Amorphous metal alloy based MEMS for RF applications

Mari Ylönen (Corresponding Author), Tauno Vähä-Heikkilä, Hannu Kattelus

    Research output: Contribution to journalArticle in a proceedings journalScientificpeer-review

    11 Citations (Scopus)

    Abstract

    A new MEMS process based on amorphous metal alloys has been developed. The alloy in question is sputter-deposited molybdenum–silicon–nitrogen (Mo–Si–N) with atomic composition of 31 at% Mo, 20 at% Si, 45 at% N and 4 at% O and tensile residual stress of 300 MPa. This surface micromechanical process has been used for fabrication of variable capacitors for microwave and millimetre wave applications. The devices have been measured up to 110 GHz. They showed low loss (less than 0.2 dB up to 20 GHz and 1.2 dB up to 110 GHz in their up-state) and good matching. The devices have also been cycled 50 million times with 100 Hz frequency between the up- and down-states without impaired performance.
    Original languageEnglish
    Pages (from-to)283-288
    Number of pages6
    JournalSensors and Actuators A: Physical
    Volume132
    Issue number1
    DOIs
    Publication statusPublished - 2006
    MoE publication typeA4 Article in a conference publication
    Event19th European Conference on Solid-State Transducers, Eurosensors XIX - Barcelona, Spain
    Duration: 11 Sep 200514 Sep 2005

    Keywords

    • amorphous metal alloys
    • Mo-Si-N
    • variable capacitor
    • RF-MEMS
    • MEMS
    • molybdenum
    • silicon
    • nitrogen
    • varactor

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