Angle controlled imprints using step and stamp imprint lithography

Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific

Abstract

Nanoimprint lithography is an ideal method to fabricate various optical devices, because the resist itself can work as a functional element. New light guide designs based on hybrid grating structures can be fabricated using sequential nanoimprint lithography. These structures may contain elements with various shapes, sizes and orientation. Step and Stamp Imprint Lithography (SSIL) is a suitable method to fabricate large scale master with plurality of optical elements. In our system, a stamp with size of few millimeters can be used for patterning large areas up to 200 mm. For example, the method has been used for fabrication of bendable nickel stamps for Roll-to-Roll nanoimprinting and polymer stamps for UV-nanoimprinting.The imprinting machine equipped with rotating head introduces ability to control, in addition to X/Y positioning, also angular orientation of the stamp. The imprinting head can be rotated between -90° and +90° with accuracy of 0.1°. This makes it a suitable tool to fabricate, for example, directed optical structures in large scale, and thereby only few basic elements are needed to create a large entity. The method is effective tool to fabricate large masters, because the design of the master can be changed by programming new X/Y and angular positions of the basic elements. In this work, the angular positioning accuracy was evaluated by imprinting gratings with 250 nm features into thermoplastic polymer by varying the angle by 15° steps. The quality of the imprints was evaluated by optical and AFM microscopy. The theta angle of the gratings was measured by SEM.
Original languageEnglish
Title of host publicationConference Program and Proceedings
Subtitle of host publication9th International Conference NNT: Nanoimprint & Nanoprint Technology
Pages138
Publication statusPublished - 2010
MoE publication typeNot Eligible
Event9th International Conference on Nanoimprint and Nanoprint Technology, NNT 2010 - Öresund, Copenhagen, Denmark
Duration: 13 Oct 201015 Oct 2010
Conference number: 9

Conference

Conference9th International Conference on Nanoimprint and Nanoprint Technology, NNT 2010
Abbreviated titleNNT 2010
CountryDenmark
CityCopenhagen
Period13/10/1015/10/10

Fingerprint

lithography
gratings
positioning
polymers
programming
nickel
atomic force microscopy
microscopy
fabrication
scanning electron microscopy

Keywords

  • Nanoimprinting
  • UV-NIL
  • roll-to-roll

Cite this

Haatainen, T., Mäkelä, T., Ahopelto, J., & Lecarpentier, G. (2010). Angle controlled imprints using step and stamp imprint lithography. In Conference Program and Proceedings: 9th International Conference NNT: Nanoimprint & Nanoprint Technology (pp. 138)
Haatainen, Tomi ; Mäkelä, Tapio ; Ahopelto, Jouni ; Lecarpentier, Gilbert. / Angle controlled imprints using step and stamp imprint lithography. Conference Program and Proceedings: 9th International Conference NNT: Nanoimprint & Nanoprint Technology. 2010. pp. 138
@inbook{7187e64503cf4e6793ddef4bcf9ae07d,
title = "Angle controlled imprints using step and stamp imprint lithography",
abstract = "Nanoimprint lithography is an ideal method to fabricate various optical devices, because the resist itself can work as a functional element. New light guide designs based on hybrid grating structures can be fabricated using sequential nanoimprint lithography. These structures may contain elements with various shapes, sizes and orientation. Step and Stamp Imprint Lithography (SSIL) is a suitable method to fabricate large scale master with plurality of optical elements. In our system, a stamp with size of few millimeters can be used for patterning large areas up to 200 mm. For example, the method has been used for fabrication of bendable nickel stamps for Roll-to-Roll nanoimprinting and polymer stamps for UV-nanoimprinting.The imprinting machine equipped with rotating head introduces ability to control, in addition to X/Y positioning, also angular orientation of the stamp. The imprinting head can be rotated between -90° and +90° with accuracy of 0.1°. This makes it a suitable tool to fabricate, for example, directed optical structures in large scale, and thereby only few basic elements are needed to create a large entity. The method is effective tool to fabricate large masters, because the design of the master can be changed by programming new X/Y and angular positions of the basic elements. In this work, the angular positioning accuracy was evaluated by imprinting gratings with 250 nm features into thermoplastic polymer by varying the angle by 15° steps. The quality of the imprints was evaluated by optical and AFM microscopy. The theta angle of the gratings was measured by SEM.",
keywords = "Nanoimprinting, UV-NIL, roll-to-roll",
author = "Tomi Haatainen and Tapio M{\"a}kel{\"a} and Jouni Ahopelto and Gilbert Lecarpentier",
note = "Project code: 21975",
year = "2010",
language = "English",
pages = "138",
booktitle = "Conference Program and Proceedings",

}

Haatainen, T, Mäkelä, T, Ahopelto, J & Lecarpentier, G 2010, Angle controlled imprints using step and stamp imprint lithography. in Conference Program and Proceedings: 9th International Conference NNT: Nanoimprint & Nanoprint Technology. pp. 138, 9th International Conference on Nanoimprint and Nanoprint Technology, NNT 2010, Copenhagen, Denmark, 13/10/10.

Angle controlled imprints using step and stamp imprint lithography. / Haatainen, Tomi; Mäkelä, Tapio; Ahopelto, Jouni; Lecarpentier, Gilbert.

Conference Program and Proceedings: 9th International Conference NNT: Nanoimprint & Nanoprint Technology. 2010. p. 138.

Research output: Chapter in Book/Report/Conference proceedingConference abstract in proceedingsScientific

TY - CHAP

T1 - Angle controlled imprints using step and stamp imprint lithography

AU - Haatainen, Tomi

AU - Mäkelä, Tapio

AU - Ahopelto, Jouni

AU - Lecarpentier, Gilbert

N1 - Project code: 21975

PY - 2010

Y1 - 2010

N2 - Nanoimprint lithography is an ideal method to fabricate various optical devices, because the resist itself can work as a functional element. New light guide designs based on hybrid grating structures can be fabricated using sequential nanoimprint lithography. These structures may contain elements with various shapes, sizes and orientation. Step and Stamp Imprint Lithography (SSIL) is a suitable method to fabricate large scale master with plurality of optical elements. In our system, a stamp with size of few millimeters can be used for patterning large areas up to 200 mm. For example, the method has been used for fabrication of bendable nickel stamps for Roll-to-Roll nanoimprinting and polymer stamps for UV-nanoimprinting.The imprinting machine equipped with rotating head introduces ability to control, in addition to X/Y positioning, also angular orientation of the stamp. The imprinting head can be rotated between -90° and +90° with accuracy of 0.1°. This makes it a suitable tool to fabricate, for example, directed optical structures in large scale, and thereby only few basic elements are needed to create a large entity. The method is effective tool to fabricate large masters, because the design of the master can be changed by programming new X/Y and angular positions of the basic elements. In this work, the angular positioning accuracy was evaluated by imprinting gratings with 250 nm features into thermoplastic polymer by varying the angle by 15° steps. The quality of the imprints was evaluated by optical and AFM microscopy. The theta angle of the gratings was measured by SEM.

AB - Nanoimprint lithography is an ideal method to fabricate various optical devices, because the resist itself can work as a functional element. New light guide designs based on hybrid grating structures can be fabricated using sequential nanoimprint lithography. These structures may contain elements with various shapes, sizes and orientation. Step and Stamp Imprint Lithography (SSIL) is a suitable method to fabricate large scale master with plurality of optical elements. In our system, a stamp with size of few millimeters can be used for patterning large areas up to 200 mm. For example, the method has been used for fabrication of bendable nickel stamps for Roll-to-Roll nanoimprinting and polymer stamps for UV-nanoimprinting.The imprinting machine equipped with rotating head introduces ability to control, in addition to X/Y positioning, also angular orientation of the stamp. The imprinting head can be rotated between -90° and +90° with accuracy of 0.1°. This makes it a suitable tool to fabricate, for example, directed optical structures in large scale, and thereby only few basic elements are needed to create a large entity. The method is effective tool to fabricate large masters, because the design of the master can be changed by programming new X/Y and angular positions of the basic elements. In this work, the angular positioning accuracy was evaluated by imprinting gratings with 250 nm features into thermoplastic polymer by varying the angle by 15° steps. The quality of the imprints was evaluated by optical and AFM microscopy. The theta angle of the gratings was measured by SEM.

KW - Nanoimprinting

KW - UV-NIL

KW - roll-to-roll

M3 - Conference abstract in proceedings

SP - 138

BT - Conference Program and Proceedings

ER -

Haatainen T, Mäkelä T, Ahopelto J, Lecarpentier G. Angle controlled imprints using step and stamp imprint lithography. In Conference Program and Proceedings: 9th International Conference NNT: Nanoimprint & Nanoprint Technology. 2010. p. 138