ALD Al2O3/TiO2 nanolaminates on Si: residual stress, elastic modulus, hardness and adhesion

Oili Ylivaara (Corresponding author), Xuwen Liu, Saima Ali, Sakari Sintonen, Mikko Laitinen, Jaakko Julin, Lauri Kilpi, Timo Sajavaara, Eero Haimi, Helena Ronkainen, Harri Lipsanen, Simo-Pekka Hannula, Riikka L. Puurunen

    Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

    Original languageEnglish
    Title of host publication19th European Conference on Chemical Vapor Deposition (EuroCVD 19)
    PublisherElsevier
    Publication statusPublished - 2 Sep 2013
    MoE publication typeA4 Article in a conference publication
    Event19th European Conference on Chemical Vapor Deposition, EuroCVD 19 - Varna, Bulgaria
    Duration: 1 Sep 20136 Sep 2013

    Conference

    Conference19th European Conference on Chemical Vapor Deposition, EuroCVD 19
    Abbreviated titleEuroCVD 19
    CountryBulgaria
    CityVarna
    Period1/09/136/09/13

    Keywords

    • ALD
    • Atomic Layer Deposition
    • nanolaminate
    • Al2O3
    • TiO2
    • residual stress
    • elastic modulus
    • hardness
    • adhesion

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