Behaviour of aluminum in ozonated water, optical and electrochemical study

Heini Ritala, Antero Pehkonen, Kimmo Solehmainen, Leif Grönberg

Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

Original languageEnglish
Title of host publicationCleaning Technology in Semiconductor Device Manufacturing VIII
Subtitle of host publicationProceedings of the International Symposium
EditorsJ. Ruzyllo, T. Hattori, R. L. Opila, R. E. Novak
PublisherElectrochemical Society ECS
Pages405-412
ISBN (Print)1-56677-411-X
Publication statusPublished - 2004
MoE publication typeA4 Article in a conference publication
Event8th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing: Part of the 204th ECS Meeting - Orlando, United States
Duration: 12 Oct 200316 Oct 2003

Publication series

SeriesECS Proceedings Volumes
Volume2003-26
ISSN2576-1579

Conference

Conference8th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
CountryUnited States
CityOrlando
Period12/10/0316/10/03

Cite this

Ritala, H., Pehkonen, A., Solehmainen, K., & Grönberg, L. (2004). Behaviour of aluminum in ozonated water, optical and electrochemical study. In J. Ruzyllo, T. Hattori, R. L. Opila, & R. E. Novak (Eds.), Cleaning Technology in Semiconductor Device Manufacturing VIII: Proceedings of the International Symposium (pp. 405-412). Electrochemical Society ECS. ECS Proceedings Volumes, Vol.. 2003-26