A filtered arc discharge process was employed to deposit stainless steel films using an AISI316 cathode. In this procedure, macroparticles and droplets, which are the most serious drawback of arc deposition processes especially in corrosion applications, are mostly filtered out. Films were deposited in vacuum or in the presence of a nitrogen plasma at different partial pressures. Low carbon steel and silicon single crystals were employed as substrates. Rutherford backscattering spectrometry (RBS), nuclear reaction analysis (NRA) and X-ray diffraction (XRD) were used to characterize the films. The corrosion properties were examined using electrochemical polarization measurements. The corrosion current density was clearly lower than that of bulk steel, but higher than that of bulk AISI316. Increasing the film thickness and nitrogen content lowered the corrosion current density.