ALD/MLD deposited hybrid of DL-lactic acid and trimethylaluminium

Mika Vähä-Nissi, Jenni Sievänen, Erkki Salo, L.-S. Johansson, Eija Kenttä, Matti Putkonen, Ali Harlin

Research output: Contribution to conferenceConference AbstractScientificpeer-review

Abstract

Atomic and molecular layer deposition techniques have been successfully combined to produce inorganic-organic hybrid films with properties derived from both the inorganic and organic components. There are few reports dealing with further converting of ALD/MLD thin films. Typically inorganic oxide layers on polymer films in most cases require an additional top layer to enable heat sealing and to protect the thin film from mechanical stresses and defects. Adhesion of low-density polyethylene, polyethylene terephthalate and polylactic acid on ALD Al2O3 have been tested previously, where good adhesion was achieved in most cases only with the low-density polyethylene. In this study we report deposition of a hybrid ALD/MLD layer, its properties, as well as its use as adhesion layer for polyactic acid (PLA) extrusion coatings. A mixture of both lactic acid optical isomers, D- and L-lactic acids, was used as MLD precursor. 25 and 45 nm thick hybrid films were analyzed. XPS analyses gave a quite similar composition for both of these two coatings. FTIR analyses also indicated presence and bonding of hybrid components. The oxygen to carbon and oxygen to aluminum ratios were in line with theoretical calculations for such a hybrid. Deposition mechanism is expected to involve both hydroxyl groups of the lactic acid. However, the results indicated also other types of bonding between lactic acid and TMA or between the lactic acid molecules. The thickness of the hybrid remained the same for at least a week after the deposition indicating certain level of stability. In next step cellophane film deposited with 25 nm Al2O3 and 13 nm TMA-lactic acid hybrid was used as a substrate for PLA extrusion at different melt temperatures. Uncoated cellophane and BOPLA were used as reference substrates. PLA adhered only to itself and to the ALD/MLD hybrid with peel strength values exceeding 100 N/m, while PLA did not adhere to plain cellophane. Thickness of the MLD/ALD hybrid on ALD Al2O3 layer had no obvious effect on the adhesion properties at sealing temperature of 170 °C.
Original languageEnglish
Publication statusPublished - 2013
Event13th International Conference on Atomic Layer Deposition, ALD 2013 - San Diego, California, San Diego, United States
Duration: 28 Jul 201331 Jul 2013
Conference number: 13

Conference

Conference13th International Conference on Atomic Layer Deposition, ALD 2013
Abbreviated titleALD 2013
CountryUnited States
CitySan Diego
Period28/07/1331/07/13

Fingerprint

Lactic Acid
Cellophane
Adhesion
Acids
Polyethylene
Extrusion
Oxygen
Thin films
Coatings
Polyethylene Terephthalates
Substrates
Aluminum
Polymer films
Isomers
Hydroxyl Radical
Oxides
Carbon
X ray photoelectron spectroscopy
Temperature
Defects

Keywords

  • adhesion
  • ALD
  • hybrid
  • lactic acid
  • MLD
  • PLA

Cite this

Vähä-Nissi, M., Sievänen, J., Salo, E., Johansson, L-S., Kenttä, E., Putkonen, M., & Harlin, A. (2013). ALD/MLD deposited hybrid of DL-lactic acid and trimethylaluminium. Abstract from 13th International Conference on Atomic Layer Deposition, ALD 2013, San Diego, United States.
Vähä-Nissi, Mika ; Sievänen, Jenni ; Salo, Erkki ; Johansson, L.-S. ; Kenttä, Eija ; Putkonen, Matti ; Harlin, Ali. / ALD/MLD deposited hybrid of DL-lactic acid and trimethylaluminium. Abstract from 13th International Conference on Atomic Layer Deposition, ALD 2013, San Diego, United States.
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Vähä-Nissi, M, Sievänen, J, Salo, E, Johansson, L-S, Kenttä, E, Putkonen, M & Harlin, A 2013, 'ALD/MLD deposited hybrid of DL-lactic acid and trimethylaluminium' 13th International Conference on Atomic Layer Deposition, ALD 2013, San Diego, United States, 28/07/13 - 31/07/13, .

ALD/MLD deposited hybrid of DL-lactic acid and trimethylaluminium. / Vähä-Nissi, Mika; Sievänen, Jenni; Salo, Erkki; Johansson, L.-S.; Kenttä, Eija; Putkonen, Matti; Harlin, Ali.

2013. Abstract from 13th International Conference on Atomic Layer Deposition, ALD 2013, San Diego, United States.

Research output: Contribution to conferenceConference AbstractScientificpeer-review

TY - CONF

T1 - ALD/MLD deposited hybrid of DL-lactic acid and trimethylaluminium

AU - Vähä-Nissi, Mika

AU - Sievänen, Jenni

AU - Salo, Erkki

AU - Johansson, L.-S.

AU - Kenttä, Eija

AU - Putkonen, Matti

AU - Harlin, Ali

N1 - Poster presentation Project code: 80288

PY - 2013

Y1 - 2013

N2 - Atomic and molecular layer deposition techniques have been successfully combined to produce inorganic-organic hybrid films with properties derived from both the inorganic and organic components. There are few reports dealing with further converting of ALD/MLD thin films. Typically inorganic oxide layers on polymer films in most cases require an additional top layer to enable heat sealing and to protect the thin film from mechanical stresses and defects. Adhesion of low-density polyethylene, polyethylene terephthalate and polylactic acid on ALD Al2O3 have been tested previously, where good adhesion was achieved in most cases only with the low-density polyethylene. In this study we report deposition of a hybrid ALD/MLD layer, its properties, as well as its use as adhesion layer for polyactic acid (PLA) extrusion coatings. A mixture of both lactic acid optical isomers, D- and L-lactic acids, was used as MLD precursor. 25 and 45 nm thick hybrid films were analyzed. XPS analyses gave a quite similar composition for both of these two coatings. FTIR analyses also indicated presence and bonding of hybrid components. The oxygen to carbon and oxygen to aluminum ratios were in line with theoretical calculations for such a hybrid. Deposition mechanism is expected to involve both hydroxyl groups of the lactic acid. However, the results indicated also other types of bonding between lactic acid and TMA or between the lactic acid molecules. The thickness of the hybrid remained the same for at least a week after the deposition indicating certain level of stability. In next step cellophane film deposited with 25 nm Al2O3 and 13 nm TMA-lactic acid hybrid was used as a substrate for PLA extrusion at different melt temperatures. Uncoated cellophane and BOPLA were used as reference substrates. PLA adhered only to itself and to the ALD/MLD hybrid with peel strength values exceeding 100 N/m, while PLA did not adhere to plain cellophane. Thickness of the MLD/ALD hybrid on ALD Al2O3 layer had no obvious effect on the adhesion properties at sealing temperature of 170 °C.

AB - Atomic and molecular layer deposition techniques have been successfully combined to produce inorganic-organic hybrid films with properties derived from both the inorganic and organic components. There are few reports dealing with further converting of ALD/MLD thin films. Typically inorganic oxide layers on polymer films in most cases require an additional top layer to enable heat sealing and to protect the thin film from mechanical stresses and defects. Adhesion of low-density polyethylene, polyethylene terephthalate and polylactic acid on ALD Al2O3 have been tested previously, where good adhesion was achieved in most cases only with the low-density polyethylene. In this study we report deposition of a hybrid ALD/MLD layer, its properties, as well as its use as adhesion layer for polyactic acid (PLA) extrusion coatings. A mixture of both lactic acid optical isomers, D- and L-lactic acids, was used as MLD precursor. 25 and 45 nm thick hybrid films were analyzed. XPS analyses gave a quite similar composition for both of these two coatings. FTIR analyses also indicated presence and bonding of hybrid components. The oxygen to carbon and oxygen to aluminum ratios were in line with theoretical calculations for such a hybrid. Deposition mechanism is expected to involve both hydroxyl groups of the lactic acid. However, the results indicated also other types of bonding between lactic acid and TMA or between the lactic acid molecules. The thickness of the hybrid remained the same for at least a week after the deposition indicating certain level of stability. In next step cellophane film deposited with 25 nm Al2O3 and 13 nm TMA-lactic acid hybrid was used as a substrate for PLA extrusion at different melt temperatures. Uncoated cellophane and BOPLA were used as reference substrates. PLA adhered only to itself and to the ALD/MLD hybrid with peel strength values exceeding 100 N/m, while PLA did not adhere to plain cellophane. Thickness of the MLD/ALD hybrid on ALD Al2O3 layer had no obvious effect on the adhesion properties at sealing temperature of 170 °C.

KW - adhesion

KW - ALD

KW - hybrid

KW - lactic acid

KW - MLD

KW - PLA

M3 - Conference Abstract

ER -

Vähä-Nissi M, Sievänen J, Salo E, Johansson L-S, Kenttä E, Putkonen M et al. ALD/MLD deposited hybrid of DL-lactic acid and trimethylaluminium. 2013. Abstract from 13th International Conference on Atomic Layer Deposition, ALD 2013, San Diego, United States.