Amorphous metal alloy based MEMS for RF applications

Mari Ylönen (Corresponding Author), Tauno Vähä-Heikkilä, Hannu Kattelus

Research output: Contribution to journalArticle in a proceedings journalScientificpeer-review

11 Citations (Scopus)

Abstract

A new MEMS process based on amorphous metal alloys has been developed. The alloy in question is sputter-deposited molybdenum–silicon–nitrogen (Mo–Si–N) with atomic composition of 31 at% Mo, 20 at% Si, 45 at% N and 4 at% O and tensile residual stress of 300 MPa. This surface micromechanical process has been used for fabrication of variable capacitors for microwave and millimetre wave applications. The devices have been measured up to 110 GHz. They showed low loss (less than 0.2 dB up to 20 GHz and 1.2 dB up to 110 GHz in their up-state) and good matching. The devices have also been cycled 50 million times with 100 Hz frequency between the up- and down-states without impaired performance.
Original languageEnglish
Pages (from-to)283-288
Number of pages6
JournalSensors and Actuators A: Physical
Volume132
Issue number1
DOIs
Publication statusPublished - 2006
MoE publication typeA4 Article in a conference publication
Event19th European Conference on Solid-State Transducers, Eurosensors XIX - Barcelona, Spain
Duration: 11 Sep 200514 Sep 2005

Keywords

  • amorphous metal alloys
  • Mo-Si-N
  • variable capacitor
  • RF-MEMS
  • MEMS
  • molybdenum
  • silicon
  • nitrogen
  • varactor

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