Atomic layer deposition in MEMS technology

Riikka Puurunen, Hannu Kattelus, Tuomo Suntola

Research output: Chapter in Book/Report/Conference proceedingChapter or book articleScientificpeer-review

18 Citations (Scopus)
Original languageEnglish
Title of host publicationHandbook of Silicon Based MEMS Materials and Technologies
EditorsMarkku Tilli, Mervi Paulasto-Krockel, Teruaki Matooka, Veli-Matti Airaksinen, Sami Franssila, Veikko Lindroos, Ari Lehto
Place of PublicationBoston, USA; Oxford, UK
PublisherElsevier
Chapter26
Pages433-446
ISBN (Electronic)978-081-551-988-1, 978-008-094-772-3
ISBN (Print)978-0-815-51594-4
Publication statusPublished - 2010
MoE publication typeA3 Part of a book or another research book

Cite this

Puurunen, R., Kattelus, H., & Suntola, T. (2010). Atomic layer deposition in MEMS technology. In M. Tilli, M. Paulasto-Krockel, T. Matooka, V-M. Airaksinen, S. Franssila, V. Lindroos, & A. Lehto (Eds.), Handbook of Silicon Based MEMS Materials and Technologies (pp. 433-446). Boston, USA; Oxford, UK: Elsevier.
Puurunen, Riikka ; Kattelus, Hannu ; Suntola, Tuomo. / Atomic layer deposition in MEMS technology. Handbook of Silicon Based MEMS Materials and Technologies. editor / Markku Tilli ; Mervi Paulasto-Krockel ; Teruaki Matooka ; Veli-Matti Airaksinen ; Sami Franssila ; Veikko Lindroos ; Ari Lehto. Boston, USA; Oxford, UK : Elsevier, 2010. pp. 433-446
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Puurunen, R, Kattelus, H & Suntola, T 2010, Atomic layer deposition in MEMS technology. in M Tilli, M Paulasto-Krockel, T Matooka, V-M Airaksinen, S Franssila, V Lindroos & A Lehto (eds), Handbook of Silicon Based MEMS Materials and Technologies. Elsevier, Boston, USA; Oxford, UK, pp. 433-446.

Atomic layer deposition in MEMS technology. / Puurunen, Riikka; Kattelus, Hannu; Suntola, Tuomo.

Handbook of Silicon Based MEMS Materials and Technologies. ed. / Markku Tilli; Mervi Paulasto-Krockel; Teruaki Matooka; Veli-Matti Airaksinen; Sami Franssila; Veikko Lindroos; Ari Lehto. Boston, USA; Oxford, UK : Elsevier, 2010. p. 433-446.

Research output: Chapter in Book/Report/Conference proceedingChapter or book articleScientificpeer-review

TY - CHAP

T1 - Atomic layer deposition in MEMS technology

AU - Puurunen, Riikka

AU - Kattelus, Hannu

AU - Suntola, Tuomo

PY - 2010

Y1 - 2010

M3 - Chapter or book article

SN - 978-0-815-51594-4

SP - 433

EP - 446

BT - Handbook of Silicon Based MEMS Materials and Technologies

A2 - Tilli, Markku

A2 - Paulasto-Krockel, Mervi

A2 - Matooka, Teruaki

A2 - Airaksinen, Veli-Matti

A2 - Franssila, Sami

A2 - Lindroos, Veikko

A2 - Lehto, Ari

PB - Elsevier

CY - Boston, USA; Oxford, UK

ER -

Puurunen R, Kattelus H, Suntola T. Atomic layer deposition in MEMS technology. In Tilli M, Paulasto-Krockel M, Matooka T, Airaksinen V-M, Franssila S, Lindroos V, Lehto A, editors, Handbook of Silicon Based MEMS Materials and Technologies. Boston, USA; Oxford, UK: Elsevier. 2010. p. 433-446