Behavior of aluminum in ozonated water, optical and electrochemical study

Heini Ritala; Kimmo Solehmainen; Leif Grönberg; Antero Pehkonen

Behavior of aluminum in ozonated water, optical and electrochemical study

Heini Ritala, Kimmo Solehmainen, Leif Grönberg, Antero Pehkonen

Helsinki University of Technology

Research output: Chapter in Book/Report/Conference proceeding › Conference article in proceedings › Scientific › peer-review

Original language	English
Title of host publication	Cleaning Technology in Semiconductor Device Manufacturing VIII
Publisher	Electrochemical Society ECS
Pages	406-413
ISBN (Print)	1-56677-411-X
Publication status	Published - 2003
MoE publication type	A4 Article in a conference publication
Event	8th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing: Part of the 204th ECS Meeting - Orlando, United States Duration: 12 Oct 2003 → 16 Oct 2003

Publication series

Series	ECS Proceedings Volumes
Volume	2003-26
ISSN	2576-1579

Conference

Conference	8th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
Country/Territory	United States
City	Orlando
Period	12/10/03 → 16/10/03

Cite this

@inproceedings{d48cc32c30f642aba164e7057470d345,

title = "Behavior of aluminum in ozonated water, optical and electrochemical study",

author = "Heini Ritala and Kimmo Solehmainen and Leif Gr{\"o}nberg and Antero Pehkonen",

note = "PNA: Saloniemi; 8th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing : Part of the 204th ECS Meeting ; Conference date: 12-10-2003 Through 16-10-2003",

year = "2003",

language = "English",

isbn = "1-56677-411-X",

series = "ECS Proceedings Volumes",

publisher = "Electrochemical Society ECS",

pages = "406--413",

booktitle = "Cleaning Technology in Semiconductor Device Manufacturing VIII",

address = "United States",

}

Ritala, H, Solehmainen, K, Grönberg, L & Pehkonen, A 2003, Behavior of aluminum in ozonated water, optical and electrochemical study. in Cleaning Technology in Semiconductor Device Manufacturing VIII. Electrochemical Society ECS, ECS Proceedings Volumes, vol. 2003-26, pp. 406-413, 8th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing, Orlando, Florida, United States, 12/10/03.

Behavior of aluminum in ozonated water, optical and electrochemical study. / Ritala, Heini; Solehmainen, Kimmo; Grönberg, Leif et al.
Cleaning Technology in Semiconductor Device Manufacturing VIII. Electrochemical Society ECS, 2003. p. 406-413 (ECS Proceedings Volumes, Vol. 2003-26).

Research output: Chapter in Book/Report/Conference proceeding › Conference article in proceedings › Scientific › peer-review

TY - GEN

T1 - Behavior of aluminum in ozonated water, optical and electrochemical study

AU - Ritala, Heini

AU - Solehmainen, Kimmo

AU - Grönberg, Leif

AU - Pehkonen, Antero

N1 - PNA: Saloniemi

PY - 2003

Y1 - 2003

M3 - Conference article in proceedings

SN - 1-56677-411-X

T3 - ECS Proceedings Volumes

SP - 406

EP - 413

BT - Cleaning Technology in Semiconductor Device Manufacturing VIII

PB - Electrochemical Society ECS

T2 - 8th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing

Y2 - 12 October 2003 through 16 October 2003

ER -