ALD Al2O3/TiO2 nanolaminates on Si: residual stress, elastic modulus, hardness and adhesion

Oili Ylivaara; Xuwen Liu; Saima Ali; Sakari Sintonen; Mikko Laitinen; Jaakko Julin; Lauri Kilpi; Timo Sajavaara; Eero Haimi; Helena Ronkainen; Harri Lipsanen; Simo-Pekka Hannula; Riikka L. Puurunen

ALD Al₂O₃/TiO₂ nanolaminates on Si: residual stress, elastic modulus, hardness and adhesion

Oili Ylivaara (Corresponding author), Xuwen Liu, Saima Ali, Sakari Sintonen, Mikko Laitinen, Jaakko Julin, Lauri Kilpi, Timo Sajavaara, Eero Haimi, Helena Ronkainen, Harri Lipsanen, Simo-Pekka Hannula, Riikka L. Puurunen

Research output: Chapter in Book/Report/Conference proceeding › Conference article in proceedings › Scientific › peer-review

Original language	English
Title of host publication	19th European Conference on Chemical Vapor Deposition (EuroCVD 19)
Editors	Francis Maury, Kostadinka Gesheva, Patrik Hoffmann, Graziella Malandrino
Place of Publication	Amsterdam
Publisher	Elsevier
ISBN (Print)	978-1-63266-358-0
Publication status	Published - 2 Sept 2013
MoE publication type	A4 Article in a conference publication
Event	19th European Conference on Chemical Vapor Deposition, EuroCVD 19 - Varna, Bulgaria Duration: 1 Sept 2013 → 6 Sept 2013

Publication series

Series	Physics Procedia
Volume	46
ISSN	1875-3884

Conference

Conference	19th European Conference on Chemical Vapor Deposition, EuroCVD 19
Abbreviated title	EuroCVD 19
Country/Territory	Bulgaria
City	Varna
Period	1/09/13 → 6/09/13

Keywords

ALD
Atomic Layer Deposition
nanolaminate
Al2O3
TiO2
residual stress
elastic modulus
hardness
adhesion

Cite this

Ylivaara, O., Liu, X., Ali, S., Sintonen, S., Laitinen, M., Julin, J., Kilpi, L., Sajavaara, T., Haimi, E., Ronkainen, H., Lipsanen, H., Hannula, S.-P., & Puurunen, R. L. (2013). ALD Al₂O₃/TiO₂ nanolaminates on Si: residual stress, elastic modulus, hardness and adhesion. In F. Maury, K. Gesheva, P. Hoffmann, & G. Malandrino (Eds.), 19th European Conference on Chemical Vapor Deposition (EuroCVD 19) Elsevier.

@inproceedings{8d4cb3f688d643358433d6b7042cdcbe,

title = "ALD Al2O3/TiO2 nanolaminates on Si: residual stress, elastic modulus, hardness and adhesion",

keywords = "ALD, Atomic Layer Deposition, nanolaminate, Al2O3, TiO2, residual stress, elastic modulus, hardness, adhesion",

author = "Oili Ylivaara and Xuwen Liu and Saima Ali and Sakari Sintonen and Mikko Laitinen and Jaakko Julin and Lauri Kilpi and Timo Sajavaara and Eero Haimi and Helena Ronkainen and Harri Lipsanen and Simo-Pekka Hannula and Puurunen, {Riikka L.}",

note = "Project 74717 MECHALD; 19th European Conference on Chemical Vapor Deposition, EuroCVD 19, EuroCVD 19 ; Conference date: 01-09-2013 Through 06-09-2013",

year = "2013",

month = sep,

day = "2",

language = "English",

isbn = "978-1-63266-358-0",

series = "Physics Procedia",

publisher = "Elsevier",

editor = "Francis Maury and Kostadinka Gesheva and Patrik Hoffmann and Graziella Malandrino",

booktitle = "19th European Conference on Chemical Vapor Deposition (EuroCVD 19)",

address = "Netherlands",

}

Ylivaara, O, Liu, X, Ali, S, Sintonen, S, Laitinen, M, Julin, J, Kilpi, L, Sajavaara, T, Haimi, E, Ronkainen, H, Lipsanen, H, Hannula, S-P & Puurunen, RL 2013, ALD Al₂O₃/TiO₂ nanolaminates on Si: residual stress, elastic modulus, hardness and adhesion. in F Maury, K Gesheva, P Hoffmann & G Malandrino (eds), 19th European Conference on Chemical Vapor Deposition (EuroCVD 19). Elsevier, Amsterdam, Physics Procedia, vol. 46, 19th European Conference on Chemical Vapor Deposition, EuroCVD 19, Varna, Bulgaria, 1/09/13.

ALD Al₂O₃/TiO₂ nanolaminates on Si: residual stress, elastic modulus, hardness and adhesion. / Ylivaara, Oili (Corresponding author); Liu, Xuwen; Ali, Saima et al.
19th European Conference on Chemical Vapor Deposition (EuroCVD 19). ed. / Francis Maury; Kostadinka Gesheva; Patrik Hoffmann; Graziella Malandrino. Amsterdam: Elsevier, 2013. (Physics Procedia, Vol. 46).

Research output: Chapter in Book/Report/Conference proceeding › Conference article in proceedings › Scientific › peer-review

TY - GEN

T1 - ALD Al2O3/TiO2 nanolaminates on Si

T2 - 19th European Conference on Chemical Vapor Deposition, EuroCVD 19

AU - Ylivaara, Oili

AU - Liu, Xuwen

AU - Ali, Saima

AU - Sintonen, Sakari

AU - Laitinen, Mikko

AU - Julin, Jaakko

AU - Kilpi, Lauri

AU - Sajavaara, Timo

AU - Haimi, Eero

AU - Ronkainen, Helena

AU - Lipsanen, Harri

AU - Hannula, Simo-Pekka

AU - Puurunen, Riikka L.

N1 - Project 74717 MECHALD

PY - 2013/9/2

Y1 - 2013/9/2

KW - ALD

KW - Atomic Layer Deposition

KW - nanolaminate

KW - Al2O3

KW - TiO2

KW - residual stress

KW - elastic modulus

KW - hardness

KW - adhesion

M3 - Conference article in proceedings

SN - 978-1-63266-358-0

T3 - Physics Procedia

BT - 19th European Conference on Chemical Vapor Deposition (EuroCVD 19)

A2 - Maury, Francis

A2 - Gesheva, Kostadinka

A2 - Hoffmann, Patrik

A2 - Malandrino, Graziella

PB - Elsevier

CY - Amsterdam

Y2 - 1 September 2013 through 6 September 2013

ER -