Application of atomic force microscopy in pigment and dispersion coating analyses

Kati Rissa (Corresponding author), Toivo Lepistö, Mika Vähä-Nissi, Antti Savolainen

    Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

    7 Citations (Scopus)

    Abstract

    Atomic force microscopy (AFM) is used to characterize the film formation of barrier latices, the effects of wax addition and calendering on dispersion coatings, and latex particle adhesion to inorganic surfaces. The main advantage of this method is the ability to perform measurements at normal atmospheric conditions with a very good resolution. This paper gives a short presentation of the work in the case of pigment and barrier dispersion coatings. Some examples of these studies are presented and discussed. The strong effect of drying temperature and level of wax addition on the surface topography of poly(styrene-butadiene) based dispersion was observed in the present studies. Adhesion of the SB binder to the cleavage surface of mica and the effect of pigment addition to latex were also evaluated.
    Original languageEnglish
    Title of host publicationProceedings of the 1999 TAPPI Advanced Coating Fundamentals Symposium, Toronto, Canada, 1999
    PublisherTAPPI Press
    Pages175-189
    Number of pages15
    ISBN (Print)0898527481
    Publication statusPublished - 1999
    MoE publication typeA4 Article in a conference publication
    Event1999 TAPPI Advanced Coating Fundamentals Symposium - Sheraton Centre Toronto, Toronto, Canada
    Duration: 29 Apr 19991 May 1999

    Conference

    Conference1999 TAPPI Advanced Coating Fundamentals Symposium
    Country/TerritoryCanada
    CityToronto
    Period29/04/991/05/99

    Keywords

    • dispersion coating
    • microscopy

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