Atomic Layer Deposited Nanoscale Coatings for Polymer Films

Mika Vähä-Nissi, Erkki Salo, Jenni Sievänen, Marja Pitkänen, Eija Kenttä, Marjaana Rättö, Matti Putkonen, Ali Harlin

Research output: Contribution to conferenceConference articleScientific

Abstract

Atomic layer deposition (ALD) is a layer-by-layer deposition process based on repeated self-limiting gas-solid reactions by using volatile precursors. It is suited for producing dense and pinhole-free inorganic nanoscale coatings uniform in thickness at relatively low temperatures. The purpose of this presentation is to demonstrate the potential and the challenges of using ALD to create functional coatings for polymer films. ALD is an efficient tool for improving the barrier properties of polymer films. However, adequate barrier properties are only one of the key requirements set for the packaging materials. As far as safety issues are concerned, these coatings, for example, seem not to fall under the European definition of nanotechnology and migration is low enough to meet the requirements set by current European regulations. ALD can also be used to create antimicrobial coatings, and thin oxide coatings can be modified for improved mechanical and surface properties. It is recommended that ALD coatings are protected with an additional polymer layer providing also heat sealability. Although ALD is today carried out in batch mode, the development of roll-to-roll processes will enhance the feasibility of ALD for e.g. packaging materials
Original languageEnglish
Publication statusPublished - 2014
MoE publication typeNot Eligible
Event5th International TAPPI/CETEA Conference on Flexible Packaging - Sao Paulo, Brazil
Duration: 16 Sep 201418 Sep 2014

Conference

Conference5th International TAPPI/CETEA Conference on Flexible Packaging
CountryBrazil
CitySao Paulo
Period16/09/1418/09/14

Fingerprint

atomic layer epitaxy
coatings
polymers
packaging
inorganic coatings
requirements
pinholes
nanotechnology
surface properties
safety
mechanical properties
heat
oxides
gases

Keywords

  • packaging
  • materials
  • atomic layer deposition
  • barriers
  • functional coatings

Cite this

Vähä-Nissi, M., Salo, E., Sievänen, J., Pitkänen, M., Kenttä, E., Rättö, M., ... Harlin, A. (2014). Atomic Layer Deposited Nanoscale Coatings for Polymer Films. Paper presented at 5th International TAPPI/CETEA Conference on Flexible Packaging, Sao Paulo, Brazil.
Vähä-Nissi, Mika ; Salo, Erkki ; Sievänen, Jenni ; Pitkänen, Marja ; Kenttä, Eija ; Rättö, Marjaana ; Putkonen, Matti ; Harlin, Ali. / Atomic Layer Deposited Nanoscale Coatings for Polymer Films. Paper presented at 5th International TAPPI/CETEA Conference on Flexible Packaging, Sao Paulo, Brazil.
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Vähä-Nissi, M, Salo, E, Sievänen, J, Pitkänen, M, Kenttä, E, Rättö, M, Putkonen, M & Harlin, A 2014, 'Atomic Layer Deposited Nanoscale Coatings for Polymer Films' Paper presented at 5th International TAPPI/CETEA Conference on Flexible Packaging, Sao Paulo, Brazil, 16/09/14 - 18/09/14, .

Atomic Layer Deposited Nanoscale Coatings for Polymer Films. / Vähä-Nissi, Mika; Salo, Erkki; Sievänen, Jenni; Pitkänen, Marja; Kenttä, Eija; Rättö, Marjaana; Putkonen, Matti; Harlin, Ali.

2014. Paper presented at 5th International TAPPI/CETEA Conference on Flexible Packaging, Sao Paulo, Brazil.

Research output: Contribution to conferenceConference articleScientific

TY - CONF

T1 - Atomic Layer Deposited Nanoscale Coatings for Polymer Films

AU - Vähä-Nissi, Mika

AU - Salo, Erkki

AU - Sievänen, Jenni

AU - Pitkänen, Marja

AU - Kenttä, Eija

AU - Rättö, Marjaana

AU - Putkonen, Matti

AU - Harlin, Ali

N1 - Full papers in a memory stick

PY - 2014

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N2 - Atomic layer deposition (ALD) is a layer-by-layer deposition process based on repeated self-limiting gas-solid reactions by using volatile precursors. It is suited for producing dense and pinhole-free inorganic nanoscale coatings uniform in thickness at relatively low temperatures. The purpose of this presentation is to demonstrate the potential and the challenges of using ALD to create functional coatings for polymer films. ALD is an efficient tool for improving the barrier properties of polymer films. However, adequate barrier properties are only one of the key requirements set for the packaging materials. As far as safety issues are concerned, these coatings, for example, seem not to fall under the European definition of nanotechnology and migration is low enough to meet the requirements set by current European regulations. ALD can also be used to create antimicrobial coatings, and thin oxide coatings can be modified for improved mechanical and surface properties. It is recommended that ALD coatings are protected with an additional polymer layer providing also heat sealability. Although ALD is today carried out in batch mode, the development of roll-to-roll processes will enhance the feasibility of ALD for e.g. packaging materials

AB - Atomic layer deposition (ALD) is a layer-by-layer deposition process based on repeated self-limiting gas-solid reactions by using volatile precursors. It is suited for producing dense and pinhole-free inorganic nanoscale coatings uniform in thickness at relatively low temperatures. The purpose of this presentation is to demonstrate the potential and the challenges of using ALD to create functional coatings for polymer films. ALD is an efficient tool for improving the barrier properties of polymer films. However, adequate barrier properties are only one of the key requirements set for the packaging materials. As far as safety issues are concerned, these coatings, for example, seem not to fall under the European definition of nanotechnology and migration is low enough to meet the requirements set by current European regulations. ALD can also be used to create antimicrobial coatings, and thin oxide coatings can be modified for improved mechanical and surface properties. It is recommended that ALD coatings are protected with an additional polymer layer providing also heat sealability. Although ALD is today carried out in batch mode, the development of roll-to-roll processes will enhance the feasibility of ALD for e.g. packaging materials

KW - packaging

KW - materials

KW - atomic layer deposition

KW - barriers

KW - functional coatings

M3 - Conference article

ER -

Vähä-Nissi M, Salo E, Sievänen J, Pitkänen M, Kenttä E, Rättö M et al. Atomic Layer Deposited Nanoscale Coatings for Polymer Films. 2014. Paper presented at 5th International TAPPI/CETEA Conference on Flexible Packaging, Sao Paulo, Brazil.