Analysis of ALD/CVD thin film conformality using lateral high aspect ratio (LHAR) structures: experimental characteristics and proposed classifications

R. Puurunen; J. Dendooven; V. Cremers; C. Detavernier

Analysis of ALD/CVD thin film conformality using lateral high aspect ratio (LHAR) structures: experimental characteristics and proposed classifications

R. Puurunen, J. Dendooven, V. Cremers, C. Detavernier

VTT Technical Research Centre of Finland

Ghent University

Research output: Contribution to conference › Conference article › Scientific

Original language	English
Publication status	Published - 2016
Event	AVS 63rd International Symposium & Exhibition - Nashville, United States Duration: 6 Nov 2016 → 11 Nov 2016 Conference number: 63

Conference

Conference	AVS 63rd International Symposium & Exhibition
Country/Territory	United States
City	Nashville
Period	6/11/16 → 11/11/16

Cite this

@conference{acab137944544beca9dea13e2455ed66,

title = "Analysis of ALD/CVD thin film conformality using lateral high aspect ratio (LHAR) structures: experimental characteristics and proposed classifications",

author = "R. Puurunen and J. Dendooven and V. Cremers and C. Detavernier",

note = "Project code: 102086 ; AVS 63rd International Symposium \& Exhibition ; Conference date: 06-11-2016 Through 11-11-2016",

year = "2016",

language = "English",

}

Analysis of ALD/CVD thin film conformality using lateral high aspect ratio (LHAR) structures: experimental characteristics and proposed classifications. / Puurunen, R.; Dendooven, J.; Cremers, V. et al.
2016. Paper presented at AVS 63rd International Symposium & Exhibition, Nashville, Tennessee, United States.

Research output: Contribution to conference › Conference article › Scientific