Al2O3 Thin Films Prepared by a Combined Thermal-Plasma Atomic Layer Deposition Process at Low Temperature for Encapsulation Applications

Zhen Zhu (Corresponding Author), Saoussen Merdes (Corresponding Author), Oili M.E. Ylivaara, Kenichiro Mizohata, Mikko J. Heikkilä, Hele Savin

Research output: Contribution to journal › Article › peer-review

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Engineering & Materials Science

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