ALD Al2O3/TiO2 nanolaminates on Si: residual stress, elastic modulus, hardness and adhesion

Oili Ylivaara (Corresponding author), Xuwen Liu, Saima Ali, Sakari Sintonen, Mikko Laitinen, Jaakko Julin, Lauri Kilpi, Timo Sajavaara, Eero Haimi, Helena Ronkainen, Harri Lipsanen, Simo-Pekka Hannula, Riikka L. Puurunen

    Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

    Original languageEnglish
    Title of host publication19th European Conference on Chemical Vapor Deposition (EuroCVD 19)
    PublisherElsevier
    Publication statusPublished - 2 Sep 2013
    MoE publication typeA4 Article in a conference publication
    Event19th European Conference on Chemical Vapor Deposition, EuroCVD 19 - Varna, Bulgaria
    Duration: 1 Sep 20136 Sep 2013

    Conference

    Conference19th European Conference on Chemical Vapor Deposition, EuroCVD 19
    Abbreviated titleEuroCVD 19
    CountryBulgaria
    CityVarna
    Period1/09/136/09/13

    Keywords

    • ALD
    • Atomic Layer Deposition
    • nanolaminate
    • Al2O3
    • TiO2
    • residual stress
    • elastic modulus
    • hardness
    • adhesion

    Cite this

    Ylivaara, O., Liu, X., Ali, S., Sintonen, S., Laitinen, M., Julin, J., ... Puurunen, R. L. (2013). ALD Al2O3/TiO2 nanolaminates on Si: residual stress, elastic modulus, hardness and adhesion. In 19th European Conference on Chemical Vapor Deposition (EuroCVD 19) Elsevier.
    Ylivaara, Oili ; Liu, Xuwen ; Ali, Saima ; Sintonen, Sakari ; Laitinen, Mikko ; Julin, Jaakko ; Kilpi, Lauri ; Sajavaara, Timo ; Haimi, Eero ; Ronkainen, Helena ; Lipsanen, Harri ; Hannula, Simo-Pekka ; Puurunen, Riikka L. / ALD Al2O3/TiO2 nanolaminates on Si : residual stress, elastic modulus, hardness and adhesion. 19th European Conference on Chemical Vapor Deposition (EuroCVD 19). Elsevier, 2013.
    @inproceedings{8d4cb3f688d643358433d6b7042cdcbe,
    title = "ALD Al2O3/TiO2 nanolaminates on Si: residual stress, elastic modulus, hardness and adhesion",
    keywords = "ALD, Atomic Layer Deposition, nanolaminate, Al2O3, TiO2, residual stress, elastic modulus, hardness, adhesion",
    author = "Oili Ylivaara and Xuwen Liu and Saima Ali and Sakari Sintonen and Mikko Laitinen and Jaakko Julin and Lauri Kilpi and Timo Sajavaara and Eero Haimi and Helena Ronkainen and Harri Lipsanen and Simo-Pekka Hannula and Puurunen, {Riikka L.}",
    note = "Project 74717 MECHALD",
    year = "2013",
    month = "9",
    day = "2",
    language = "English",
    booktitle = "19th European Conference on Chemical Vapor Deposition (EuroCVD 19)",
    publisher = "Elsevier",
    address = "Netherlands",

    }

    Ylivaara, O, Liu, X, Ali, S, Sintonen, S, Laitinen, M, Julin, J, Kilpi, L, Sajavaara, T, Haimi, E, Ronkainen, H, Lipsanen, H, Hannula, S-P & Puurunen, RL 2013, ALD Al2O3/TiO2 nanolaminates on Si: residual stress, elastic modulus, hardness and adhesion. in 19th European Conference on Chemical Vapor Deposition (EuroCVD 19). Elsevier, 19th European Conference on Chemical Vapor Deposition, EuroCVD 19, Varna, Bulgaria, 1/09/13.

    ALD Al2O3/TiO2 nanolaminates on Si : residual stress, elastic modulus, hardness and adhesion. / Ylivaara, Oili (Corresponding author); Liu, Xuwen; Ali, Saima; Sintonen, Sakari; Laitinen, Mikko; Julin, Jaakko; Kilpi, Lauri; Sajavaara, Timo; Haimi, Eero; Ronkainen, Helena; Lipsanen, Harri; Hannula, Simo-Pekka; Puurunen, Riikka L.

    19th European Conference on Chemical Vapor Deposition (EuroCVD 19). Elsevier, 2013.

    Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

    TY - GEN

    T1 - ALD Al2O3/TiO2 nanolaminates on Si

    T2 - residual stress, elastic modulus, hardness and adhesion

    AU - Ylivaara, Oili

    AU - Liu, Xuwen

    AU - Ali, Saima

    AU - Sintonen, Sakari

    AU - Laitinen, Mikko

    AU - Julin, Jaakko

    AU - Kilpi, Lauri

    AU - Sajavaara, Timo

    AU - Haimi, Eero

    AU - Ronkainen, Helena

    AU - Lipsanen, Harri

    AU - Hannula, Simo-Pekka

    AU - Puurunen, Riikka L.

    N1 - Project 74717 MECHALD

    PY - 2013/9/2

    Y1 - 2013/9/2

    KW - ALD

    KW - Atomic Layer Deposition

    KW - nanolaminate

    KW - Al2O3

    KW - TiO2

    KW - residual stress

    KW - elastic modulus

    KW - hardness

    KW - adhesion

    M3 - Conference article in proceedings

    BT - 19th European Conference on Chemical Vapor Deposition (EuroCVD 19)

    PB - Elsevier

    ER -

    Ylivaara O, Liu X, Ali S, Sintonen S, Laitinen M, Julin J et al. ALD Al2O3/TiO2 nanolaminates on Si: residual stress, elastic modulus, hardness and adhesion. In 19th European Conference on Chemical Vapor Deposition (EuroCVD 19). Elsevier. 2013