Amorphous Mo-N and Mo-Si-N films in microelectromechanical systems

Hannu Kattelus (Corresponding Author), Mari Ylönen, Martti Blomberg

Research output: Contribution to journalArticleScientificpeer-review

12 Citations (Scopus)

Abstract

Micromachining based on metallic structural material possesses several inherent advantages. Metallic thin films can be deposited at room temperature by various means. In microelectromechanical systems they can thus be fabricated on top of polymeric sacrificial materials. The sacrificial layer is finally removed in oxygen plasma either before or after wafer dicing with no need for wet processing. However, in metallic micromachining, it is not trivial to find materials and processes producing structural layers with well‐controlled and uniform mechanical characteristics. Amorphous alloys Mo–N and Mo–Si–N are investigated in this study for the purpose, showing properties superior to polycrystalline metals for microelectromechanical devices and systems applications.
Original languageEnglish
Pages (from-to)743 - 749
Number of pages7
JournalFatigue & Fracture of Engineering Materials & Structures
Volume28
Issue number8
DOIs
Publication statusPublished - 2005
MoE publication typeA1 Journal article-refereed

Fingerprint

Micromachining
MEMS
Microelectromechanical devices
Metallic films
Amorphous alloys
Metals
Oxygen
Plasmas
Thin films
Polymers
Processing
Temperature

Keywords

  • microelectromechanical systems
  • MEMS
  • amorphous metal alloys
  • thin films
  • molybdenum
  • nitrogen
  • silicon

Cite this

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abstract = "Micromachining based on metallic structural material possesses several inherent advantages. Metallic thin films can be deposited at room temperature by various means. In microelectromechanical systems they can thus be fabricated on top of polymeric sacrificial materials. The sacrificial layer is finally removed in oxygen plasma either before or after wafer dicing with no need for wet processing. However, in metallic micromachining, it is not trivial to find materials and processes producing structural layers with well‐controlled and uniform mechanical characteristics. Amorphous alloys Mo–N and Mo–Si–N are investigated in this study for the purpose, showing properties superior to polycrystalline metals for microelectromechanical devices and systems applications.",
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Amorphous Mo-N and Mo-Si-N films in microelectromechanical systems. / Kattelus, Hannu (Corresponding Author); Ylönen, Mari; Blomberg, Martti.

In: Fatigue & Fracture of Engineering Materials & Structures, Vol. 28, No. 8, 2005, p. 743 - 749.

Research output: Contribution to journalArticleScientificpeer-review

TY - JOUR

T1 - Amorphous Mo-N and Mo-Si-N films in microelectromechanical systems

AU - Kattelus, Hannu

AU - Ylönen, Mari

AU - Blomberg, Martti

PY - 2005

Y1 - 2005

N2 - Micromachining based on metallic structural material possesses several inherent advantages. Metallic thin films can be deposited at room temperature by various means. In microelectromechanical systems they can thus be fabricated on top of polymeric sacrificial materials. The sacrificial layer is finally removed in oxygen plasma either before or after wafer dicing with no need for wet processing. However, in metallic micromachining, it is not trivial to find materials and processes producing structural layers with well‐controlled and uniform mechanical characteristics. Amorphous alloys Mo–N and Mo–Si–N are investigated in this study for the purpose, showing properties superior to polycrystalline metals for microelectromechanical devices and systems applications.

AB - Micromachining based on metallic structural material possesses several inherent advantages. Metallic thin films can be deposited at room temperature by various means. In microelectromechanical systems they can thus be fabricated on top of polymeric sacrificial materials. The sacrificial layer is finally removed in oxygen plasma either before or after wafer dicing with no need for wet processing. However, in metallic micromachining, it is not trivial to find materials and processes producing structural layers with well‐controlled and uniform mechanical characteristics. Amorphous alloys Mo–N and Mo–Si–N are investigated in this study for the purpose, showing properties superior to polycrystalline metals for microelectromechanical devices and systems applications.

KW - microelectromechanical systems

KW - MEMS

KW - amorphous metal alloys

KW - thin films

KW - molybdenum

KW - nitrogen

KW - silicon

U2 - 10.1111/j.1460-2695.2005.00887.x

DO - 10.1111/j.1460-2695.2005.00887.x

M3 - Article

VL - 28

SP - 743

EP - 749

JO - Fatigue & Fracture of Engineering Materials & Structures

JF - Fatigue & Fracture of Engineering Materials & Structures

SN - 8756-758X

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ER -