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Amorphization of silicon by high dose germanium ion implantation with no external cooling mechanism

  • Z. Xia*
  • , Jaakko Saarilahti
  • , E. Ristolainen
  • , S. Eränen
  • , Hannu Ronkainen
  • , Pekka Kuivalainen
  • , D. Paine
  • , T. Tuomi
    • *Corresponding author for this work
    • Aalto University
    • Brown University

    Research output: Contribution to journal › Article › Scientific › peer-review

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