Atomic layer deposited titanium dioxide and its application in resonant waveguide grating

T. Alasaarela; T. Saastamoinen; Jussi Hiltunen; A. Säynätjoki; A. Tervonen; P. Stenberg; M. Kuittinen; S. Honkanen

doi:10.1364/AO.49.004321

Atomic layer deposited titanium dioxide and its application in resonant waveguide grating

T. Alasaarela^*, T. Saastamoinen, Jussi Hiltunen, A. Säynätjoki, A. Tervonen, P. Stenberg, M. Kuittinen, S. Honkanen

^*Corresponding author for this work

Research output: Contribution to journal › Article › Scientific › peer-review

55 Citations (Scopus)

Abstract

We demonstrate good optical quality TiO₂ thin films grown by atomic layer deposition at 120°C. The optical properties were studied using spectroscopic ellipsometry and prism coupling methods. The refractive index was 2.27, and the slab waveguide propagation loss was less than 1dB/cm at 1.53 µm. A high quality resonant waveguide grating was fabricated using a thin TiO₂ layer on top of a SiO₂ grating.

Original language	English
Pages (from-to)	4321-4325
Journal	Applied Optics
Volume	49
Issue number	22
DOIs	https://doi.org/10.1364/AO.49.004321
Publication status	Published - 2010
MoE publication type	A1 Journal article-refereed

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10.1364/AO.49.004321

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title = "Atomic layer deposited titanium dioxide and its application in resonant waveguide grating",

abstract = "We demonstrate good optical quality TiO2 thin films grown by atomic layer deposition at 120°C. The optical properties were studied using spectroscopic ellipsometry and prism coupling methods. The refractive index was 2.27, and the slab waveguide propagation loss was less than 1dB/cm at 1.53 µm. A high quality resonant waveguide grating was fabricated using a thin TiO2 layer on top of a SiO2 grating.",

author = "T. Alasaarela and T. Saastamoinen and Jussi Hiltunen and A. S{\"a}yn{\"a}tjoki and A. Tervonen and P. Stenberg and M. Kuittinen and S. Honkanen",

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T1 - Atomic layer deposited titanium dioxide and its application in resonant waveguide grating

AU - Alasaarela, T.

AU - Saastamoinen, T.

AU - Hiltunen, Jussi

AU - Säynätjoki, A.

AU - Tervonen, A.

AU - Stenberg, P.

AU - Kuittinen, M.

AU - Honkanen, S.

PY - 2010

Y1 - 2010

N2 - We demonstrate good optical quality TiO2 thin films grown by atomic layer deposition at 120°C. The optical properties were studied using spectroscopic ellipsometry and prism coupling methods. The refractive index was 2.27, and the slab waveguide propagation loss was less than 1dB/cm at 1.53 µm. A high quality resonant waveguide grating was fabricated using a thin TiO2 layer on top of a SiO2 grating.

AB - We demonstrate good optical quality TiO2 thin films grown by atomic layer deposition at 120°C. The optical properties were studied using spectroscopic ellipsometry and prism coupling methods. The refractive index was 2.27, and the slab waveguide propagation loss was less than 1dB/cm at 1.53 µm. A high quality resonant waveguide grating was fabricated using a thin TiO2 layer on top of a SiO2 grating.

U2 - 10.1364/AO.49.004321

DO - 10.1364/AO.49.004321

M3 - Article

SN - 1559-128X

VL - 49

SP - 4321

EP - 4325

JO - Applied Optics

JF - Applied Optics

IS - 22

ER -

Atomic layer deposited titanium dioxide and its application in resonant waveguide grating

Abstract

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