Atomic layer deposited titanium dioxide and its application in resonant waveguide grating

T. Alasaarela*, T. Saastamoinen, Jussi Hiltunen, A. Säynätjoki, A. Tervonen, P. Stenberg, M. Kuittinen, S. Honkanen

*Corresponding author for this work

    Research output: Contribution to journalArticleScientificpeer-review

    55 Citations (Scopus)

    Abstract

    We demonstrate good optical quality TiO2 thin films grown by atomic layer deposition at 120°C. The optical properties were studied using spectroscopic ellipsometry and prism coupling methods. The refractive index was 2.27, and the slab waveguide propagation loss was less than 1dB/cm at 1.53 µm. A high quality resonant waveguide grating was fabricated using a thin TiO2 layer on top of a SiO2 grating.
    Original languageEnglish
    Pages (from-to)4321-4325
    JournalApplied Optics
    Volume49
    Issue number22
    DOIs
    Publication statusPublished - 2010
    MoE publication typeA1 Journal article-refereed

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