Atomic layer deposited titanium dioxide and its application in resonant waveguide grating

T. Alasaarela; T. Saastamoinen; Jussi Hiltunen; A. Säynätjoki; A. Tervonen; P. Stenberg; M. Kuittinen; S. Honkanen

doi:10.1364/AO.49.004321

Atomic layer deposited titanium dioxide and its application in resonant waveguide grating

T. Alasaarela (Corresponding Author), T. Saastamoinen, Jussi Hiltunen, A. Säynätjoki, A. Tervonen, P. Stenberg, M. Kuittinen, S. Honkanen

BA14 Sensing and integration

Research output: Contribution to journal › Article › Scientific › peer-review

50 Citations (Scopus)

Abstract

We demonstrate good optical quality TiO₂ thin films grown by atomic layer deposition at 120°C. The optical properties were studied using spectroscopic ellipsometry and prism coupling methods. The refractive index was 2.27, and the slab waveguide propagation loss was less than 1dB/cm at 1.53μm. A high quality resonant waveguide grating was fabricated using a thin TiO₂ layer on top of a SiO₂ grating.

Original language	English
Pages (from-to)	4321-4325
Number of pages	5
Journal	Applied Optics
Volume	49
Issue number	22
DOIs	https://doi.org/10.1364/AO.49.004321
Publication status	Published - 2010
MoE publication type	A1 Journal article-refereed

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Alasaarela, T., Saastamoinen, T., Hiltunen, J., Säynätjoki, A., Tervonen, A., Stenberg, P., Kuittinen, M., & Honkanen, S. (2010). Atomic layer deposited titanium dioxide and its application in resonant waveguide grating. Applied Optics, 49(22), 4321-4325. https://doi.org/10.1364/AO.49.004321

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abstract = "We demonstrate good optical quality TiO2 thin films grown by atomic layer deposition at 120°C. The optical properties were studied using spectroscopic ellipsometry and prism coupling methods. The refractive index was 2.27, and the slab waveguide propagation loss was less than 1dB/cm at 1.53μm. A high quality resonant waveguide grating was fabricated using a thin TiO2 layer on top of a SiO2 grating.",

author = "T. Alasaarela and T. Saastamoinen and Jussi Hiltunen and A. S{\"a}yn{\"a}tjoki and A. Tervonen and P. Stenberg and M. Kuittinen and S. Honkanen",

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Atomic layer deposited titanium dioxide and its application in resonant waveguide grating. / Alasaarela, T. (Corresponding Author); Saastamoinen, T.; Hiltunen, Jussi; Säynätjoki, A.; Tervonen, A.; Stenberg, P.; Kuittinen, M.; Honkanen, S.

In: Applied Optics, Vol. 49, No. 22, 2010, p. 4321-4325.

Research output: Contribution to journal › Article › Scientific › peer-review

TY - JOUR

T1 - Atomic layer deposited titanium dioxide and its application in resonant waveguide grating

AU - Alasaarela, T.

AU - Saastamoinen, T.

AU - Hiltunen, Jussi

AU - Säynätjoki, A.

AU - Tervonen, A.

AU - Stenberg, P.

AU - Kuittinen, M.

AU - Honkanen, S.

PY - 2010

Y1 - 2010

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AB - We demonstrate good optical quality TiO2 thin films grown by atomic layer deposition at 120°C. The optical properties were studied using spectroscopic ellipsometry and prism coupling methods. The refractive index was 2.27, and the slab waveguide propagation loss was less than 1dB/cm at 1.53μm. A high quality resonant waveguide grating was fabricated using a thin TiO2 layer on top of a SiO2 grating.

U2 - 10.1364/AO.49.004321

DO - 10.1364/AO.49.004321

M3 - Article

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EP - 4325

JO - Applied Optics

JF - Applied Optics

SN - 1559-128X

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