Amorphous Mo-N and Mo-Si-N films in microelectromechanical systems

Hannu Kattelus (Corresponding Author), Mari Ylönen, Martti Blomberg

    Research output: Contribution to journalArticleScientificpeer-review

    12 Citations (Scopus)

    Abstract

    Micromachining based on metallic structural material possesses several inherent advantages. Metallic thin films can be deposited at room temperature by various means. In microelectromechanical systems they can thus be fabricated on top of polymeric sacrificial materials. The sacrificial layer is finally removed in oxygen plasma either before or after wafer dicing with no need for wet processing. However, in metallic micromachining, it is not trivial to find materials and processes producing structural layers with well‐controlled and uniform mechanical characteristics. Amorphous alloys Mo–N and Mo–Si–N are investigated in this study for the purpose, showing properties superior to polycrystalline metals for microelectromechanical devices and systems applications.
    Original languageEnglish
    Pages (from-to)743 - 749
    Number of pages7
    JournalFatigue & Fracture of Engineering Materials & Structures
    Volume28
    Issue number8
    DOIs
    Publication statusPublished - 2005
    MoE publication typeA1 Journal article-refereed

    Keywords

    • microelectromechanical systems
    • MEMS
    • amorphous metal alloys
    • thin films
    • molybdenum
    • nitrogen
    • silicon

    Fingerprint Dive into the research topics of 'Amorphous Mo-N and Mo-Si-N films in microelectromechanical systems'. Together they form a unique fingerprint.

    Cite this