Atomic layer deposited aluminum oxide barrier coatings for packaging materials

Terhi Hirvikorpi; Mika Vähä-Nissi; Tuomas Mustonen; Eero Iiskola; Maarit Karppinen

doi:10.1016/j.tsf.2009.08.025

Atomic layer deposited aluminum oxide barrier coatings for packaging materials

Terhi Hirvikorpi
, Mika Vähä-Nissi
, Tuomas Mustonen
, Eero Iiskola
, Maarit Karppinen

Helsinki University of Technology

Research output: Contribution to journal › Article › Scientific › peer-review

139 Citations (Scopus)

Abstract

Thin aluminum oxide coatings have been deposited at a low temperature of 80 °C on various uncoated papers, polymer-coated papers and boards and plain polymer films using the atomic layer deposition (ALD) technique. The work demonstrates that such ALD-grown Al2O3 coatings efficiently enhance the gas-diffusion barrier performance of the studied porous and non-porous materials towards oxygen, water vapor and aromas.

Original language	English
Pages (from-to)	2654-2658
Journal	Thin Solid Films
Volume	518
Issue number	10
DOIs	https://doi.org/10.1016/j.tsf.2009.08.025
Publication status	Published - 2010
MoE publication type	A1 Journal article-refereed

Keywords

atomic layer deposition
aluminum oxide
diffusion barriers
biodegradable polymers
polymers
packaging material

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10.1016/j.tsf.2009.08.025

Cite this

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title = "Atomic layer deposited aluminum oxide barrier coatings for packaging materials",

abstract = "Thin aluminum oxide coatings have been deposited at a low temperature of 80 °C on various uncoated papers, polymer-coated papers and boards and plain polymer films using the atomic layer deposition (ALD) technique. The work demonstrates that such ALD-grown Al2O3 coatings efficiently enhance the gas-diffusion barrier performance of the studied porous and non-porous materials towards oxygen, water vapor and aromas.",

keywords = "atomic layer deposition, aluminum oxide, diffusion barriers, biodegradable polymers, polymers, packaging material",

author = "Terhi Hirvikorpi and Mika V{\"a}h{\"a}-Nissi and Tuomas Mustonen and Eero Iiskola and Maarit Karppinen",

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T1 - Atomic layer deposited aluminum oxide barrier coatings for packaging materials

AU - Hirvikorpi, Terhi

AU - Vähä-Nissi, Mika

AU - Mustonen, Tuomas

AU - Iiskola, Eero

AU - Karppinen, Maarit

N1 - Project code: 42240

PY - 2010

Y1 - 2010

N2 - Thin aluminum oxide coatings have been deposited at a low temperature of 80 °C on various uncoated papers, polymer-coated papers and boards and plain polymer films using the atomic layer deposition (ALD) technique. The work demonstrates that such ALD-grown Al2O3 coatings efficiently enhance the gas-diffusion barrier performance of the studied porous and non-porous materials towards oxygen, water vapor and aromas.

AB - Thin aluminum oxide coatings have been deposited at a low temperature of 80 °C on various uncoated papers, polymer-coated papers and boards and plain polymer films using the atomic layer deposition (ALD) technique. The work demonstrates that such ALD-grown Al2O3 coatings efficiently enhance the gas-diffusion barrier performance of the studied porous and non-porous materials towards oxygen, water vapor and aromas.

KW - atomic layer deposition

KW - aluminum oxide

KW - diffusion barriers

KW - biodegradable polymers

KW - polymers

KW - packaging material

U2 - 10.1016/j.tsf.2009.08.025

DO - 10.1016/j.tsf.2009.08.025

M3 - Article

SN - 0040-6090

VL - 518

SP - 2654

EP - 2658

JO - Thin Solid Films

JF - Thin Solid Films

IS - 10

ER -

Atomic layer deposited aluminum oxide barrier coatings for packaging materials

Abstract

Keywords

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