Atomic layer deposited titanium dioxide and its application in resonant waveguide grating

T. Alasaarela (Corresponding Author), T. Saastamoinen, Jussi Hiltunen, A. Säynätjoki, A. Tervonen, P. Stenberg, M. Kuittinen, S. Honkanen

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Abstract

We demonstrate good optical quality TiO2 thin films grown by atomic layer deposition at 120°C. The optical properties were studied using spectroscopic ellipsometry and prism coupling methods. The refractive index was 2.27, and the slab waveguide propagation loss was less than 1dB/cm at 1.53μm. A high quality resonant waveguide grating was fabricated using a thin TiO2 layer on top of a SiO2 grating.
Original languageEnglish
Pages (from-to)4321-4325
Number of pages5
JournalApplied Optics
Volume49
Issue number22
DOIs
Publication statusPublished - 2010
MoE publication typeA1 Journal article-refereed

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    Alasaarela, T., Saastamoinen, T., Hiltunen, J., Säynätjoki, A., Tervonen, A., Stenberg, P., Kuittinen, M., & Honkanen, S. (2010). Atomic layer deposited titanium dioxide and its application in resonant waveguide grating. Applied Optics, 49(22), 4321-4325. https://doi.org/10.1364/AO.49.004321