Analysis of ALD/CVD thin film conformality using lateral high aspect ratio (LHAR) structures: experimental characteristics and proposed classifications

R. Puurunen, J. Dendooven, V. Cremers, C. Detavernier

Research output: Contribution to conferenceConference articleScientific

Original languageEnglish
Publication statusPublished - 2016
EventAVS 63rd International Symposium & Exhibition - Nashville, United States
Duration: 6 Nov 201611 Nov 2016
Conference number: 63

Conference

ConferenceAVS 63rd International Symposium & Exhibition
CountryUnited States
CityNashville
Period6/11/1611/11/16

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