ALD Al2O3/TiO2 nanolaminates on Si: residual stress, elastic modulus, hardness and adhesion

Oili Ylivaara (Corresponding author), Xuwen Liu, Saima Ali, Sakari Sintonen, Mikko Laitinen, Jaakko Julin, Lauri Kilpi, Timo Sajavaara, Eero Haimi, Helena Ronkainen, Harri Lipsanen, Simo-Pekka Hannula, Riikka L. Puurunen

Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

Original languageEnglish
Title of host publication19th European Conference on Chemical Vapor Deposition (EuroCVD 19)
PublisherElsevier
Publication statusPublished - 2 Sep 2013
MoE publication typeA4 Article in a conference publication
Event19th European Conference on Chemical Vapor Deposition, EuroCVD 19 - Varna, Bulgaria
Duration: 1 Sep 20136 Sep 2013

Conference

Conference19th European Conference on Chemical Vapor Deposition, EuroCVD 19
Abbreviated titleEuroCVD 19
CountryBulgaria
CityVarna
Period1/09/136/09/13

Keywords

  • ALD
  • Atomic Layer Deposition
  • nanolaminate
  • Al2O3
  • TiO2
  • residual stress
  • elastic modulus
  • hardness
  • adhesion

Cite this

Ylivaara, O., Liu, X., Ali, S., Sintonen, S., Laitinen, M., Julin, J., ... Puurunen, R. L. (2013). ALD Al2O3/TiO2 nanolaminates on Si: residual stress, elastic modulus, hardness and adhesion. In 19th European Conference on Chemical Vapor Deposition (EuroCVD 19) Elsevier.
Ylivaara, Oili ; Liu, Xuwen ; Ali, Saima ; Sintonen, Sakari ; Laitinen, Mikko ; Julin, Jaakko ; Kilpi, Lauri ; Sajavaara, Timo ; Haimi, Eero ; Ronkainen, Helena ; Lipsanen, Harri ; Hannula, Simo-Pekka ; Puurunen, Riikka L. / ALD Al2O3/TiO2 nanolaminates on Si : residual stress, elastic modulus, hardness and adhesion. 19th European Conference on Chemical Vapor Deposition (EuroCVD 19). Elsevier, 2013.
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title = "ALD Al2O3/TiO2 nanolaminates on Si: residual stress, elastic modulus, hardness and adhesion",
keywords = "ALD, Atomic Layer Deposition, nanolaminate, Al2O3, TiO2, residual stress, elastic modulus, hardness, adhesion",
author = "Oili Ylivaara and Xuwen Liu and Saima Ali and Sakari Sintonen and Mikko Laitinen and Jaakko Julin and Lauri Kilpi and Timo Sajavaara and Eero Haimi and Helena Ronkainen and Harri Lipsanen and Simo-Pekka Hannula and Puurunen, {Riikka L.}",
note = "Project 74717 MECHALD",
year = "2013",
month = "9",
day = "2",
language = "English",
booktitle = "19th European Conference on Chemical Vapor Deposition (EuroCVD 19)",
publisher = "Elsevier",
address = "Netherlands",

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Ylivaara, O, Liu, X, Ali, S, Sintonen, S, Laitinen, M, Julin, J, Kilpi, L, Sajavaara, T, Haimi, E, Ronkainen, H, Lipsanen, H, Hannula, S-P & Puurunen, RL 2013, ALD Al2O3/TiO2 nanolaminates on Si: residual stress, elastic modulus, hardness and adhesion. in 19th European Conference on Chemical Vapor Deposition (EuroCVD 19). Elsevier, 19th European Conference on Chemical Vapor Deposition, EuroCVD 19, Varna, Bulgaria, 1/09/13.

ALD Al2O3/TiO2 nanolaminates on Si : residual stress, elastic modulus, hardness and adhesion. / Ylivaara, Oili (Corresponding author); Liu, Xuwen; Ali, Saima; Sintonen, Sakari; Laitinen, Mikko; Julin, Jaakko; Kilpi, Lauri; Sajavaara, Timo; Haimi, Eero; Ronkainen, Helena; Lipsanen, Harri; Hannula, Simo-Pekka; Puurunen, Riikka L.

19th European Conference on Chemical Vapor Deposition (EuroCVD 19). Elsevier, 2013.

Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

TY - GEN

T1 - ALD Al2O3/TiO2 nanolaminates on Si

T2 - residual stress, elastic modulus, hardness and adhesion

AU - Ylivaara, Oili

AU - Liu, Xuwen

AU - Ali, Saima

AU - Sintonen, Sakari

AU - Laitinen, Mikko

AU - Julin, Jaakko

AU - Kilpi, Lauri

AU - Sajavaara, Timo

AU - Haimi, Eero

AU - Ronkainen, Helena

AU - Lipsanen, Harri

AU - Hannula, Simo-Pekka

AU - Puurunen, Riikka L.

N1 - Project 74717 MECHALD

PY - 2013/9/2

Y1 - 2013/9/2

KW - ALD

KW - Atomic Layer Deposition

KW - nanolaminate

KW - Al2O3

KW - TiO2

KW - residual stress

KW - elastic modulus

KW - hardness

KW - adhesion

M3 - Conference article in proceedings

BT - 19th European Conference on Chemical Vapor Deposition (EuroCVD 19)

PB - Elsevier

ER -

Ylivaara O, Liu X, Ali S, Sintonen S, Laitinen M, Julin J et al. ALD Al2O3/TiO2 nanolaminates on Si: residual stress, elastic modulus, hardness and adhesion. In 19th European Conference on Chemical Vapor Deposition (EuroCVD 19). Elsevier. 2013