Atomic layer deposition of tin dioxide sensing film in microhotplate gas sensors

Antti J. Niskanen; Aapo Varpula; Mikko Utriainen; Gomathi Natarajan; David C. Cameron; Sergey Novikov; Veli-Matti Airaksinen; Juha Sinkkonen; Sami Franssila

doi:10.1016/j.snb.2010.05.018

Atomic layer deposition of tin dioxide sensing film in microhotplate gas sensors

Antti J. Niskanen^* (Corresponding Author), Aapo Varpula, Mikko Utriainen, Gomathi Natarajan, David C. Cameron, Sergey Novikov, Veli-Matti Airaksinen, Juha Sinkkonen, Sami Franssila

^*Corresponding author for this work

Not published at VTT

Research output: Contribution to journal › Article › Scientific › peer-review

30 Citations (Scopus)

Abstract

We report the use of atomic layer deposition (ALD) to produce the gas-sensitive tin dioxide film in a microhotplate gas sensor. The performance of the device was demonstrated using ethanol, acetone and acrylonitrile as model analytes. Fast response times and low drift rates of the output signal were measured, indicating a structurally stable tin dioxide film and reflecting the capabilities of ALD in gas sensor applications. Fabrication of the microhotplate using tungsten metallization and plasma deposited silicon dioxide dielectrics is also detailed.

Original language	English
Pages (from-to)	227-232
Journal	Sensors and Actuators B: Chemical
Volume	148
Issue number	1
DOIs	https://doi.org/10.1016/j.snb.2010.05.018
Publication status	Published - 30 Jun 2010
MoE publication type	A1 Journal article-refereed

Keywords

Atomic layer deposition
Metal-oxide gas sensor
Microhotplate gas sensor
Tin dioxide

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10.1016/j.snb.2010.05.018

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title = "Atomic layer deposition of tin dioxide sensing film in microhotplate gas sensors",

abstract = "We report the use of atomic layer deposition (ALD) to produce the gas-sensitive tin dioxide film in a microhotplate gas sensor. The performance of the device was demonstrated using ethanol, acetone and acrylonitrile as model analytes. Fast response times and low drift rates of the output signal were measured, indicating a structurally stable tin dioxide film and reflecting the capabilities of ALD in gas sensor applications. Fabrication of the microhotplate using tungsten metallization and plasma deposited silicon dioxide dielectrics is also detailed.",

keywords = "Atomic layer deposition, Metal-oxide gas sensor, Microhotplate gas sensor, Tin dioxide",

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T1 - Atomic layer deposition of tin dioxide sensing film in microhotplate gas sensors

AU - Niskanen, Antti J.

AU - Varpula, Aapo

AU - Utriainen, Mikko

AU - Natarajan, Gomathi

AU - Cameron, David C.

AU - Novikov, Sergey

AU - Airaksinen, Veli-Matti

AU - Sinkkonen, Juha

AU - Franssila, Sami

PY - 2010/6/30

Y1 - 2010/6/30

N2 - We report the use of atomic layer deposition (ALD) to produce the gas-sensitive tin dioxide film in a microhotplate gas sensor. The performance of the device was demonstrated using ethanol, acetone and acrylonitrile as model analytes. Fast response times and low drift rates of the output signal were measured, indicating a structurally stable tin dioxide film and reflecting the capabilities of ALD in gas sensor applications. Fabrication of the microhotplate using tungsten metallization and plasma deposited silicon dioxide dielectrics is also detailed.

AB - We report the use of atomic layer deposition (ALD) to produce the gas-sensitive tin dioxide film in a microhotplate gas sensor. The performance of the device was demonstrated using ethanol, acetone and acrylonitrile as model analytes. Fast response times and low drift rates of the output signal were measured, indicating a structurally stable tin dioxide film and reflecting the capabilities of ALD in gas sensor applications. Fabrication of the microhotplate using tungsten metallization and plasma deposited silicon dioxide dielectrics is also detailed.

KW - Atomic layer deposition

KW - Metal-oxide gas sensor

KW - Microhotplate gas sensor

KW - Tin dioxide

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DO - 10.1016/j.snb.2010.05.018

M3 - Article

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SN - 0925-4005

VL - 148

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EP - 232

JO - Sensors and Actuators B: Chemical

JF - Sensors and Actuators B: Chemical

IS - 1

ER -

Atomic layer deposition of tin dioxide sensing film in microhotplate gas sensors

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Keywords

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