Behaviour of aluminum in ozonated water, optical and electrochemical study

Heini Ritala, Antero Pehkonen, Kimmo Solehmainen, Leif Grönberg

    Research output: Chapter in Book/Report/Conference proceedingConference article in proceedingsScientificpeer-review

    Original languageEnglish
    Title of host publicationCleaning Technology in Semiconductor Device Manufacturing VIII
    Subtitle of host publicationProceedings of the International Symposium
    EditorsJ. Ruzyllo, T. Hattori, R. L. Opila, R. E. Novak
    PublisherElectrochemical Society ECS
    Pages405-412
    ISBN (Print)1-56677-411-X
    Publication statusPublished - 2004
    MoE publication typeA4 Article in a conference publication
    Event8th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing: Part of the 204th ECS Meeting - Orlando, United States
    Duration: 12 Oct 200316 Oct 2003

    Publication series

    SeriesECS Proceedings Volumes
    Volume2003-26
    ISSN2576-1579

    Conference

    Conference8th International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
    Country/TerritoryUnited States
    CityOrlando
    Period12/10/0316/10/03

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