ALD coating of porous silicon

Kestutis Grigoras, J. Keskinen, Elina Yli-Rantala, S. Laakso, H. Välimäki, P. Kauranen, Jouni Ahopelto, Mika Prunnila

    Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific

    Abstract

    Atomic layer deposition of thin TiN layer inside the porous silicon electrodes improves conductivity and passivates surface of porous silicon. This improves capacitance and stability of porous silicon based supercapacitors.
    Original languageEnglish
    Title of host publicationBALD2014 Abstract book
    Publication statusPublished - 2014
    Event12th International Baltic Conference on Atomic Layer Deposition, Baltic ALD 2014 - Helsinki, Finland
    Duration: 12 May 201413 May 2014
    Conference number: 12
    http://www.aldcoe.fi/bald2014/program.pdf (Program)
    http://www.aldcoe.fi/bald2014/posters.pdf (Posters)

    Conference

    Conference12th International Baltic Conference on Atomic Layer Deposition, Baltic ALD 2014
    Abbreviated titleBaltic ALD 2014
    Country/TerritoryFinland
    CityHelsinki
    Period12/05/1413/05/14
    OtherAbstracts reviewed and published.
    Internet address

    Keywords

    • porous silicon
    • ALD
    • supercapacitor

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