Al₂O₃ Thin Films Prepared by a Combined Thermal-Plasma Atomic Layer Deposition Process at Low Temperature for Encapsulation Applications

Zhen Zhu^* (Corresponding Author), Saoussen Merdes (Corresponding Author), Oili M.E. Ylivaara, Kenichiro Mizohata, Mikko J. Heikkilä, Hele Savin

^*Corresponding author for this work