Barrier properties of plastic films coated with an Al2O3 layer by roll-to-toll atomic layer deposition

T. Hirvikorpi; R. Laine; Mika Vähä-Nissi; V. Kilpi; Erkki Salo; W.-M. Lia; S Lindfors; Jari Vartiainen; Eija Kenttä; Juha Nikkola; Ali Harlin; J. Kostamo

doi:10.1016/j.tsf.2013.10.148

Barrier properties of plastic films coated with an Al2O3 layer by roll-to-toll atomic layer deposition

T. Hirvikorpi, R. Laine, Mika Vähä-Nissi, V. Kilpi, Erkki Salo, W.-M. Lia, S Lindfors, Jari Vartiainen, Eija Kenttä, Juha Nikkola, Ali Harlin, J. Kostamo

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Research output: Contribution to journal › Article › Scientific › peer-review

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Abstract

Thin (30-40 nm) and highly uniform Al2O3 coatings have been deposited at relatively low temperature of 100 °C onto various polymeric materials employing the atomic layer deposition (ALD) technique, both batch and roll-to-roll (R2R) mode. The applications for ALD have long been limited those feasible for batch processing. The work demonstrates that R2R ALD can deposit thin films with properties that are comparable to the film properties fabricated by in batch. This accelerates considerably the commercialization of many products, such as flexible, printed electronics, organic light-emitting diode lighting, third generation thin film photovoltaic devices, high energy density thin film batteries, smart textiles, organic sensors, organic/recyclable packaging materials, and flexible displays, to name a few.

Original language	English
Pages (from-to)	164 - 169
Journal	Thin Solid Films
Volume	550
DOIs	https://doi.org/10.1016/j.tsf.2013.10.148
Publication status	Published - 2014
MoE publication type	A1 Journal article-refereed

Keywords

atomic layer deposition
barrier
roll-to-roll
flexible material
aluminum oxide
polymer

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

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10.1016/j.tsf.2013.10.148

Cite this

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title = "Barrier properties of plastic films coated with an Al2O3 layer by roll-to-toll atomic layer deposition",

abstract = "Thin (30-40 nm) and highly uniform Al2O3 coatings have been deposited at relatively low temperature of 100 °C onto various polymeric materials employing the atomic layer deposition (ALD) technique, both batch and roll-to-roll (R2R) mode. The applications for ALD have long been limited those feasible for batch processing. The work demonstrates that R2R ALD can deposit thin films with properties that are comparable to the film properties fabricated by in batch. This accelerates considerably the commercialization of many products, such as flexible, printed electronics, organic light-emitting diode lighting, third generation thin film photovoltaic devices, high energy density thin film batteries, smart textiles, organic sensors, organic/recyclable packaging materials, and flexible displays, to name a few.",

keywords = "atomic layer deposition, barrier, roll-to-roll, flexible material, aluminum oxide, polymer",

author = "T. Hirvikorpi and R. Laine and Mika V{\"a}h{\"a}-Nissi and V. Kilpi and Erkki Salo and W.-M. Lia and S Lindfors and Jari Vartiainen and Eija Kentt{\"a} and Juha Nikkola and Ali Harlin and J. Kostamo",

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doi = "10.1016/j.tsf.2013.10.148",

language = "English",

volume = "550",

pages = "164 -- 169",

journal = "Thin Solid Films",

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TY - JOUR

T1 - Barrier properties of plastic films coated with an Al2O3 layer by roll-to-toll atomic layer deposition

AU - Hirvikorpi, T.

AU - Laine, R.

AU - Vähä-Nissi, Mika

AU - Kilpi, V.

AU - Salo, Erkki

AU - Lia, W.-M.

AU - Lindfors, S

AU - Vartiainen, Jari

AU - Kenttä, Eija

AU - Nikkola, Juha

AU - Harlin, Ali

AU - Kostamo, J.

PY - 2014

Y1 - 2014

N2 - Thin (30-40 nm) and highly uniform Al2O3 coatings have been deposited at relatively low temperature of 100 °C onto various polymeric materials employing the atomic layer deposition (ALD) technique, both batch and roll-to-roll (R2R) mode. The applications for ALD have long been limited those feasible for batch processing. The work demonstrates that R2R ALD can deposit thin films with properties that are comparable to the film properties fabricated by in batch. This accelerates considerably the commercialization of many products, such as flexible, printed electronics, organic light-emitting diode lighting, third generation thin film photovoltaic devices, high energy density thin film batteries, smart textiles, organic sensors, organic/recyclable packaging materials, and flexible displays, to name a few.

AB - Thin (30-40 nm) and highly uniform Al2O3 coatings have been deposited at relatively low temperature of 100 °C onto various polymeric materials employing the atomic layer deposition (ALD) technique, both batch and roll-to-roll (R2R) mode. The applications for ALD have long been limited those feasible for batch processing. The work demonstrates that R2R ALD can deposit thin films with properties that are comparable to the film properties fabricated by in batch. This accelerates considerably the commercialization of many products, such as flexible, printed electronics, organic light-emitting diode lighting, third generation thin film photovoltaic devices, high energy density thin film batteries, smart textiles, organic sensors, organic/recyclable packaging materials, and flexible displays, to name a few.

KW - atomic layer deposition

KW - barrier

KW - roll-to-roll

KW - flexible material

KW - aluminum oxide

KW - polymer

U2 - 10.1016/j.tsf.2013.10.148

DO - 10.1016/j.tsf.2013.10.148

M3 - Article

SN - 0040-6090

VL - 550

SP - 164

EP - 169

JO - Thin Solid Films

JF - Thin Solid Films

ER -

Barrier properties of plastic films coated with an Al2O3 layer by roll-to-toll atomic layer deposition

Abstract

Keywords

UN SDGs

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