Atomic layer deposited aluminum oxide barrier coatings for packaging materials

Terhi Hirvikorpi, Mika Vähä-Nissi, Tuomas Mustonen, Eero Iiskola, Maarit Karppinen

Research output: Contribution to journalArticleScientificpeer-review

88 Citations (Scopus)

Abstract

Thin aluminum oxide coatings have been deposited at a low temperature of 80 °C on various uncoated papers, polymer-coated papers and boards and plain polymer films using the atomic layer deposition (ALD) technique. The work demonstrates that such ALD-grown Al2O3 coatings efficiently enhance the gas-diffusion barrier performance of the studied porous and non-porous materials towards oxygen, water vapor and aromas.
Original languageEnglish
Pages (from-to)2654-2658
JournalThin Solid Films
Volume518
Issue number10
DOIs
Publication statusPublished - 2010
MoE publication typeA1 Journal article-refereed

Fingerprint

Packaging materials
Atomic layer deposition
Aluminum Oxide
atomic layer epitaxy
packaging
aluminum oxides
Aluminum
coatings
Coatings
Oxides
Diffusion barriers
gaseous diffusion
Diffusion in gases
Steam
polymers
porous materials
plains
Polymer films
Water vapor
water vapor

Keywords

  • atomic layer deposition
  • aluminum oxide
  • diffusion barriers
  • biodegradable polymers
  • polymers
  • packaging material

Cite this

Hirvikorpi, Terhi ; Vähä-Nissi, Mika ; Mustonen, Tuomas ; Iiskola, Eero ; Karppinen, Maarit. / Atomic layer deposited aluminum oxide barrier coatings for packaging materials. In: Thin Solid Films. 2010 ; Vol. 518, No. 10. pp. 2654-2658.
@article{93f2bb5efc114c86b1639825535f2a06,
title = "Atomic layer deposited aluminum oxide barrier coatings for packaging materials",
abstract = "Thin aluminum oxide coatings have been deposited at a low temperature of 80 °C on various uncoated papers, polymer-coated papers and boards and plain polymer films using the atomic layer deposition (ALD) technique. The work demonstrates that such ALD-grown Al2O3 coatings efficiently enhance the gas-diffusion barrier performance of the studied porous and non-porous materials towards oxygen, water vapor and aromas.",
keywords = "atomic layer deposition, aluminum oxide, diffusion barriers, biodegradable polymers, polymers, packaging material",
author = "Terhi Hirvikorpi and Mika V{\"a}h{\"a}-Nissi and Tuomas Mustonen and Eero Iiskola and Maarit Karppinen",
note = "Project code: 42240",
year = "2010",
doi = "10.1016/j.tsf.2009.08.025",
language = "English",
volume = "518",
pages = "2654--2658",
journal = "Thin Solid Films",
issn = "0040-6090",
publisher = "Elsevier",
number = "10",

}

Atomic layer deposited aluminum oxide barrier coatings for packaging materials. / Hirvikorpi, Terhi; Vähä-Nissi, Mika; Mustonen, Tuomas; Iiskola, Eero; Karppinen, Maarit.

In: Thin Solid Films, Vol. 518, No. 10, 2010, p. 2654-2658.

Research output: Contribution to journalArticleScientificpeer-review

TY - JOUR

T1 - Atomic layer deposited aluminum oxide barrier coatings for packaging materials

AU - Hirvikorpi, Terhi

AU - Vähä-Nissi, Mika

AU - Mustonen, Tuomas

AU - Iiskola, Eero

AU - Karppinen, Maarit

N1 - Project code: 42240

PY - 2010

Y1 - 2010

N2 - Thin aluminum oxide coatings have been deposited at a low temperature of 80 °C on various uncoated papers, polymer-coated papers and boards and plain polymer films using the atomic layer deposition (ALD) technique. The work demonstrates that such ALD-grown Al2O3 coatings efficiently enhance the gas-diffusion barrier performance of the studied porous and non-porous materials towards oxygen, water vapor and aromas.

AB - Thin aluminum oxide coatings have been deposited at a low temperature of 80 °C on various uncoated papers, polymer-coated papers and boards and plain polymer films using the atomic layer deposition (ALD) technique. The work demonstrates that such ALD-grown Al2O3 coatings efficiently enhance the gas-diffusion barrier performance of the studied porous and non-porous materials towards oxygen, water vapor and aromas.

KW - atomic layer deposition

KW - aluminum oxide

KW - diffusion barriers

KW - biodegradable polymers

KW - polymers

KW - packaging material

U2 - 10.1016/j.tsf.2009.08.025

DO - 10.1016/j.tsf.2009.08.025

M3 - Article

VL - 518

SP - 2654

EP - 2658

JO - Thin Solid Films

JF - Thin Solid Films

SN - 0040-6090

IS - 10

ER -