Amorphous Mo-N and Mo-Si-N films in microelectromechanical systems

Hannu Kattelus (Corresponding Author), Mari Ylönen, Martti Blomberg

    Research output: Contribution to journalArticleScientificpeer-review

    12 Citations (Scopus)

    Abstract

    Micromachining based on metallic structural material possesses several inherent advantages. Metallic thin films can be deposited at room temperature by various means. In microelectromechanical systems they can thus be fabricated on top of polymeric sacrificial materials. The sacrificial layer is finally removed in oxygen plasma either before or after wafer dicing with no need for wet processing. However, in metallic micromachining, it is not trivial to find materials and processes producing structural layers with well‐controlled and uniform mechanical characteristics. Amorphous alloys Mo–N and Mo–Si–N are investigated in this study for the purpose, showing properties superior to polycrystalline metals for microelectromechanical devices and systems applications.
    Original languageEnglish
    Pages (from-to)743 - 749
    Number of pages7
    JournalFatigue & Fracture of Engineering Materials & Structures
    Volume28
    Issue number8
    DOIs
    Publication statusPublished - 2005
    MoE publication typeA1 Journal article-refereed

    Fingerprint

    Micromachining
    MEMS
    Microelectromechanical devices
    Metallic films
    Amorphous alloys
    Metals
    Oxygen
    Plasmas
    Thin films
    Polymers
    Processing
    Temperature

    Keywords

    • microelectromechanical systems
    • MEMS
    • amorphous metal alloys
    • thin films
    • molybdenum
    • nitrogen
    • silicon

    Cite this

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    title = "Amorphous Mo-N and Mo-Si-N films in microelectromechanical systems",
    abstract = "Micromachining based on metallic structural material possesses several inherent advantages. Metallic thin films can be deposited at room temperature by various means. In microelectromechanical systems they can thus be fabricated on top of polymeric sacrificial materials. The sacrificial layer is finally removed in oxygen plasma either before or after wafer dicing with no need for wet processing. However, in metallic micromachining, it is not trivial to find materials and processes producing structural layers with well‐controlled and uniform mechanical characteristics. Amorphous alloys Mo–N and Mo–Si–N are investigated in this study for the purpose, showing properties superior to polycrystalline metals for microelectromechanical devices and systems applications.",
    keywords = "microelectromechanical systems, MEMS, amorphous metal alloys, thin films, molybdenum, nitrogen, silicon",
    author = "Hannu Kattelus and Mari Yl{\"o}nen and Martti Blomberg",
    year = "2005",
    doi = "10.1111/j.1460-2695.2005.00887.x",
    language = "English",
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    Amorphous Mo-N and Mo-Si-N films in microelectromechanical systems. / Kattelus, Hannu (Corresponding Author); Ylönen, Mari; Blomberg, Martti.

    In: Fatigue & Fracture of Engineering Materials & Structures, Vol. 28, No. 8, 2005, p. 743 - 749.

    Research output: Contribution to journalArticleScientificpeer-review

    TY - JOUR

    T1 - Amorphous Mo-N and Mo-Si-N films in microelectromechanical systems

    AU - Kattelus, Hannu

    AU - Ylönen, Mari

    AU - Blomberg, Martti

    PY - 2005

    Y1 - 2005

    N2 - Micromachining based on metallic structural material possesses several inherent advantages. Metallic thin films can be deposited at room temperature by various means. In microelectromechanical systems they can thus be fabricated on top of polymeric sacrificial materials. The sacrificial layer is finally removed in oxygen plasma either before or after wafer dicing with no need for wet processing. However, in metallic micromachining, it is not trivial to find materials and processes producing structural layers with well‐controlled and uniform mechanical characteristics. Amorphous alloys Mo–N and Mo–Si–N are investigated in this study for the purpose, showing properties superior to polycrystalline metals for microelectromechanical devices and systems applications.

    AB - Micromachining based on metallic structural material possesses several inherent advantages. Metallic thin films can be deposited at room temperature by various means. In microelectromechanical systems they can thus be fabricated on top of polymeric sacrificial materials. The sacrificial layer is finally removed in oxygen plasma either before or after wafer dicing with no need for wet processing. However, in metallic micromachining, it is not trivial to find materials and processes producing structural layers with well‐controlled and uniform mechanical characteristics. Amorphous alloys Mo–N and Mo–Si–N are investigated in this study for the purpose, showing properties superior to polycrystalline metals for microelectromechanical devices and systems applications.

    KW - microelectromechanical systems

    KW - MEMS

    KW - amorphous metal alloys

    KW - thin films

    KW - molybdenum

    KW - nitrogen

    KW - silicon

    U2 - 10.1111/j.1460-2695.2005.00887.x

    DO - 10.1111/j.1460-2695.2005.00887.x

    M3 - Article

    VL - 28

    SP - 743

    EP - 749

    JO - Fatigue & Fracture of Engineering Materials & Structures

    JF - Fatigue & Fracture of Engineering Materials & Structures

    SN - 8756-758X

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    ER -