Atomic layer deposition of tin dioxide sensing film in microhotplate gas sensors

Antti J. Niskanen; Aapo Varpula; Mikko Utriainen; Gomathi Natarajan; David C. Cameron; Sergey Novikov; Veli Matti Airaksinen; Juha Sinkkonen; Sami Franssila

doi:10.1016/j.snb.2010.05.018

Atomic layer deposition of tin dioxide sensing film in microhotplate gas sensors

Antti J. Niskanen (Corresponding Author), Aapo Varpula, Mikko Utriainen, Gomathi Natarajan, David C. Cameron, Sergey Novikov, Veli Matti Airaksinen, Juha Sinkkonen, Sami Franssila

Not published at VTT

Research output: Contribution to journal › Article › Scientific › peer-review

20 Citations (Scopus)

Abstract

We report the use of atomic layer deposition (ALD) to produce the gas-sensitive tin dioxide film in a microhotplate gas sensor. The performance of the device was demonstrated using ethanol, acetone and acrylonitrile as model analytes. Fast response times and low drift rates of the output signal were measured, indicating a structurally stable tin dioxide film and reflecting the capabilities of ALD in gas sensor applications. Fabrication of the microhotplate using tungsten metallization and plasma deposited silicon dioxide dielectrics is also detailed.

Original language	English
Pages (from-to)	227-232
Journal	Sensors and Actuators, B: Chemical
Volume	148
Issue number	1
DOIs	https://doi.org/10.1016/j.snb.2010.05.018
Publication status	Published - 30 Jun 2010
MoE publication type	A1 Journal article-refereed

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Keywords

Atomic layer deposition
Metal-oxide gas sensor
Microhotplate gas sensor
Tin dioxide

Cite this

Niskanen, A. J., Varpula, A., Utriainen, M., Natarajan, G., Cameron, D. C., Novikov, S., Airaksinen, V. M., Sinkkonen, J., & Franssila, S. (2010). Atomic layer deposition of tin dioxide sensing film in microhotplate gas sensors. Sensors and Actuators, B: Chemical, 148(1), 227-232. https://doi.org/10.1016/j.snb.2010.05.018

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abstract = "We report the use of atomic layer deposition (ALD) to produce the gas-sensitive tin dioxide film in a microhotplate gas sensor. The performance of the device was demonstrated using ethanol, acetone and acrylonitrile as model analytes. Fast response times and low drift rates of the output signal were measured, indicating a structurally stable tin dioxide film and reflecting the capabilities of ALD in gas sensor applications. Fabrication of the microhotplate using tungsten metallization and plasma deposited silicon dioxide dielectrics is also detailed.",

keywords = "Atomic layer deposition, Metal-oxide gas sensor, Microhotplate gas sensor, Tin dioxide",

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Atomic layer deposition of tin dioxide sensing film in microhotplate gas sensors. / Niskanen, Antti J. (Corresponding Author); Varpula, Aapo ; Utriainen, Mikko; Natarajan, Gomathi; Cameron, David C.; Novikov, Sergey; Airaksinen, Veli Matti; Sinkkonen, Juha; Franssila, Sami.

In: Sensors and Actuators, B: Chemical, Vol. 148, No. 1, 30.06.2010, p. 227-232.

Research output: Contribution to journal › Article › Scientific › peer-review

TY - JOUR

T1 - Atomic layer deposition of tin dioxide sensing film in microhotplate gas sensors

AU - Niskanen, Antti J.

AU - Varpula, Aapo

AU - Utriainen, Mikko

AU - Natarajan, Gomathi

AU - Cameron, David C.

AU - Novikov, Sergey

AU - Airaksinen, Veli Matti

AU - Sinkkonen, Juha

AU - Franssila, Sami

PY - 2010/6/30

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AB - We report the use of atomic layer deposition (ALD) to produce the gas-sensitive tin dioxide film in a microhotplate gas sensor. The performance of the device was demonstrated using ethanol, acetone and acrylonitrile as model analytes. Fast response times and low drift rates of the output signal were measured, indicating a structurally stable tin dioxide film and reflecting the capabilities of ALD in gas sensor applications. Fabrication of the microhotplate using tungsten metallization and plasma deposited silicon dioxide dielectrics is also detailed.

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KW - Metal-oxide gas sensor

KW - Microhotplate gas sensor

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Access to Document

10.1016/j.snb.2010.05.018

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