Thin (30-40 nm) and highly uniform Al2O3 coatings have been deposited at relatively low temperature of 100 °C onto various polymeric materials employing the atomic layer deposition (ALD) technique, both batch and roll-to-roll (R2R) mode. The applications for ALD have long been limited those feasible for batch processing. The work demonstrates that R2R ALD can deposit thin films with properties that are comparable to the film properties fabricated by in batch. This accelerates considerably the commercialization of many products, such as flexible, printed electronics, organic light-emitting diode lighting, third generation thin film photovoltaic devices, high energy density thin film batteries, smart textiles, organic sensors, organic/recyclable packaging materials, and flexible displays, to name a few.
- atomic layer deposition
- flexible material
- aluminum oxide
Hirvikorpi, T., Laine, R., Vähä-Nissi, M., Kilpi, V., Salo, E., Lia, W-M., Lindfors, S., Vartiainen, J., Kenttä, E., Nikkola, J., Harlin, A., & Kostamo, J. (2014). Barrier properties of plastic films coated with an Al2O3 layer by roll-to-toll atomic layer deposition. Thin Solid Films, 550, 164 - 169. https://doi.org/10.1016/j.tsf.2013.10.148