Atomic layer deposition of titanium nitride layer on porous silicon supercapacitor electrodes

Kestutis Grigoras, J. Keskinen, Elina Yli-Rantala, S. Laakso, H. Välimäki, P. Kauranen, Jouni Ahopelto, Mika Prunnila

Research output: Contribution to conferenceConference PosterScientificpeer-review

Abstract

Atomic layer deposition of thin TiN layer inside the porous silicon electrodes improves conductivity and passivates surface of porous silicon. This improves performance of porous silicon based supercapacitors.
Original languageEnglish
Publication statusPublished - 2014
Event14th International Conference on Atomic Layer Deposition, ALD 2014 - Kyoto, Japan
Duration: 15 Jun 201418 Jun 2014
Conference number: 14

Conference

Conference14th International Conference on Atomic Layer Deposition, ALD 2014
Abbreviated titleALD 2014
CountryJapan
CityKyoto
Period15/06/1418/06/14

Fingerprint

titanium nitrides
electrochemical capacitors
atomic layer epitaxy
porous silicon
electrodes
conductivity

Keywords

  • porous silicon
  • ALD
  • supercapacitor

Cite this

Grigoras, K., Keskinen, J., Yli-Rantala, E., Laakso, S., Välimäki, H., Kauranen, P., ... Prunnila, M. (2014). Atomic layer deposition of titanium nitride layer on porous silicon supercapacitor electrodes. Poster session presented at 14th International Conference on Atomic Layer Deposition, ALD 2014, Kyoto, Japan.
Grigoras, Kestutis ; Keskinen, J. ; Yli-Rantala, Elina ; Laakso, S. ; Välimäki, H. ; Kauranen, P. ; Ahopelto, Jouni ; Prunnila, Mika. / Atomic layer deposition of titanium nitride layer on porous silicon supercapacitor electrodes. Poster session presented at 14th International Conference on Atomic Layer Deposition, ALD 2014, Kyoto, Japan.
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title = "Atomic layer deposition of titanium nitride layer on porous silicon supercapacitor electrodes",
abstract = "Atomic layer deposition of thin TiN layer inside the porous silicon electrodes improves conductivity and passivates surface of porous silicon. This improves performance of porous silicon based supercapacitors.",
keywords = "porous silicon, ALD, supercapacitor",
author = "Kestutis Grigoras and J. Keskinen and Elina Yli-Rantala and S. Laakso and H. V{\"a}lim{\"a}ki and P. Kauranen and Jouni Ahopelto and Mika Prunnila",
note = "Project code: 73742; 14th International Conference on Atomic Layer Deposition, ALD 2014, ALD 2014 ; Conference date: 15-06-2014 Through 18-06-2014",
year = "2014",
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Grigoras, K, Keskinen, J, Yli-Rantala, E, Laakso, S, Välimäki, H, Kauranen, P, Ahopelto, J & Prunnila, M 2014, 'Atomic layer deposition of titanium nitride layer on porous silicon supercapacitor electrodes' 14th International Conference on Atomic Layer Deposition, ALD 2014, Kyoto, Japan, 15/06/14 - 18/06/14, .

Atomic layer deposition of titanium nitride layer on porous silicon supercapacitor electrodes. / Grigoras, Kestutis; Keskinen, J.; Yli-Rantala, Elina; Laakso, S.; Välimäki, H.; Kauranen, P.; Ahopelto, Jouni; Prunnila, Mika.

2014. Poster session presented at 14th International Conference on Atomic Layer Deposition, ALD 2014, Kyoto, Japan.

Research output: Contribution to conferenceConference PosterScientificpeer-review

TY - CONF

T1 - Atomic layer deposition of titanium nitride layer on porous silicon supercapacitor electrodes

AU - Grigoras, Kestutis

AU - Keskinen, J.

AU - Yli-Rantala, Elina

AU - Laakso, S.

AU - Välimäki, H.

AU - Kauranen, P.

AU - Ahopelto, Jouni

AU - Prunnila, Mika

N1 - Project code: 73742

PY - 2014

Y1 - 2014

N2 - Atomic layer deposition of thin TiN layer inside the porous silicon electrodes improves conductivity and passivates surface of porous silicon. This improves performance of porous silicon based supercapacitors.

AB - Atomic layer deposition of thin TiN layer inside the porous silicon electrodes improves conductivity and passivates surface of porous silicon. This improves performance of porous silicon based supercapacitors.

KW - porous silicon

KW - ALD

KW - supercapacitor

M3 - Conference Poster

ER -

Grigoras K, Keskinen J, Yli-Rantala E, Laakso S, Välimäki H, Kauranen P et al. Atomic layer deposition of titanium nitride layer on porous silicon supercapacitor electrodes. 2014. Poster session presented at 14th International Conference on Atomic Layer Deposition, ALD 2014, Kyoto, Japan.