ALD coating of porous silicon

Kestutis Grigoras, J. Keskinen, Elina Yli-Rantala, S. Laakso, H. Välimäki, P. Kauranen, Jouni Ahopelto, Mika Prunnila

Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific

Abstract

Atomic layer deposition of thin TiN layer inside the porous silicon electrodes improves conductivity and passivates surface of porous silicon. This improves capacitance and stability of porous silicon based supercapacitors.
Original languageEnglish
Title of host publicationBALD2014 Abstract book
Publication statusPublished - 2014
Event12th International Baltic Conference on Atomic Layer Deposition, Baltic ALD 2014 - Helsinki, Finland
Duration: 12 May 201413 May 2014
Conference number: 12
http://www.aldcoe.fi/bald2014/program.pdf (Program)
http://www.aldcoe.fi/bald2014/posters.pdf (Posters)

Conference

Conference12th International Baltic Conference on Atomic Layer Deposition, Baltic ALD 2014
Abbreviated titleBaltic ALD 2014
CountryFinland
CityHelsinki
Period12/05/1413/05/14
OtherAbstracts reviewed and published.
Internet address

Fingerprint

Porous silicon
Coatings
Atomic layer deposition
Capacitance
Electrodes

Keywords

  • porous silicon
  • ALD
  • supercapacitor

Cite this

Grigoras, K., Keskinen, J., Yli-Rantala, E., Laakso, S., Välimäki, H., Kauranen, P., ... Prunnila, M. (2014). ALD coating of porous silicon. In BALD2014 Abstract book
Grigoras, Kestutis ; Keskinen, J. ; Yli-Rantala, Elina ; Laakso, S. ; Välimäki, H. ; Kauranen, P. ; Ahopelto, Jouni ; Prunnila, Mika. / ALD coating of porous silicon. BALD2014 Abstract book. 2014.
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title = "ALD coating of porous silicon",
abstract = "Atomic layer deposition of thin TiN layer inside the porous silicon electrodes improves conductivity and passivates surface of porous silicon. This improves capacitance and stability of porous silicon based supercapacitors.",
keywords = "porous silicon, ALD, supercapacitor",
author = "Kestutis Grigoras and J. Keskinen and Elina Yli-Rantala and S. Laakso and H. V{\"a}lim{\"a}ki and P. Kauranen and Jouni Ahopelto and Mika Prunnila",
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Grigoras, K, Keskinen, J, Yli-Rantala, E, Laakso, S, Välimäki, H, Kauranen, P, Ahopelto, J & Prunnila, M 2014, ALD coating of porous silicon. in BALD2014 Abstract book. 12th International Baltic Conference on Atomic Layer Deposition, Baltic ALD 2014, Helsinki, Finland, 12/05/14.

ALD coating of porous silicon. / Grigoras, Kestutis; Keskinen, J.; Yli-Rantala, Elina; Laakso, S.; Välimäki, H.; Kauranen, P.; Ahopelto, Jouni; Prunnila, Mika.

BALD2014 Abstract book. 2014.

Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific

TY - CHAP

T1 - ALD coating of porous silicon

AU - Grigoras, Kestutis

AU - Keskinen, J.

AU - Yli-Rantala, Elina

AU - Laakso, S.

AU - Välimäki, H.

AU - Kauranen, P.

AU - Ahopelto, Jouni

AU - Prunnila, Mika

N1 - Project code: 73742, abstract reviewed

PY - 2014

Y1 - 2014

N2 - Atomic layer deposition of thin TiN layer inside the porous silicon electrodes improves conductivity and passivates surface of porous silicon. This improves capacitance and stability of porous silicon based supercapacitors.

AB - Atomic layer deposition of thin TiN layer inside the porous silicon electrodes improves conductivity and passivates surface of porous silicon. This improves capacitance and stability of porous silicon based supercapacitors.

KW - porous silicon

KW - ALD

KW - supercapacitor

M3 - Conference abstract in proceedings

BT - BALD2014 Abstract book

ER -

Grigoras K, Keskinen J, Yli-Rantala E, Laakso S, Välimäki H, Kauranen P et al. ALD coating of porous silicon. In BALD2014 Abstract book. 2014