Atomic layer deposited aluminum oxide barrier coatings for packaging materials

Terhi Hirvikorpi, Mika Vähä-Nissi, Tuomas Mustonen, Eero Iiskola, Maarit Karppinen

Research output: Contribution to journalArticleScientificpeer-review

96 Citations (Scopus)


Thin aluminum oxide coatings have been deposited at a low temperature of 80 °C on various uncoated papers, polymer-coated papers and boards and plain polymer films using the atomic layer deposition (ALD) technique. The work demonstrates that such ALD-grown Al2O3 coatings efficiently enhance the gas-diffusion barrier performance of the studied porous and non-porous materials towards oxygen, water vapor and aromas.
Original languageEnglish
Pages (from-to)2654-2658
JournalThin Solid Films
Issue number10
Publication statusPublished - 2010
MoE publication typeA1 Journal article-refereed


  • atomic layer deposition
  • aluminum oxide
  • diffusion barriers
  • biodegradable polymers
  • polymers
  • packaging material

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