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Atomic Layer Deposition of PbS Thin Films at Low Temperatures
Georgi Popov
*
, Goran Bačić
, Miika Mattinen
, Toni Manner
,
Hannu Lindström
, Heli Seppänen
, Sami Suihkonen
, Marko Vehkamäki
, Marianna Kemell
, Pasi Jalkanen
, Kenichiro Mizohata
, Jyrki Räisänen
, Markku Leskelä
, Hanna Maarit Koivula
, Seán T. Barry
, Mikko Ritala
*
*
Corresponding author for this work
BA6301 Optical measurements
University of Helsinki
Carleton University
Aalto University
Research output
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Contribution to journal
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Article
›
Scientific
›
peer-review
31
Citations (Scopus)
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INIS
layers
100%
thin films
100%
deposition
100%
lead sulfides
100%
oxides
27%
halides
27%
perovskites
27%
precursor
18%
devices
9%
stability
9%
metals
9%
films
9%
air
9%
volatility
9%
perovskite
9%
mobility
9%
decomposition
9%
amides
9%
Keyphrases
Low Temperature
100%
Atomic Layer Deposition
100%
PbS Thin Films
100%
Halide Perovskites
33%
Low Deposition Temperature
22%
Oxides
11%
Functional Layer
11%
P-type
11%
Metal Oxide
11%
Ambient Air
11%
Passivation Layer
11%
Perovskite
11%
Tert
11%
Lead Sulfide
11%
Conductivity Type
11%
Perovskite CH3NH3PbI3
11%
Bis(trimethylsilyl)amide
11%
Diamide
11%
Encapsulation Layer
11%
Lead Precursors
11%
Non-oxide
11%
Material Science
Halide
100%
Thin Films
100%
Oxide Compound
66%
Metal Oxide
33%
Film
33%
Chemistry
Atomic Layer Epitaxy
100%
Halide
33%
Deposition Process
22%
Sulfide
11%
Carboxamide
11%
Metal Oxide
11%
stability
11%
Chemical Engineering
Atomic Layer Deposition
100%
Perovskites
44%
Film
22%
Amide
11%