Analysis of ALD/CVD thin film conformality using lateral high aspect ratio (LHAR) structures: experimental characteristics and proposed classifications

R. Puurunen, J. Dendooven, V. Cremers, C. Detavernier

Research output: Contribution to conferenceConference articleScientific

Original languageEnglish
Publication statusPublished - 2016
EventAVS 63rd International Symposium & Exhibition - Nashville, United States
Duration: 6 Nov 201611 Nov 2016
Conference number: 63

Conference

ConferenceAVS 63rd International Symposium & Exhibition
CountryUnited States
CityNashville
Period6/11/1611/11/16

Cite this

Puurunen, R., Dendooven, J., Cremers, V., & Detavernier, C. (2016). Analysis of ALD/CVD thin film conformality using lateral high aspect ratio (LHAR) structures: experimental characteristics and proposed classifications. Paper presented at AVS 63rd International Symposium & Exhibition, Nashville, United States.
Puurunen, R. ; Dendooven, J. ; Cremers, V. ; Detavernier, C. / Analysis of ALD/CVD thin film conformality using lateral high aspect ratio (LHAR) structures : experimental characteristics and proposed classifications. Paper presented at AVS 63rd International Symposium & Exhibition, Nashville, United States.
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title = "Analysis of ALD/CVD thin film conformality using lateral high aspect ratio (LHAR) structures: experimental characteristics and proposed classifications",
author = "R. Puurunen and J. Dendooven and V. Cremers and C. Detavernier",
note = "Project code: 102086 ; AVS 63rd International Symposium & Exhibition ; Conference date: 06-11-2016 Through 11-11-2016",
year = "2016",
language = "English",

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Puurunen, R, Dendooven, J, Cremers, V & Detavernier, C 2016, 'Analysis of ALD/CVD thin film conformality using lateral high aspect ratio (LHAR) structures: experimental characteristics and proposed classifications' Paper presented at AVS 63rd International Symposium & Exhibition, Nashville, United States, 6/11/16 - 11/11/16, .

Analysis of ALD/CVD thin film conformality using lateral high aspect ratio (LHAR) structures : experimental characteristics and proposed classifications. / Puurunen, R.; Dendooven, J.; Cremers, V.; Detavernier, C.

2016. Paper presented at AVS 63rd International Symposium & Exhibition, Nashville, United States.

Research output: Contribution to conferenceConference articleScientific

TY - CONF

T1 - Analysis of ALD/CVD thin film conformality using lateral high aspect ratio (LHAR) structures

T2 - experimental characteristics and proposed classifications

AU - Puurunen, R.

AU - Dendooven, J.

AU - Cremers, V.

AU - Detavernier, C.

N1 - Project code: 102086

PY - 2016

Y1 - 2016

M3 - Conference article

ER -

Puurunen R, Dendooven J, Cremers V, Detavernier C. Analysis of ALD/CVD thin film conformality using lateral high aspect ratio (LHAR) structures: experimental characteristics and proposed classifications. 2016. Paper presented at AVS 63rd International Symposium & Exhibition, Nashville, United States.