Atomic layer deposited titanium dioxide and its application in resonant waveguide grating

T. Alasaarela (Corresponding Author), T. Saastamoinen, Jussi Hiltunen, A. Säynätjoki, A. Tervonen, P. Stenberg, M. Kuittinen, S. Honkanen

Research output: Contribution to journalArticleScientificpeer-review

49 Citations (Scopus)

Abstract

We demonstrate good optical quality TiO2 thin films grown by atomic layer deposition at 120°C. The optical properties were studied using spectroscopic ellipsometry and prism coupling methods. The refractive index was 2.27, and the slab waveguide propagation loss was less than 1dB/cm at 1.53μm. A high quality resonant waveguide grating was fabricated using a thin TiO2 layer on top of a SiO2 grating.
Original languageEnglish
Pages (from-to)4321-4325
Number of pages5
JournalApplied Optics
Volume49
Issue number22
DOIs
Publication statusPublished - 2010
MoE publication typeA1 Journal article-refereed

Fingerprint

titanium oxides
Titanium dioxide
Waveguides
gratings
waveguides
Spectroscopic ellipsometry
Atomic layer deposition
atomic layer epitaxy
Prisms
prisms
ellipsometry
Refractive index
slabs
Optical properties
refractivity
optical properties
Thin films
propagation
thin films

Cite this

Alasaarela, T., Saastamoinen, T., Hiltunen, J., Säynätjoki, A., Tervonen, A., Stenberg, P., ... Honkanen, S. (2010). Atomic layer deposited titanium dioxide and its application in resonant waveguide grating. Applied Optics, 49(22), 4321-4325. https://doi.org/10.1364/AO.49.004321
Alasaarela, T. ; Saastamoinen, T. ; Hiltunen, Jussi ; Säynätjoki, A. ; Tervonen, A. ; Stenberg, P. ; Kuittinen, M. ; Honkanen, S. / Atomic layer deposited titanium dioxide and its application in resonant waveguide grating. In: Applied Optics. 2010 ; Vol. 49, No. 22. pp. 4321-4325.
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Alasaarela, T, Saastamoinen, T, Hiltunen, J, Säynätjoki, A, Tervonen, A, Stenberg, P, Kuittinen, M & Honkanen, S 2010, 'Atomic layer deposited titanium dioxide and its application in resonant waveguide grating', Applied Optics, vol. 49, no. 22, pp. 4321-4325. https://doi.org/10.1364/AO.49.004321

Atomic layer deposited titanium dioxide and its application in resonant waveguide grating. / Alasaarela, T. (Corresponding Author); Saastamoinen, T.; Hiltunen, Jussi; Säynätjoki, A.; Tervonen, A.; Stenberg, P.; Kuittinen, M.; Honkanen, S.

In: Applied Optics, Vol. 49, No. 22, 2010, p. 4321-4325.

Research output: Contribution to journalArticleScientificpeer-review

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T1 - Atomic layer deposited titanium dioxide and its application in resonant waveguide grating

AU - Alasaarela, T.

AU - Saastamoinen, T.

AU - Hiltunen, Jussi

AU - Säynätjoki, A.

AU - Tervonen, A.

AU - Stenberg, P.

AU - Kuittinen, M.

AU - Honkanen, S.

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AB - We demonstrate good optical quality TiO2 thin films grown by atomic layer deposition at 120°C. The optical properties were studied using spectroscopic ellipsometry and prism coupling methods. The refractive index was 2.27, and the slab waveguide propagation loss was less than 1dB/cm at 1.53μm. A high quality resonant waveguide grating was fabricated using a thin TiO2 layer on top of a SiO2 grating.

U2 - 10.1364/AO.49.004321

DO - 10.1364/AO.49.004321

M3 - Article

VL - 49

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EP - 4325

JO - Applied Optics

JF - Applied Optics

SN - 1559-128X

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Alasaarela T, Saastamoinen T, Hiltunen J, Säynätjoki A, Tervonen A, Stenberg P et al. Atomic layer deposited titanium dioxide and its application in resonant waveguide grating. Applied Optics. 2010;49(22):4321-4325. https://doi.org/10.1364/AO.49.004321