Barrier properties of plastic films coated with an Al2O3 layer by roll-to-toll atomic layer deposition

T. Hirvikorpi, R. Laine, Mika Vähä-Nissi, V. Kilpi, Erkki Salo, W.-M. Lia, S Lindfors, Jari Vartiainen, Eija Kenttä, Juha Nikkola, Ali Harlin, J. Kostamo

Research output: Contribution to journalArticleScientificpeer-review

32 Citations (Scopus)

Abstract

Thin (30-40 nm) and highly uniform Al2O3 coatings have been deposited at relatively low temperature of 100 °C onto various polymeric materials employing the atomic layer deposition (ALD) technique, both batch and roll-to-roll (R2R) mode. The applications for ALD have long been limited those feasible for batch processing. The work demonstrates that R2R ALD can deposit thin films with properties that are comparable to the film properties fabricated by in batch. This accelerates considerably the commercialization of many products, such as flexible, printed electronics, organic light-emitting diode lighting, third generation thin film photovoltaic devices, high energy density thin film batteries, smart textiles, organic sensors, organic/recyclable packaging materials, and flexible displays, to name a few.
Original languageEnglish
Pages (from-to)164 - 169
JournalThin Solid Films
Volume550
DOIs
Publication statusPublished - 2014
MoE publication typeA1 Journal article-refereed

Fingerprint

Plastic films
polymeric films
Atomic layer deposition
atomic layer epitaxy
Thin films
thin films
batch processing
Flexible displays
Packaging materials
commercialization
textiles
Organic light emitting diodes (OLED)
packaging
illuminating
electric batteries
Electronic equipment
light emitting diodes
Deposits
flux density
Lighting

Keywords

  • atomic layer deposition
  • barrier
  • roll-to-roll
  • flexible material
  • aluminum oxide
  • polymer

Cite this

Hirvikorpi, T. ; Laine, R. ; Vähä-Nissi, Mika ; Kilpi, V. ; Salo, Erkki ; Lia, W.-M. ; Lindfors, S ; Vartiainen, Jari ; Kenttä, Eija ; Nikkola, Juha ; Harlin, Ali ; Kostamo, J. / Barrier properties of plastic films coated with an Al2O3 layer by roll-to-toll atomic layer deposition. In: Thin Solid Films. 2014 ; Vol. 550. pp. 164 - 169.
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abstract = "Thin (30-40 nm) and highly uniform Al2O3 coatings have been deposited at relatively low temperature of 100 °C onto various polymeric materials employing the atomic layer deposition (ALD) technique, both batch and roll-to-roll (R2R) mode. The applications for ALD have long been limited those feasible for batch processing. The work demonstrates that R2R ALD can deposit thin films with properties that are comparable to the film properties fabricated by in batch. This accelerates considerably the commercialization of many products, such as flexible, printed electronics, organic light-emitting diode lighting, third generation thin film photovoltaic devices, high energy density thin film batteries, smart textiles, organic sensors, organic/recyclable packaging materials, and flexible displays, to name a few.",
keywords = "atomic layer deposition, barrier, roll-to-roll, flexible material, aluminum oxide, polymer",
author = "T. Hirvikorpi and R. Laine and Mika V{\"a}h{\"a}-Nissi and V. Kilpi and Erkki Salo and W.-M. Lia and S Lindfors and Jari Vartiainen and Eija Kentt{\"a} and Juha Nikkola and Ali Harlin and J. Kostamo",
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Hirvikorpi, T, Laine, R, Vähä-Nissi, M, Kilpi, V, Salo, E, Lia, W-M, Lindfors, S, Vartiainen, J, Kenttä, E, Nikkola, J, Harlin, A & Kostamo, J 2014, 'Barrier properties of plastic films coated with an Al2O3 layer by roll-to-toll atomic layer deposition', Thin Solid Films, vol. 550, pp. 164 - 169. https://doi.org/10.1016/j.tsf.2013.10.148

Barrier properties of plastic films coated with an Al2O3 layer by roll-to-toll atomic layer deposition. / Hirvikorpi, T.; Laine, R.; Vähä-Nissi, Mika; Kilpi, V.; Salo, Erkki; Lia, W.-M.; Lindfors, S; Vartiainen, Jari; Kenttä, Eija; Nikkola, Juha; Harlin, Ali; Kostamo, J.

In: Thin Solid Films, Vol. 550, 2014, p. 164 - 169.

Research output: Contribution to journalArticleScientificpeer-review

TY - JOUR

T1 - Barrier properties of plastic films coated with an Al2O3 layer by roll-to-toll atomic layer deposition

AU - Hirvikorpi, T.

AU - Laine, R.

AU - Vähä-Nissi, Mika

AU - Kilpi, V.

AU - Salo, Erkki

AU - Lia, W.-M.

AU - Lindfors, S

AU - Vartiainen, Jari

AU - Kenttä, Eija

AU - Nikkola, Juha

AU - Harlin, Ali

AU - Kostamo, J.

PY - 2014

Y1 - 2014

N2 - Thin (30-40 nm) and highly uniform Al2O3 coatings have been deposited at relatively low temperature of 100 °C onto various polymeric materials employing the atomic layer deposition (ALD) technique, both batch and roll-to-roll (R2R) mode. The applications for ALD have long been limited those feasible for batch processing. The work demonstrates that R2R ALD can deposit thin films with properties that are comparable to the film properties fabricated by in batch. This accelerates considerably the commercialization of many products, such as flexible, printed electronics, organic light-emitting diode lighting, third generation thin film photovoltaic devices, high energy density thin film batteries, smart textiles, organic sensors, organic/recyclable packaging materials, and flexible displays, to name a few.

AB - Thin (30-40 nm) and highly uniform Al2O3 coatings have been deposited at relatively low temperature of 100 °C onto various polymeric materials employing the atomic layer deposition (ALD) technique, both batch and roll-to-roll (R2R) mode. The applications for ALD have long been limited those feasible for batch processing. The work demonstrates that R2R ALD can deposit thin films with properties that are comparable to the film properties fabricated by in batch. This accelerates considerably the commercialization of many products, such as flexible, printed electronics, organic light-emitting diode lighting, third generation thin film photovoltaic devices, high energy density thin film batteries, smart textiles, organic sensors, organic/recyclable packaging materials, and flexible displays, to name a few.

KW - atomic layer deposition

KW - barrier

KW - roll-to-roll

KW - flexible material

KW - aluminum oxide

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DO - 10.1016/j.tsf.2013.10.148

M3 - Article

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