Atomic and molecular layer deposition for surface modification

Mika Vähä-Nissi (Corresponding Author), Jenni Sievänen, Erkki Salo, Pirjo Heikkilä, Eija Kenttä, Leena-Sisko Johansson, Jorma T. Koskinen, Ali Harlin

    Research output: Contribution to journalArticleScientificpeer-review

    16 Citations (Scopus)


    Atomic and molecular layer deposition (ALD and MLD, respectively) techniques are based on repeated cycles of gas-solid surface reactions. A partial monolayer of atoms or molecules is deposited to the surface during a single deposition cycle, enabling tailored film composition in principle down to molecular resolution on ideal surfaces. Typically ALD/MLD has been used for applications where uniform and pinhole free thin film is a necessity even on 3D surfaces. However, thin - even non-uniform - atomic and molecular deposited layers can also be used to tailor the surface characteristics of different non-ideal substrates. For example, print quality of inkjet printing on polymer films and penetration of water into porous nonwovens can be adjusted with low-temperature deposited metal oxide. In addition, adhesion of extrusion coated biopolymer to inorganic oxides can be improved with a hybrid layer based on lactic acid.
    Original languageEnglish
    Pages (from-to)7-11
    JournalJournal of Solid State Chemistry
    Issue numberJune
    Publication statusPublished - 2014
    MoE publication typeA1 Journal article-refereed


    • adhesion
    • atomic layer deposition
    • hybrid
    • inorganic
    • surface treatment


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