Amorphous metal alloy based MEMS for RF applications

Mari Ylönen (Corresponding Author), Tauno Vähä-Heikkilä, Hannu Kattelus

Research output: Contribution to journalArticleScientificpeer-review

9 Citations (Scopus)

Abstract

A new MEMS process based on amorphous metal alloys has been developed. The alloy in question is sputter-deposited molybdenum–silicon–nitrogen (Mo–Si–N) with atomic composition of 31 at% Mo, 20 at% Si, 45 at% N and 4 at% O and tensile residual stress of 300 MPa. This surface micromechanical process has been used for fabrication of variable capacitors for microwave and millimetre wave applications. The devices have been measured up to 110 GHz. They showed low loss (less than 0.2 dB up to 20 GHz and 1.2 dB up to 110 GHz in their up-state) and good matching. The devices have also been cycled 50 million times with 100 Hz frequency between the up- and down-states without impaired performance.
Original languageEnglish
Pages (from-to)283-288
Number of pages6
JournalSensors and Actuators A: Physical
Volume132
Issue number1
DOIs
Publication statusPublished - 2006
MoE publication typeA1 Journal article-refereed
EventThe 19th European Conference on Solid-State Transducers - Barcelona, Spain
Duration: 11 Sep 200514 Sep 2005

Fingerprint

microelectromechanical systems
MEMS
Metals
tensile stress
Millimeter waves
Tensile stress
metals
millimeter waves
residual stress
Residual stresses
capacitors
Capacitors
Microwaves
microwaves
Fabrication
fabrication
Chemical analysis

Keywords

  • amorphous metal alloys
  • Mo-Si-N
  • variable capacitor
  • RF-MEMS
  • MEMS
  • molybdenum
  • silicon
  • nitrogen
  • varactor

Cite this

Ylönen, Mari ; Vähä-Heikkilä, Tauno ; Kattelus, Hannu. / Amorphous metal alloy based MEMS for RF applications. In: Sensors and Actuators A: Physical. 2006 ; Vol. 132, No. 1. pp. 283-288.
@article{d56d0aca98b1447ca5ed82fc6654ac48,
title = "Amorphous metal alloy based MEMS for RF applications",
abstract = "A new MEMS process based on amorphous metal alloys has been developed. The alloy in question is sputter-deposited molybdenum–silicon–nitrogen (Mo–Si–N) with atomic composition of 31 at{\%} Mo, 20 at{\%} Si, 45 at{\%} N and 4 at{\%} O and tensile residual stress of 300 MPa. This surface micromechanical process has been used for fabrication of variable capacitors for microwave and millimetre wave applications. The devices have been measured up to 110 GHz. They showed low loss (less than 0.2 dB up to 20 GHz and 1.2 dB up to 110 GHz in their up-state) and good matching. The devices have also been cycled 50 million times with 100 Hz frequency between the up- and down-states without impaired performance.",
keywords = "amorphous metal alloys, Mo-Si-N, variable capacitor, RF-MEMS, MEMS, molybdenum, silicon, nitrogen, varactor",
author = "Mari Yl{\"o}nen and Tauno V{\"a}h{\"a}-Heikkil{\"a} and Hannu Kattelus",
year = "2006",
doi = "10.1016/j.sna.2006.05.033",
language = "English",
volume = "132",
pages = "283--288",
journal = "Sensors and Actuators A: Physical",
issn = "0924-4247",
publisher = "Elsevier",
number = "1",

}

Amorphous metal alloy based MEMS for RF applications. / Ylönen, Mari (Corresponding Author); Vähä-Heikkilä, Tauno; Kattelus, Hannu.

In: Sensors and Actuators A: Physical, Vol. 132, No. 1, 2006, p. 283-288.

Research output: Contribution to journalArticleScientificpeer-review

TY - JOUR

T1 - Amorphous metal alloy based MEMS for RF applications

AU - Ylönen, Mari

AU - Vähä-Heikkilä, Tauno

AU - Kattelus, Hannu

PY - 2006

Y1 - 2006

N2 - A new MEMS process based on amorphous metal alloys has been developed. The alloy in question is sputter-deposited molybdenum–silicon–nitrogen (Mo–Si–N) with atomic composition of 31 at% Mo, 20 at% Si, 45 at% N and 4 at% O and tensile residual stress of 300 MPa. This surface micromechanical process has been used for fabrication of variable capacitors for microwave and millimetre wave applications. The devices have been measured up to 110 GHz. They showed low loss (less than 0.2 dB up to 20 GHz and 1.2 dB up to 110 GHz in their up-state) and good matching. The devices have also been cycled 50 million times with 100 Hz frequency between the up- and down-states without impaired performance.

AB - A new MEMS process based on amorphous metal alloys has been developed. The alloy in question is sputter-deposited molybdenum–silicon–nitrogen (Mo–Si–N) with atomic composition of 31 at% Mo, 20 at% Si, 45 at% N and 4 at% O and tensile residual stress of 300 MPa. This surface micromechanical process has been used for fabrication of variable capacitors for microwave and millimetre wave applications. The devices have been measured up to 110 GHz. They showed low loss (less than 0.2 dB up to 20 GHz and 1.2 dB up to 110 GHz in their up-state) and good matching. The devices have also been cycled 50 million times with 100 Hz frequency between the up- and down-states without impaired performance.

KW - amorphous metal alloys

KW - Mo-Si-N

KW - variable capacitor

KW - RF-MEMS

KW - MEMS

KW - molybdenum

KW - silicon

KW - nitrogen

KW - varactor

U2 - 10.1016/j.sna.2006.05.033

DO - 10.1016/j.sna.2006.05.033

M3 - Article

VL - 132

SP - 283

EP - 288

JO - Sensors and Actuators A: Physical

JF - Sensors and Actuators A: Physical

SN - 0924-4247

IS - 1

ER -