Analysis of retained deuterium on Be-based films: Ion implantation vs. in-situ loading

Rodrigo Mateus, Corneliu Porosnicu, Cristian Petricǎ Lungu, C. Cruz, Zdravko Siketić, Iva Bogdanović Radović, A. Hakola, Eduardo Alves,

    Research output: Contribution to journalArticleResearchpeer-review

    Abstract

    Pure Be, Be-O and Be-O-C thin coatings were deposited using high-power impulse magnetron sputtering (HiPIMS) with and without incorporation of deuterium. The coatings produced without deuterium were implanted afterwards with 15 keV 2H+ ion beams with a fluence limited to 2 × 1017 ion/cm2 in order to mitigate the damage imposed by ion irradiation and prevent a fast gas release. The as-deposited and as-implanted coatings were analysed by IBA techniques, namely by elastic and Rutherford backscattering spectrometries (EBS and RBS, respectively), nuclear reaction analysis (NRA) and by time-of-flight elastic recoil detection analysis (ToF-ERDA). Despite distinct deuterium depth profiles in the implanted samples, the results show that for the present ion implantation and deposition parameters, similar retained amounts are revealed in the films loaded by ion implantation or during the HiPIMS deposition, assuring ion implantation as a competitive and reliable method for fuel incorporation in thin Be-based films for retention studies in controlled conditions.

    LanguageEnglish
    Pages242-247
    Number of pages6
    JournalNuclear Materials and Energy
    Volume17
    DOIs
    Publication statusPublished - Dec 2018
    MoE publication typeNot Eligible

    Fingerprint

    Deuterium
    Ion implantation
    ion implantation
    deuterium
    coatings
    Coatings
    Magnetron sputtering
    impulses
    magnetron sputtering
    Nuclear reactions
    Rutherford backscattering spectroscopy
    Ion bombardment
    ion irradiation
    nuclear reactions
    Spectrometry
    Ion beams
    backscattering
    fluence
    Gases
    ion beams

    Keywords

    • Beryllium coatings
    • Deuterium
    • HiPIMS
    • Ion implantation

    OKM Publication Types

    • A1 Refereed journal article

    OKM Open Access Status

    • 1 Open Access

    ASJC Scopus subject areas

    • Nuclear and High Energy Physics
    • Materials Science (miscellaneous)
    • Nuclear Energy and Engineering

    Cite this

    @article{08a0b33b76be437d8069b33e9ec04913,
    title = "Analysis of retained deuterium on Be-based films: Ion implantation vs. in-situ loading",
    abstract = "Pure Be, Be-O and Be-O-C thin coatings were deposited using high-power impulse magnetron sputtering (HiPIMS) with and without incorporation of deuterium. The coatings produced without deuterium were implanted afterwards with 15 keV 2H+ ion beams with a fluence limited to 2 × 1017 ion/cm2 in order to mitigate the damage imposed by ion irradiation and prevent a fast gas release. The as-deposited and as-implanted coatings were analysed by IBA techniques, namely by elastic and Rutherford backscattering spectrometries (EBS and RBS, respectively), nuclear reaction analysis (NRA) and by time-of-flight elastic recoil detection analysis (ToF-ERDA). Despite distinct deuterium depth profiles in the implanted samples, the results show that for the present ion implantation and deposition parameters, similar retained amounts are revealed in the films loaded by ion implantation or during the HiPIMS deposition, assuring ion implantation as a competitive and reliable method for fuel incorporation in thin Be-based films for retention studies in controlled conditions.",
    keywords = "Beryllium coatings, Deuterium, HiPIMS, Ion implantation",
    author = "Rodrigo Mateus and Corneliu Porosnicu and Lungu, {Cristian Petricǎ} and C. Cruz and Zdravko Siketić and Radović, {Iva Bogdanović} and A. Hakola and Eduardo Alves",
    year = "2018",
    month = "12",
    doi = "10.1016/j.nme.2018.10.007",
    language = "English",
    volume = "17",
    pages = "242--247",
    journal = "Nuclear Materials and Energy",
    issn = "2352-1791",
    publisher = "Elsevier",

    }

    Analysis of retained deuterium on Be-based films : Ion implantation vs. in-situ loading. /.

    In: Nuclear Materials and Energy, Vol. 17, 12.2018, p. 242-247.

    Research output: Contribution to journalArticleResearchpeer-review

    TY - JOUR

    T1 - Analysis of retained deuterium on Be-based films

    T2 - Nuclear Materials and Energy

    AU - Mateus, Rodrigo

    AU - Porosnicu, Corneliu

    AU - Lungu, Cristian Petricǎ

    AU - Cruz, C.

    AU - Siketić, Zdravko

    AU - Radović, Iva Bogdanović

    AU - Hakola, A.

    AU - Alves, Eduardo

    PY - 2018/12

    Y1 - 2018/12

    N2 - Pure Be, Be-O and Be-O-C thin coatings were deposited using high-power impulse magnetron sputtering (HiPIMS) with and without incorporation of deuterium. The coatings produced without deuterium were implanted afterwards with 15 keV 2H+ ion beams with a fluence limited to 2 × 1017 ion/cm2 in order to mitigate the damage imposed by ion irradiation and prevent a fast gas release. The as-deposited and as-implanted coatings were analysed by IBA techniques, namely by elastic and Rutherford backscattering spectrometries (EBS and RBS, respectively), nuclear reaction analysis (NRA) and by time-of-flight elastic recoil detection analysis (ToF-ERDA). Despite distinct deuterium depth profiles in the implanted samples, the results show that for the present ion implantation and deposition parameters, similar retained amounts are revealed in the films loaded by ion implantation or during the HiPIMS deposition, assuring ion implantation as a competitive and reliable method for fuel incorporation in thin Be-based films for retention studies in controlled conditions.

    AB - Pure Be, Be-O and Be-O-C thin coatings were deposited using high-power impulse magnetron sputtering (HiPIMS) with and without incorporation of deuterium. The coatings produced without deuterium were implanted afterwards with 15 keV 2H+ ion beams with a fluence limited to 2 × 1017 ion/cm2 in order to mitigate the damage imposed by ion irradiation and prevent a fast gas release. The as-deposited and as-implanted coatings were analysed by IBA techniques, namely by elastic and Rutherford backscattering spectrometries (EBS and RBS, respectively), nuclear reaction analysis (NRA) and by time-of-flight elastic recoil detection analysis (ToF-ERDA). Despite distinct deuterium depth profiles in the implanted samples, the results show that for the present ion implantation and deposition parameters, similar retained amounts are revealed in the films loaded by ion implantation or during the HiPIMS deposition, assuring ion implantation as a competitive and reliable method for fuel incorporation in thin Be-based films for retention studies in controlled conditions.

    KW - Beryllium coatings

    KW - Deuterium

    KW - HiPIMS

    KW - Ion implantation

    UR - http://www.scopus.com/inward/record.url?scp=85056714229&partnerID=8YFLogxK

    U2 - 10.1016/j.nme.2018.10.007

    DO - 10.1016/j.nme.2018.10.007

    M3 - Article

    VL - 17

    SP - 242

    EP - 247

    JO - Nuclear Materials and Energy

    JF - Nuclear Materials and Energy

    SN - 2352-1791

    ER -