ALD thin films for PEM fuel cells for automotive MEAs

Pirjo Heikkilä; Matti Putkonen; Antti Pasanen; Hille Rautkoski; M. Bosund; Jari Ihonen; Mika Vähä-Nissi

ALD thin films for PEM fuel cells for automotive MEAs

Pirjo Heikkilä, Matti Putkonen, Antti Pasanen, Hille Rautkoski, M. Bosund, Jari Ihonen, Mika Vähä-Nissi

Beneq Oy

Research output: Chapter in Book/Report/Conference proceeding › Conference abstract in proceedings › Scientific

Abstract

Possibility to control the adhesion properties is important in various industrial applications. Since the topmost surface layers have the greatest role in adhesion thus making surface-controlled atomic layer deposition (ALD) reactions appealing method for tailoring surface adhesion properties. In this presentation we show that ALD and molecular-layer-deposition (MLD) can be used to adjust wetting characteristics of polymers and metals. Recently we have been modifying surface properties for various applications including ink-jet printed films, adhesion promoting layers for extrusion coatings and anti-ice coatings. In addition to conventional inorganic metal oxides, such as Al2O3, we have tested also inorganic-organic hybrid MLD materials. Various tools, such as XPS, FT-IR and TOF-ERDA, were used to characterize these films, and wetting behavior was determined using contact angles measurements with the sessile drop method.

Original language	English
Title of host publication	Technical Program & Abstracts
Publisher	American Vacuum Society (AVS)
Publication status	Published - 2014
Event	14th International Conference on Atomic Layer Deposition, ALD 2014 - Kyoto, Japan Duration: 15 Jun 2014 → 18 Jun 2014 Conference number: 14

Conference

Conference	14th International Conference on Atomic Layer Deposition, ALD 2014
Abbreviated title	ALD 2014
Country/Territory	Japan
City	Kyoto
Period	15/06/14 → 18/06/14

Keywords

thin films
ALD
surface chemistry

Cite this

@inbook{9020c2e82fc14b33bae714d0c656151d,

title = "ALD thin films for PEM fuel cells for automotive MEAs",

abstract = "Possibility to control the adhesion properties is important in various industrial applications. Since the topmost surface layers have the greatest role in adhesion thus making surface-controlled atomic layer deposition (ALD) reactions appealing method for tailoring surface adhesion properties. In this presentation we show that ALD and molecular-layer-deposition (MLD) can be used to adjust wetting characteristics of polymers and metals. Recently we have been modifying surface properties for various applications including ink-jet printed films, adhesion promoting layers for extrusion coatings and anti-ice coatings. In addition to conventional inorganic metal oxides, such as Al2O3, we have tested also inorganic-organic hybrid MLD materials. Various tools, such as XPS, FT-IR and TOF-ERDA, were used to characterize these films, and wetting behavior was determined using contact angles measurements with the sessile drop method.",

keywords = "thin films, ALD, surface chemistry",

author = "Pirjo Heikkil{\"a} and Matti Putkonen and Antti Pasanen and Hille Rautkoski and M. Bosund and Jari Ihonen and Mika V{\"a}h{\"a}-Nissi",

note = "HUO: Poster session, published abstract Project code: 79749; 14th International Conference on Atomic Layer Deposition, ALD 2014, ALD 2014 ; Conference date: 15-06-2014 Through 18-06-2014",

year = "2014",

language = "English",

booktitle = "Technical Program & Abstracts",

publisher = "American Vacuum Society (AVS)",

address = "United States",

}

TY - CHAP

T1 - ALD thin films for PEM fuel cells for automotive MEAs

AU - Heikkilä, Pirjo

AU - Putkonen, Matti

AU - Pasanen, Antti

AU - Rautkoski, Hille

AU - Bosund, M.

AU - Ihonen, Jari

AU - Vähä-Nissi, Mika

N1 - Conference code: 14

PY - 2014

Y1 - 2014

N2 - Possibility to control the adhesion properties is important in various industrial applications. Since the topmost surface layers have the greatest role in adhesion thus making surface-controlled atomic layer deposition (ALD) reactions appealing method for tailoring surface adhesion properties. In this presentation we show that ALD and molecular-layer-deposition (MLD) can be used to adjust wetting characteristics of polymers and metals. Recently we have been modifying surface properties for various applications including ink-jet printed films, adhesion promoting layers for extrusion coatings and anti-ice coatings. In addition to conventional inorganic metal oxides, such as Al2O3, we have tested also inorganic-organic hybrid MLD materials. Various tools, such as XPS, FT-IR and TOF-ERDA, were used to characterize these films, and wetting behavior was determined using contact angles measurements with the sessile drop method.

AB - Possibility to control the adhesion properties is important in various industrial applications. Since the topmost surface layers have the greatest role in adhesion thus making surface-controlled atomic layer deposition (ALD) reactions appealing method for tailoring surface adhesion properties. In this presentation we show that ALD and molecular-layer-deposition (MLD) can be used to adjust wetting characteristics of polymers and metals. Recently we have been modifying surface properties for various applications including ink-jet printed films, adhesion promoting layers for extrusion coatings and anti-ice coatings. In addition to conventional inorganic metal oxides, such as Al2O3, we have tested also inorganic-organic hybrid MLD materials. Various tools, such as XPS, FT-IR and TOF-ERDA, were used to characterize these films, and wetting behavior was determined using contact angles measurements with the sessile drop method.

KW - thin films

KW - ALD

KW - surface chemistry

M3 - Conference abstract in proceedings

BT - Technical Program & Abstracts

PB - American Vacuum Society (AVS)

T2 - 14th International Conference on Atomic Layer Deposition, ALD 2014

Y2 - 15 June 2014 through 18 June 2014

ER -

ALD thin films for PEM fuel cells for automotive MEAs

Abstract

Conference

Keywords

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