Atomic layer deposited titanium dioxide and its application in resonant waveguide grating

T. Alasaarela (Corresponding Author), T. Saastamoinen, Jussi Hiltunen, A. Säynätjoki, A. Tervonen, P. Stenberg, M. Kuittinen, S. Honkanen

    Research output: Contribution to journalArticleScientificpeer-review

    52 Citations (Scopus)

    Abstract

    We demonstrate good optical quality TiO2 thin films grown by atomic layer deposition at 120°C. The optical properties were studied using spectroscopic ellipsometry and prism coupling methods. The refractive index was 2.27, and the slab waveguide propagation loss was less than 1dB/cm at 1.53μm. A high quality resonant waveguide grating was fabricated using a thin TiO2 layer on top of a SiO2 grating.
    Original languageEnglish
    Pages (from-to)4321-4325
    Number of pages5
    JournalApplied Optics
    Volume49
    Issue number22
    DOIs
    Publication statusPublished - 2010
    MoE publication typeA1 Journal article-refereed

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