Abstract
| Original language | English |
|---|---|
| Pages (from-to) | 4321-4325 |
| Number of pages | 5 |
| Journal | Applied Optics |
| Volume | 49 |
| Issue number | 22 |
| DOIs | |
| Publication status | Published - 2010 |
| MoE publication type | A1 Journal article-refereed |
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Atomic layer deposited titanium dioxide and its application in resonant waveguide grating. / Alasaarela, T. (Corresponding Author); Saastamoinen, T.; Hiltunen, Jussi; Säynätjoki, A.; Tervonen, A.; Stenberg, P.; Kuittinen, M.; Honkanen, S.
In: Applied Optics, Vol. 49, No. 22, 2010, p. 4321-4325.Research output: Contribution to journal › Article › Scientific › peer-review
TY - JOUR
T1 - Atomic layer deposited titanium dioxide and its application in resonant waveguide grating
AU - Alasaarela, T.
AU - Saastamoinen, T.
AU - Hiltunen, Jussi
AU - Säynätjoki, A.
AU - Tervonen, A.
AU - Stenberg, P.
AU - Kuittinen, M.
AU - Honkanen, S.
PY - 2010
Y1 - 2010
N2 - We demonstrate good optical quality TiO2 thin films grown by atomic layer deposition at 120°C. The optical properties were studied using spectroscopic ellipsometry and prism coupling methods. The refractive index was 2.27, and the slab waveguide propagation loss was less than 1dB/cm at 1.53μm. A high quality resonant waveguide grating was fabricated using a thin TiO2 layer on top of a SiO2 grating.
AB - We demonstrate good optical quality TiO2 thin films grown by atomic layer deposition at 120°C. The optical properties were studied using spectroscopic ellipsometry and prism coupling methods. The refractive index was 2.27, and the slab waveguide propagation loss was less than 1dB/cm at 1.53μm. A high quality resonant waveguide grating was fabricated using a thin TiO2 layer on top of a SiO2 grating.
U2 - 10.1364/AO.49.004321
DO - 10.1364/AO.49.004321
M3 - Article
VL - 49
SP - 4321
EP - 4325
JO - Applied Optics
JF - Applied Optics
SN - 1559-128X
IS - 22
ER -