11%
Used Material
11%
Atomic Layer Deposited
11%
Micro-scratching
11%
Stoney Equation
11%
Measurement Equation
11%
Deionized Water
11%
SiOx
11%
Surface Acoustic Wave
11%
Film Stress
11%
Nanowear
11%
Wave Measurement
11%
Device Fabrication
11%
Optical Reflectometry
11%
Low Elastic Modulus
11%
Induced Stress
11%
Device Property
11%
Residual Hydrogen
11%
Mechanical Properties of Thin Films
11%
Conformal Growth
11%
INIS
layers
100%
hardness
100%
water
100%
residual stresses
100%
adhesion
100%
deposition
100%
films
61%
increasing
23%
devices
15%
mechanical properties
15%
growth
15%
microelectromechanical systems
15%
pressure range giga pa
15%
values
7%
performance
7%
density
7%
surfaces
7%
data
7%
x radiation
7%
thickness
7%
design
7%
silicon
7%
low temperature
7%
equations
7%
detection
7%
pressure range mega pa
7%
hydrogen
7%
impurities
7%
thin films
7%
reactors
7%
testing
7%
fabrication
7%
refractive index
7%
ellipsometry
7%
time-of-flight method
7%
recoils
7%
sound waves
7%
Material Science
Residual Stress
100%
Elastic Moduli
100%
Aluminum Oxide
100%
Film
71%
Nanoindentation
28%
Microelectromechanical System
28%
Refractive Index
14%
Density
14%
Ultimate Tensile Strength
14%
Silicon
14%
Surface (Surface Science)
14%
Thin Films
14%
Engineering
Residual Stress
100%
Atomic Layer Deposition
100%
Modulus of Elasticity
100%
Deposition Temperature
50%
Low-Temperature
16%
Microelectromechanical System
16%
Tensile Stress σ
8%
Dimensional Structure
8%
Time-of-Flight
8%
Stoney Equation
8%
Measurement Equation
8%
Atomic Layer
8%
Induced Stress
8%
Constant Value
8%
Thin Films
8%
Refractive Index
8%
Surface Acoustic Wave
8%
Refractivity
8%