Atomic layer deposited aluminum oxide barrier coatings for packaging materials

Terhi Hirvikorpi, Mika Vähä-Nissi, Tuomas Mustonen, Eero Iiskola, Maarit Karppinen

    Research output: Contribution to journalArticleScientificpeer-review

    125 Citations (Scopus)


    Thin aluminum oxide coatings have been deposited at a low temperature of 80 °C on various uncoated papers, polymer-coated papers and boards and plain polymer films using the atomic layer deposition (ALD) technique. The work demonstrates that such ALD-grown Al2O3 coatings efficiently enhance the gas-diffusion barrier performance of the studied porous and non-porous materials towards oxygen, water vapor and aromas.
    Original languageEnglish
    Pages (from-to)2654-2658
    JournalThin Solid Films
    Issue number10
    Publication statusPublished - 2010
    MoE publication typeA1 Journal article-refereed


    • atomic layer deposition
    • aluminum oxide
    • diffusion barriers
    • biodegradable polymers
    • polymers
    • packaging material


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